TY  - CONF
AU  - Lazić, Žarko
AU  - Smiljanić, Milče
AU  - Tanasković, Dragan
AU  - Rašljić Rafajilović, Milena
AU  - Cvetanović, Katarina
AU  - Milinković, Evgenija
AU  - Bošković, Marko V.
AU  - Andrić, Stevan
AU  - Poljak, Predrag
AU  - Frantlović, Miloš
PY  - 2023
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/7419
AB  - The existing instruments for aerodynamic pressure measurements are usually built around
an array of discrete pressure sensors, placed in the same housing together with a few discrete
temperature sensors. However, this approach is limiting, especially regarding miniaturization, sensor matching, and thermal coupling. In this work, we intend to overcome these limitations by proposing a novel MEMS multisensor chip, which has a monolithically integrated matrix of four piezoresistive MEMS pressure-sensing elements and two resistive temperature-sensing elements. After finishing the preliminary chip design, we performed computer simulations in order to assess its mechanical behavior when measured pressure is applied. Subsequently, the final chip design was completed, and the first batch was fabricated. The used technological processes included photolithography, thermal oxidation, diffusion, sputtering, micromachining (wet chemical etching), anodic bonding, and wafer dicing.
PB  - MDPI
C3  - Engineering proceedings
T1  - Development of a MEMS Multisensor Chip for Aerodynamic Pressure Measurements
VL  - 58
IS  - 1
SP  - 52
DO  - 10.3390/ecsa-10-16071
ER  - 

@conference{
author = "Lazić, Žarko and Smiljanić, Milče and Tanasković, Dragan and Rašljić Rafajilović, Milena and Cvetanović, Katarina and Milinković, Evgenija and Bošković, Marko V. and Andrić, Stevan and Poljak, Predrag and Frantlović, Miloš",
year = "2023",
abstract = "The existing instruments for aerodynamic pressure measurements are usually built around
an array of discrete pressure sensors, placed in the same housing together with a few discrete
temperature sensors. However, this approach is limiting, especially regarding miniaturization, sensor matching, and thermal coupling. In this work, we intend to overcome these limitations by proposing a novel MEMS multisensor chip, which has a monolithically integrated matrix of four piezoresistive MEMS pressure-sensing elements and two resistive temperature-sensing elements. After finishing the preliminary chip design, we performed computer simulations in order to assess its mechanical behavior when measured pressure is applied. Subsequently, the final chip design was completed, and the first batch was fabricated. The used technological processes included photolithography, thermal oxidation, diffusion, sputtering, micromachining (wet chemical etching), anodic bonding, and wafer dicing.",
publisher = "MDPI",
journal = "Engineering proceedings",
title = "Development of a MEMS Multisensor Chip for Aerodynamic Pressure Measurements",
volume = "58",
number = "1",
pages = "52",
doi = "10.3390/ecsa-10-16071"
}

Lazić, Ž., Smiljanić, M., Tanasković, D., Rašljić Rafajilović, M., Cvetanović, K., Milinković, E., Bošković, M. V., Andrić, S., Poljak, P.,& Frantlović, M.. (2023). Development of a MEMS Multisensor Chip for Aerodynamic Pressure Measurements. in Engineering proceedings
MDPI., 58(1), 52.
https://doi.org/10.3390/ecsa-10-16071

Lazić Ž, Smiljanić M, Tanasković D, Rašljić Rafajilović M, Cvetanović K, Milinković E, Bošković MV, Andrić S, Poljak P, Frantlović M. Development of a MEMS Multisensor Chip for Aerodynamic Pressure Measurements. in Engineering proceedings. 2023;58(1):52.
doi:10.3390/ecsa-10-16071 .

Lazić, Žarko, Smiljanić, Milče, Tanasković, Dragan, Rašljić Rafajilović, Milena, Cvetanović, Katarina, Milinković, Evgenija, Bošković, Marko V., Andrić, Stevan, Poljak, Predrag, Frantlović, Miloš, "Development of a MEMS Multisensor Chip for Aerodynamic Pressure Measurements" in Engineering proceedings, 58, no. 1 (2023):52,
https://doi.org/10.3390/ecsa-10-16071 . .

Smiljanić, M. M., Vorkapić, M., Cvetanović, K., Milinković, E., Lazić, Ž., Bošković, M. V.,& Svorcan, J.. (2023). Metoda za posmatranje i analizu protoka fluida u Si-Pyrex staklo opto-mikrofluidnim platformama. 
University of Belgrade - Institute of Chemistry, Technology and Metallurgy..
https://hdl.handle.net/21.15107/rcub_cer_6659

Smiljanić MM, Vorkapić M, Cvetanović K, Milinković E, Lazić Ž, Bošković MV, Svorcan J. Metoda za posmatranje i analizu protoka fluida u Si-Pyrex staklo opto-mikrofluidnim platformama. 2023;.
https://hdl.handle.net/21.15107/rcub_cer_6659 .

Smiljanić, Milče M., Vorkapić, Miloš, Cvetanović, Katarina, Milinković, Evgenija, Lazić, Žarko, Bošković, Marko V., Svorcan, Jelena, "Metoda za posmatranje i analizu protoka fluida u Si-Pyrex staklo opto-mikrofluidnim platformama" (2023),
https://hdl.handle.net/21.15107/rcub_cer_6659 .

TY  - CONF
AU  - Lazić, Žarko
AU  - Smiljanić, Milče M.
AU  - Nešić, Dušan
AU  - Zeković, Ljubiša
PY  - 2022
UR  - https://www.etran.rs/2022/zbornik/ICETRAN-22_radovi/044-MOI1.1.pdf
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5640
AB  - In this paper, two color detector based on silicon 
photodiodes is studied and fabricated. Standard IHTM 
photodiode’s design is modified to allow mounting one 
photodiode above another using special micromachined carrier. 
The carrier is fabricated using wet silicon etching in 25% TMAH 
water solution and anodic bonding of etched silicon and Pyrex 
glass. The fabricated carrier also allows easy wire 
thermocompression bonding from the photodiode’s pads to TO-5 
housing. Output currents of the photodiodes were measured by 
applying light of 900 nm and 1060 nm. Obtained results verify 
applicability of the new packaging for two color detector.
PB  - Belgrade : ETRAN Society
C3  - Proceedings - IX International Conference IcETRAN and LXVI ETRAN Conference, 6 ‐ 9, June, 2022, Novi Pazar, Serbia
T1  - Two Color Photodiodes Mounted on the Micromachined Carrier
SP  - 391
EP  - 394
UR  - https://hdl.handle.net/21.15107/rcub_cer_5640
ER  - 

@conference{
author = "Lazić, Žarko and Smiljanić, Milče M. and Nešić, Dušan and Zeković, Ljubiša",
year = "2022",
abstract = "In this paper, two color detector based on silicon 
photodiodes is studied and fabricated. Standard IHTM 
photodiode’s design is modified to allow mounting one 
photodiode above another using special micromachined carrier. 
The carrier is fabricated using wet silicon etching in 25% TMAH 
water solution and anodic bonding of etched silicon and Pyrex 
glass. The fabricated carrier also allows easy wire 
thermocompression bonding from the photodiode’s pads to TO-5 
housing. Output currents of the photodiodes were measured by 
applying light of 900 nm and 1060 nm. Obtained results verify 
applicability of the new packaging for two color detector.",
publisher = "Belgrade : ETRAN Society",
journal = "Proceedings - IX International Conference IcETRAN and LXVI ETRAN Conference, 6 ‐ 9, June, 2022, Novi Pazar, Serbia",
title = "Two Color Photodiodes Mounted on the Micromachined Carrier",
pages = "391-394",
url = "https://hdl.handle.net/21.15107/rcub_cer_5640"
}

Lazić, Ž., Smiljanić, M. M., Nešić, D.,& Zeković, L.. (2022). Two Color Photodiodes Mounted on the Micromachined Carrier. in Proceedings - IX International Conference IcETRAN and LXVI ETRAN Conference, 6 ‐ 9, June, 2022, Novi Pazar, Serbia
Belgrade : ETRAN Society., 391-394.
https://hdl.handle.net/21.15107/rcub_cer_5640

Lazić Ž, Smiljanić MM, Nešić D, Zeković L. Two Color Photodiodes Mounted on the Micromachined Carrier. in Proceedings - IX International Conference IcETRAN and LXVI ETRAN Conference, 6 ‐ 9, June, 2022, Novi Pazar, Serbia. 2022;:391-394.
https://hdl.handle.net/21.15107/rcub_cer_5640 .

Lazić, Žarko, Smiljanić, Milče M., Nešić, Dušan, Zeković, Ljubiša, "Two Color Photodiodes Mounted on the Micromachined Carrier" in Proceedings - IX International Conference IcETRAN and LXVI ETRAN Conference, 6 ‐ 9, June, 2022, Novi Pazar, Serbia (2022):391-394,
https://hdl.handle.net/21.15107/rcub_cer_5640 .

TY  - JOUR
AU  - Smiljanić, Milče M.
AU  - Radjenović, Branislav
AU  - Lazić, Žarko
AU  - Radmilović Radjenović, Marija
AU  - Rašljić Rafajilović, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Milinković, Evgenija
AU  - Filipović, Ana
PY  - 2021
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4453
AB  - In  this  paper,  fabrication  of  silicon  microchannels  with  integrated  obstacles  by  using  25 wt.% tetramethylammonium  hydroxide  (TMAH)  aqueous  solution  at  the  temperature  of  80 C  is presented  and  analysed.  We  studied  basic  island  patterns,  which present  union  of  two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45o. We have derived analytical  relations  for  determining  dimensions  of  the  integrated  obstacles.  The  developed etching  technique  provides  reduction  of  the  distance  between  the  obstacles.  Before  the experiments, we performed simulations of pattern etching based on the level set method and presented  evolution  of  the  etched basic  patterns  for  the  predetermined  crystallographic directions  <n10>.  Combination  of  basic  patterns  with  sides  along  the  <610>  and  <100> crystallographic  directions  is  used  to  fabricate  a  matrix  of  two  row  of  silicon  obstacles  in  a microchannel.   We   obtained   a   good   agreement   between   the   experimental   results   and simulations.   Our   results   enable   simple  and   cost-effective  fabrication   of  various   complex microfluidic silicon platforms with integrated obstacles.
AB  - U ovom radu je prezentovana i analizirana izrada silicijumskih mikrokanala sa integrisanim preprekama u vodenom rastvoru 25 mas.% tetrametilamonijum hidroksida (TMAH) na temperaturi od 80 oC. Proučavani su osnovni oblici maski koji predstavljaju uniju dva simetrična ostrva u obliku paralelograma čije su stranice duž unapred određenih kristalografskih pravaca (2<n<8) i <100>. Oštri uglovi paralelograma su manji od 45˚. Izvedene su formule za izračunavanje dimenzija integrisanih prepreka. Razvijena je tehnika nagrizanja koja smanjuje rastojanje između prepreka. Pre eksperimenata izvršene su simulacije osnovnih oblika koje se baziraju na metodi implicitno definisanih nivoa (engl. level set method). Prezentovan je razvoj nagrizanih osnovnih oblika maski za unapred određene kristalografske pravce <n10>. Kombinacija osnovnih oblika maski čije su stranice duž kristalografskih pravaca <610> i <100> je iskorišćena za izradu dva reda matrice silicijumskih prepreka u mikrokanalu. Dobijeno je dobro slaganje između eksperimenata i simulacija. Dobijeni rezultati omogućavaju jednostavnu i jeftinu izradu različitih kompleksnih mikrofluidnih silicijumskih platformi sa integrisanim preprekama.
PB  - Association of Chemical Engeneers of Serbia
T2  - Hemijska industrija
T1  - Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH
T1  - Kontrolisan raspored integrisanih prepreka u silicijumskim mikrokanalima nagrizanim u 25 mas.% rastvoru tetrametilamonijum hidroksida
VL  - 75
IS  - 1
SP  - 15
EP  - 24
DO  - 10.2298/HEMIND200807005S
ER  - 

@article{
author = "Smiljanić, Milče M. and Radjenović, Branislav and Lazić, Žarko and Radmilović Radjenović, Marija and Rašljić Rafajilović, Milena and Cvetanović Zobenica, Katarina and Milinković, Evgenija and Filipović, Ana",
year = "2021",
abstract = "In  this  paper,  fabrication  of  silicon  microchannels  with  integrated  obstacles  by  using  25 wt.% tetramethylammonium  hydroxide  (TMAH)  aqueous  solution  at  the  temperature  of  80 C  is presented  and  analysed.  We  studied  basic  island  patterns,  which present  union  of  two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45o. We have derived analytical  relations  for  determining  dimensions  of  the  integrated  obstacles.  The  developed etching  technique  provides  reduction  of  the  distance  between  the  obstacles.  Before  the experiments, we performed simulations of pattern etching based on the level set method and presented  evolution  of  the  etched basic  patterns  for  the  predetermined  crystallographic directions  <n10>.  Combination  of  basic  patterns  with  sides  along  the  <610>  and  <100> crystallographic  directions  is  used  to  fabricate  a  matrix  of  two  row  of  silicon  obstacles  in  a microchannel.   We   obtained   a   good   agreement   between   the   experimental   results   and simulations.   Our   results   enable   simple  and   cost-effective  fabrication   of  various   complex microfluidic silicon platforms with integrated obstacles., U ovom radu je prezentovana i analizirana izrada silicijumskih mikrokanala sa integrisanim preprekama u vodenom rastvoru 25 mas.% tetrametilamonijum hidroksida (TMAH) na temperaturi od 80 oC. Proučavani su osnovni oblici maski koji predstavljaju uniju dva simetrična ostrva u obliku paralelograma čije su stranice duž unapred određenih kristalografskih pravaca (2<n<8) i <100>. Oštri uglovi paralelograma su manji od 45˚. Izvedene su formule za izračunavanje dimenzija integrisanih prepreka. Razvijena je tehnika nagrizanja koja smanjuje rastojanje između prepreka. Pre eksperimenata izvršene su simulacije osnovnih oblika koje se baziraju na metodi implicitno definisanih nivoa (engl. level set method). Prezentovan je razvoj nagrizanih osnovnih oblika maski za unapred određene kristalografske pravce <n10>. Kombinacija osnovnih oblika maski čije su stranice duž kristalografskih pravaca <610> i <100> je iskorišćena za izradu dva reda matrice silicijumskih prepreka u mikrokanalu. Dobijeno je dobro slaganje između eksperimenata i simulacija. Dobijeni rezultati omogućavaju jednostavnu i jeftinu izradu različitih kompleksnih mikrofluidnih silicijumskih platformi sa integrisanim preprekama.",
publisher = "Association of Chemical Engeneers of Serbia",
journal = "Hemijska industrija",
title = "Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH, Kontrolisan raspored integrisanih prepreka u silicijumskim mikrokanalima nagrizanim u 25 mas.% rastvoru tetrametilamonijum hidroksida",
volume = "75",
number = "1",
pages = "15-24",
doi = "10.2298/HEMIND200807005S"
}

Smiljanić, M. M., Radjenović, B., Lazić, Ž., Radmilović Radjenović, M., Rašljić Rafajilović, M., Cvetanović Zobenica, K., Milinković, E.,& Filipović, A.. (2021). Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH. in Hemijska industrija
Association of Chemical Engeneers of Serbia., 75(1), 15-24.
https://doi.org/10.2298/HEMIND200807005S

Smiljanić MM, Radjenović B, Lazić Ž, Radmilović Radjenović M, Rašljić Rafajilović M, Cvetanović Zobenica K, Milinković E, Filipović A. Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH. in Hemijska industrija. 2021;75(1):15-24.
doi:10.2298/HEMIND200807005S .

Smiljanić, Milče M., Radjenović, Branislav, Lazić, Žarko, Radmilović Radjenović, Marija, Rašljić Rafajilović, Milena, Cvetanović Zobenica, Katarina, Milinković, Evgenija, Filipović, Ana, "Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH" in Hemijska industrija, 75, no. 1 (2021):15-24,
https://doi.org/10.2298/HEMIND200807005S . .

TY  - GEN
AU  - Sarajlić, Milija
AU  - Smiljanić, Milče M.
AU  - Frantlović, Miloš
AU  - Rašljić, Milena
AU  - Cvetanović, Katarina
AU  - Lazić, Žarko
AU  - Vasiljević-Radović, Dana
PY  - 2021
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4750
AB  - Ovo tehničko rešenje obuhvata razvoj i realizaciju senzora temperature čiji se princip rada zasniva na razlici temperaturnih koeficijenata električne otpornosti (TCR) četiri tankoslojna otpornika povezana u konfiguraciju Vitstonovog mosta. Ovo je nov pristup koji nije ranije korišćen. Sva četiri otpornika su izložena istoj temperaturi sa jedinom razlikom da su dva otpornika prekrivena tvrdo zapečenim (umreženim) fotorezistom debljine 2,3 mm dok su druga dva otvorena i izložena spoljnjem vazduhu. Ovo pravi temperaturnu razliku između otpornika a takođe i razliku temperaturnih koeficijenata otpornosti što u konfiguraciji Vitstonovog mosta daje signal proporcionalan ovoj razlici.
PB  - IHTM-Centar za mikroelektronske tehnologije
T2  - Tehničko rešenje
T1  - Senzor temperature za merenja u vazduhu zasnovan na razlici temperaturnih koeficijenata tankoslojnih otpornika
UR  - https://hdl.handle.net/21.15107/rcub_cer_4750
ER  - 

@misc{
author = "Sarajlić, Milija and Smiljanić, Milče M. and Frantlović, Miloš and Rašljić, Milena and Cvetanović, Katarina and Lazić, Žarko and Vasiljević-Radović, Dana",
year = "2021",
abstract = "Ovo tehničko rešenje obuhvata razvoj i realizaciju senzora temperature čiji se princip rada zasniva na razlici temperaturnih koeficijenata električne otpornosti (TCR) četiri tankoslojna otpornika povezana u konfiguraciju Vitstonovog mosta. Ovo je nov pristup koji nije ranije korišćen. Sva četiri otpornika su izložena istoj temperaturi sa jedinom razlikom da su dva otpornika prekrivena tvrdo zapečenim (umreženim) fotorezistom debljine 2,3 mm dok su druga dva otvorena i izložena spoljnjem vazduhu. Ovo pravi temperaturnu razliku između otpornika a takođe i razliku temperaturnih koeficijenata otpornosti što u konfiguraciji Vitstonovog mosta daje signal proporcionalan ovoj razlici.",
publisher = "IHTM-Centar za mikroelektronske tehnologije",
journal = "Tehničko rešenje",
title = "Senzor temperature za merenja u vazduhu zasnovan na razlici temperaturnih koeficijenata tankoslojnih otpornika",
url = "https://hdl.handle.net/21.15107/rcub_cer_4750"
}

Sarajlić, M., Smiljanić, M. M., Frantlović, M., Rašljić, M., Cvetanović, K., Lazić, Ž.,& Vasiljević-Radović, D.. (2021). Senzor temperature za merenja u vazduhu zasnovan na razlici temperaturnih koeficijenata tankoslojnih otpornika. in Tehničko rešenje
IHTM-Centar za mikroelektronske tehnologije..
https://hdl.handle.net/21.15107/rcub_cer_4750

Sarajlić M, Smiljanić MM, Frantlović M, Rašljić M, Cvetanović K, Lazić Ž, Vasiljević-Radović D. Senzor temperature za merenja u vazduhu zasnovan na razlici temperaturnih koeficijenata tankoslojnih otpornika. in Tehničko rešenje. 2021;.
https://hdl.handle.net/21.15107/rcub_cer_4750 .

Sarajlić, Milija, Smiljanić, Milče M., Frantlović, Miloš, Rašljić, Milena, Cvetanović, Katarina, Lazić, Žarko, Vasiljević-Radović, Dana, "Senzor temperature za merenja u vazduhu zasnovan na razlici temperaturnih koeficijenata tankoslojnih otpornika" in Tehničko rešenje (2021),
https://hdl.handle.net/21.15107/rcub_cer_4750 .

TY  - CONF
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Milinković, Evgenija
AU  - Cvetanović, Katarina
AU  - Rašljić Rafajilović, Milena
PY  - 2021
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4855
AB  - In this paper, a new concave corner compensation for etching of (100) silicon substrates in 25 wt % TMAH water solution at the temperature of 80°C is presented and analysed. The aim of developed technique is to reduce area of the etched {111} planes when there is a need to obtain 3D silicon structures with sidewalls vertical to substrate's surface. Appearance of the slow etching {111} planes cannot be eliminated. All crystallographic planes that appeared during evolution of etched compensations are determined. All the parameters necessary to apply developed concave corner compensation in various designs are provided. As a result, the side along the [removed] crystallographic direction in the masking layer of the unwanted {111} planes is reduced approximately 3 times.
PB  - Belgrade : Institute of Electrical and Electronics Engineers Inc.
C3  - 32nd IEEE International Conference on Microelectronics, MIEL 2021
T1  - A Simple Concave Corner Compensation of Etched Si(100) in 25 wt % TMAH Water Solution
SP  - 193
EP  - 196
DO  - 10.1109/MIEL52794.2021.9569186
ER  - 

@conference{
author = "Smiljanić, Milče M. and Lazić, Žarko and Milinković, Evgenija and Cvetanović, Katarina and Rašljić Rafajilović, Milena",
year = "2021",
abstract = "In this paper, a new concave corner compensation for etching of (100) silicon substrates in 25 wt % TMAH water solution at the temperature of 80°C is presented and analysed. The aim of developed technique is to reduce area of the etched {111} planes when there is a need to obtain 3D silicon structures with sidewalls vertical to substrate's surface. Appearance of the slow etching {111} planes cannot be eliminated. All crystallographic planes that appeared during evolution of etched compensations are determined. All the parameters necessary to apply developed concave corner compensation in various designs are provided. As a result, the side along the [removed] crystallographic direction in the masking layer of the unwanted {111} planes is reduced approximately 3 times.",
publisher = "Belgrade : Institute of Electrical and Electronics Engineers Inc.",
journal = "32nd IEEE International Conference on Microelectronics, MIEL 2021",
title = "A Simple Concave Corner Compensation of Etched Si(100) in 25 wt % TMAH Water Solution",
pages = "193-196",
doi = "10.1109/MIEL52794.2021.9569186"
}

Smiljanić, M. M., Lazić, Ž., Milinković, E., Cvetanović, K.,& Rašljić Rafajilović, M.. (2021). A Simple Concave Corner Compensation of Etched Si(100) in 25 wt % TMAH Water Solution. in 32nd IEEE International Conference on Microelectronics, MIEL 2021
Belgrade : Institute of Electrical and Electronics Engineers Inc.., 193-196.
https://doi.org/10.1109/MIEL52794.2021.9569186

Smiljanić MM, Lazić Ž, Milinković E, Cvetanović K, Rašljić Rafajilović M. A Simple Concave Corner Compensation of Etched Si(100) in 25 wt % TMAH Water Solution. in 32nd IEEE International Conference on Microelectronics, MIEL 2021. 2021;:193-196.
doi:10.1109/MIEL52794.2021.9569186 .

Smiljanić, Milče M., Lazić, Žarko, Milinković, Evgenija, Cvetanović, Katarina, Rašljić Rafajilović, Milena, "A Simple Concave Corner Compensation of Etched Si(100) in 25 wt % TMAH Water Solution" in 32nd IEEE International Conference on Microelectronics, MIEL 2021 (2021):193-196,
https://doi.org/10.1109/MIEL52794.2021.9569186 . .

TY  - JOUR
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Rašljić Rafajilović, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Milinković, Evgenija
AU  - Filipović, Ana
PY  - 2020
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4002
AB  - In this study, Y-bifurcated microchannels fabricated from a {100} silicon in 25 wt% tetramethylammonium hydroxide water solution at the temperature of 80 °C have been presented and analysed. We studied the etching of acute angles with sides along the <n10> crystallographic directions in the masking layer where 1 < n < 8. We considered symmetrical acute corners in the masking layer with respect to the <100> crystallographic directions. The angles between the appropriate <n10> and <100> crystallographic directions were smaller than 45°. Moreover, we observed asymmetrical acute corners formed by the <n10> and <m10> crystallographic directions, where m ≠ n. We found that the obtained convex corners were not distorted during etching. Consequently, it is not necessary to apply convex corner compensation. These fabricated undistorted convex corners represent the angles of the bifurcations. The sidewalls of the microchannels are defined by etched planes of the {n11} and {100} families. Analytical relations were derived for the widths of the microchannels. The results enable simple and cost-effective fabrication of various complex silicon microfluidic platforms.
PB  - IOP Publishing
T2  - Journal of Micromechanics and Microengineering
T1  - Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution
VL  - 31
SP  - 017001
DO  - 10.1088/1361-6439/abcb67
ER  - 

@article{
author = "Smiljanić, Milče M. and Lazić, Žarko and Rašljić Rafajilović, Milena and Cvetanović Zobenica, Katarina and Milinković, Evgenija and Filipović, Ana",
year = "2020",
abstract = "In this study, Y-bifurcated microchannels fabricated from a {100} silicon in 25 wt% tetramethylammonium hydroxide water solution at the temperature of 80 °C have been presented and analysed. We studied the etching of acute angles with sides along the <n10> crystallographic directions in the masking layer where 1 < n < 8. We considered symmetrical acute corners in the masking layer with respect to the <100> crystallographic directions. The angles between the appropriate <n10> and <100> crystallographic directions were smaller than 45°. Moreover, we observed asymmetrical acute corners formed by the <n10> and <m10> crystallographic directions, where m ≠ n. We found that the obtained convex corners were not distorted during etching. Consequently, it is not necessary to apply convex corner compensation. These fabricated undistorted convex corners represent the angles of the bifurcations. The sidewalls of the microchannels are defined by etched planes of the {n11} and {100} families. Analytical relations were derived for the widths of the microchannels. The results enable simple and cost-effective fabrication of various complex silicon microfluidic platforms.",
publisher = "IOP Publishing",
journal = "Journal of Micromechanics and Microengineering",
title = "Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution",
volume = "31",
pages = "017001",
doi = "10.1088/1361-6439/abcb67"
}

Smiljanić, M. M., Lazić, Ž., Rašljić Rafajilović, M., Cvetanović Zobenica, K., Milinković, E.,& Filipović, A.. (2020). Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution. in Journal of Micromechanics and Microengineering
IOP Publishing., 31, 017001.
https://doi.org/10.1088/1361-6439/abcb67

Smiljanić MM, Lazić Ž, Rašljić Rafajilović M, Cvetanović Zobenica K, Milinković E, Filipović A. Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution. in Journal of Micromechanics and Microengineering. 2020;31:017001.
doi:10.1088/1361-6439/abcb67 .

Smiljanić, Milče M., Lazić, Žarko, Rašljić Rafajilović, Milena, Cvetanović Zobenica, Katarina, Milinković, Evgenija, Filipović, Ana, "Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution" in Journal of Micromechanics and Microengineering, 31 (2020):017001,
https://doi.org/10.1088/1361-6439/abcb67 . .

TY  - JOUR
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Rašljić Rafajilović, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Milinković, Evgenija
AU  - Filipović, Ana
PY  - 2020
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4003
AB  - In this study, Y-bifurcated microchannels fabricated from a {100} silicon in 25 wt% tetramethylammonium hydroxide water solution at the temperature of 80 °C have been presented and analysed. We studied the etching of acute angles with sides along the <n10> crystallographic directions in the masking layer where 1 < n < 8. We considered symmetrical acute corners in the masking layer with respect to the <100> crystallographic directions. The angles between the appropriate <n10> and <100> crystallographic directions were smaller than 45°. Moreover, we observed asymmetrical acute corners formed by the <n10> and <m10> crystallographic directions, where m ≠ n. We found that the obtained convex corners were not distorted during etching. Consequently, it is not necessary to apply convex corner compensation. These fabricated undistorted convex corners represent the angles of the bifurcations. The sidewalls of the microchannels are defined by etched planes of the {n11} and {100} families. Analytical relations were derived for the widths of the microchannels. The results enable simple and cost-effective fabrication of various complex silicon microfluidic platforms.
PB  - IOP Publishing
T2  - Journal of Micromechanics and Microengineering
T1  - Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution
VL  - 31
SP  - 017001
DO  - 10.1088/1361-6439/abcb67
ER  - 

@article{
author = "Smiljanić, Milče M. and Lazić, Žarko and Rašljić Rafajilović, Milena and Cvetanović Zobenica, Katarina and Milinković, Evgenija and Filipović, Ana",
year = "2020",
abstract = "In this study, Y-bifurcated microchannels fabricated from a {100} silicon in 25 wt% tetramethylammonium hydroxide water solution at the temperature of 80 °C have been presented and analysed. We studied the etching of acute angles with sides along the <n10> crystallographic directions in the masking layer where 1 < n < 8. We considered symmetrical acute corners in the masking layer with respect to the <100> crystallographic directions. The angles between the appropriate <n10> and <100> crystallographic directions were smaller than 45°. Moreover, we observed asymmetrical acute corners formed by the <n10> and <m10> crystallographic directions, where m ≠ n. We found that the obtained convex corners were not distorted during etching. Consequently, it is not necessary to apply convex corner compensation. These fabricated undistorted convex corners represent the angles of the bifurcations. The sidewalls of the microchannels are defined by etched planes of the {n11} and {100} families. Analytical relations were derived for the widths of the microchannels. The results enable simple and cost-effective fabrication of various complex silicon microfluidic platforms.",
publisher = "IOP Publishing",
journal = "Journal of Micromechanics and Microengineering",
title = "Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution",
volume = "31",
pages = "017001",
doi = "10.1088/1361-6439/abcb67"
}

Smiljanić, M. M., Lazić, Ž., Rašljić Rafajilović, M., Cvetanović Zobenica, K., Milinković, E.,& Filipović, A.. (2020). Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution. in Journal of Micromechanics and Microengineering
IOP Publishing., 31, 017001.
https://doi.org/10.1088/1361-6439/abcb67

Smiljanić MM, Lazić Ž, Rašljić Rafajilović M, Cvetanović Zobenica K, Milinković E, Filipović A. Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution. in Journal of Micromechanics and Microengineering. 2020;31:017001.
doi:10.1088/1361-6439/abcb67 .

Smiljanić, Milče M., Lazić, Žarko, Rašljić Rafajilović, Milena, Cvetanović Zobenica, Katarina, Milinković, Evgenija, Filipović, Ana, "Silicon Y-bifurcated microchannels etched in 25 wt% TMAH water solution" in Journal of Micromechanics and Microengineering, 31 (2020):017001,
https://doi.org/10.1088/1361-6439/abcb67 . .

TY  - JOUR
AU  - Rašljić Rafajilović, Milena
AU  - Radulović, Katarina
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Jakšić, Zoran
AU  - Stanisavljev, Dragomir
AU  - Vasiljević-Radović, Dana
PY  - 2020
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4009
AB  - We present the design, simulation, fabrication and characterization of monolithically
integrated high resistivity p-type boron-di used silicon two-zone heaters in a model high temperature
microreactor intended for nanoparticle fabrication. We used a finite element method for simulations
of the heaters’ operation and performance. Our experimental model reactor structure consisted of
a silicon wafer anodically bonded to a Pyrex glass wafer with an isotropically etched serpentine
microchannels network. We fabricated two separate spiral heaters with di erent temperatures,
mutually thermally isolated by barrier apertures etched throughout the silicon wafer. The heaters
were characterized by electric measurements and by infrared thermal vision. The obtained results
show that our proposed procedure for the heater fabrication is robust, stable and controllable, with a
decreased sensitivity to random variations of fabrication process parameters. Compared to metallic or
polysilicon heaters typically integrated into microreactors, our approach o ers improved control over
heater characteristics through adjustment of the Boron doping level and profile. Our microreactor is
intended to produce titanium dioxide nanoparticles, but it could be also used to fabricate nanoparticles
in di erent materials as well, with various parameters and geometries. Our method can be generally
applied to other high-temperature microsystems.
PB  - MDPI
T2  - Micromachines
T1  - Monolithically Integrated Diffused Silicon Two-Zone Heaters for Silicon-Pyrex Glass Microreactors for Production of Nanoparticles: Heat Exchange Aspects.
VL  - 11
IS  - 9
SP  - 818
DO  - 10.3390/mi11090818
ER  - 

@article{
author = "Rašljić Rafajilović, Milena and Radulović, Katarina and Smiljanić, Milče M. and Lazić, Žarko and Jakšić, Zoran and Stanisavljev, Dragomir and Vasiljević-Radović, Dana",
year = "2020",
abstract = "We present the design, simulation, fabrication and characterization of monolithically
integrated high resistivity p-type boron-di used silicon two-zone heaters in a model high temperature
microreactor intended for nanoparticle fabrication. We used a finite element method for simulations
of the heaters’ operation and performance. Our experimental model reactor structure consisted of
a silicon wafer anodically bonded to a Pyrex glass wafer with an isotropically etched serpentine
microchannels network. We fabricated two separate spiral heaters with di erent temperatures,
mutually thermally isolated by barrier apertures etched throughout the silicon wafer. The heaters
were characterized by electric measurements and by infrared thermal vision. The obtained results
show that our proposed procedure for the heater fabrication is robust, stable and controllable, with a
decreased sensitivity to random variations of fabrication process parameters. Compared to metallic or
polysilicon heaters typically integrated into microreactors, our approach o ers improved control over
heater characteristics through adjustment of the Boron doping level and profile. Our microreactor is
intended to produce titanium dioxide nanoparticles, but it could be also used to fabricate nanoparticles
in di erent materials as well, with various parameters and geometries. Our method can be generally
applied to other high-temperature microsystems.",
publisher = "MDPI",
journal = "Micromachines",
title = "Monolithically Integrated Diffused Silicon Two-Zone Heaters for Silicon-Pyrex Glass Microreactors for Production of Nanoparticles: Heat Exchange Aspects.",
volume = "11",
number = "9",
pages = "818",
doi = "10.3390/mi11090818"
}

Rašljić Rafajilović, M., Radulović, K., Smiljanić, M. M., Lazić, Ž., Jakšić, Z., Stanisavljev, D.,& Vasiljević-Radović, D.. (2020). Monolithically Integrated Diffused Silicon Two-Zone Heaters for Silicon-Pyrex Glass Microreactors for Production of Nanoparticles: Heat Exchange Aspects.. in Micromachines
MDPI., 11(9), 818.
https://doi.org/10.3390/mi11090818

Rašljić Rafajilović M, Radulović K, Smiljanić MM, Lazić Ž, Jakšić Z, Stanisavljev D, Vasiljević-Radović D. Monolithically Integrated Diffused Silicon Two-Zone Heaters for Silicon-Pyrex Glass Microreactors for Production of Nanoparticles: Heat Exchange Aspects.. in Micromachines. 2020;11(9):818.
doi:10.3390/mi11090818 .

Rašljić Rafajilović, Milena, Radulović, Katarina, Smiljanić, Milče M., Lazić, Žarko, Jakšić, Zoran, Stanisavljev, Dragomir, Vasiljević-Radović, Dana, "Monolithically Integrated Diffused Silicon Two-Zone Heaters for Silicon-Pyrex Glass Microreactors for Production of Nanoparticles: Heat Exchange Aspects." in Micromachines, 11, no. 9 (2020):818,
https://doi.org/10.3390/mi11090818 . .

TY  - JOUR
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Jović, Vesna
AU  - Radjenović, Branislav
AU  - Radmilović-Radjenović, Marija
PY  - 2020
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3490
AB  - This paper presents etching of convex corners with sides along <n10> and <100> crystallographic directions in a 25 wt% tetramethylammonium hydroxide (TMAH) water solution at 80 °C. We analyzed parallelograms as the mask patterns for anisotropic wet etching of Si (100). The sides of the parallelograms were designed along <n10> and <100> crystallographic directions (1 < n < 8). The acute corners of islands in the masking layer formed by <n10> and <100> crystallographic directions were smaller than 45°. All the crystallographic planes that appeared during etching in the experiment were determined. We found that the obtained types of 3D silicon shape sustain when n > 2. The convex corners were not distorted during etching. Therefore, no convex corner compensation is necessary. We fabricated three matrices of parallelograms with sides along crystallographic directions <310> and <100> as examples for possible applications. Additionally, the etching of matrices was simulated by the level set method. We obtained a good agreement between experiments and simulations.
PB  - MDPI
T2  - Micromachines
T1  - Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C
VL  - 11
IS  - 3
SP  - 253
DO  - 10.3390/mi11030253
ER  - 

@article{
author = "Smiljanić, Milče M. and Lazić, Žarko and Jović, Vesna and Radjenović, Branislav and Radmilović-Radjenović, Marija",
year = "2020",
abstract = "This paper presents etching of convex corners with sides along <n10> and <100> crystallographic directions in a 25 wt% tetramethylammonium hydroxide (TMAH) water solution at 80 °C. We analyzed parallelograms as the mask patterns for anisotropic wet etching of Si (100). The sides of the parallelograms were designed along <n10> and <100> crystallographic directions (1 < n < 8). The acute corners of islands in the masking layer formed by <n10> and <100> crystallographic directions were smaller than 45°. All the crystallographic planes that appeared during etching in the experiment were determined. We found that the obtained types of 3D silicon shape sustain when n > 2. The convex corners were not distorted during etching. Therefore, no convex corner compensation is necessary. We fabricated three matrices of parallelograms with sides along crystallographic directions <310> and <100> as examples for possible applications. Additionally, the etching of matrices was simulated by the level set method. We obtained a good agreement between experiments and simulations.",
publisher = "MDPI",
journal = "Micromachines",
title = "Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C",
volume = "11",
number = "3",
pages = "253",
doi = "10.3390/mi11030253"
}

Smiljanić, M. M., Lazić, Ž., Jović, V., Radjenović, B.,& Radmilović-Radjenović, M.. (2020). Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C. in Micromachines
MDPI., 11(3), 253.
https://doi.org/10.3390/mi11030253

Smiljanić MM, Lazić Ž, Jović V, Radjenović B, Radmilović-Radjenović M. Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C. in Micromachines. 2020;11(3):253.
doi:10.3390/mi11030253 .

Smiljanić, Milče M., Lazić, Žarko, Jović, Vesna, Radjenović, Branislav, Radmilović-Radjenović, Marija, "Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C" in Micromachines, 11, no. 3 (2020):253,
https://doi.org/10.3390/mi11030253 . .

Lazić, Ž., Smiljanić, M., Đinović, Z., Rašljić, M., Cvetanović-Zobenica, K.,& Vasiljević-Radović, D.. (2019). Opto-fluidna platforma za praćenje ćelija raka. 
University of Belgrade - Institute of Chemistry, Technology and Metallurgy..
https://hdl.handle.net/21.15107/rcub_cer_7418

Lazić Ž, Smiljanić M, Đinović Z, Rašljić M, Cvetanović-Zobenica K, Vasiljević-Radović D. Opto-fluidna platforma za praćenje ćelija raka. 2019;.
https://hdl.handle.net/21.15107/rcub_cer_7418 .

Lazić, Žarko, Smiljanić, Milče, Đinović, Zoran, Rašljić, Milena, Cvetanović-Zobenica, Katarina, Vasiljević-Radović, Dana, "Opto-fluidna platforma za praćenje ćelija raka" (2019),
https://hdl.handle.net/21.15107/rcub_cer_7418 .

TY  - CONF
AU  - Vasiljević-Radović, Dana
AU  - Rašljić, Milena
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Radulović, Katarina
AU  - Cvetanović-Zobenica, Katarina
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/7420
AB  - In this work an overview of Micro Electromechanical
Systems (MEMS)-based microfluidic platforms for
different applications is presented. Microfluidics refers
to a set of technologies that control the flow of liquids or
gases through miniaturized systems in typical amounts of
nano- and pico- liters. Microfluidic devices are
characterized by microchannels with characteristic
dimensions in the micrometer range. The main
techniques, technologies and materials used for
fabrication of MEMS microfluidic devices and systems
are presented. The used materials and their properties are
very important for the final characteristics and
functionalities of devices. As an example, the design and
fabrication of our opto-fluidic lab-on-a-chip device based
on silicon and pyrex glass is given.
PB  - Belgrade : ETRAN Society / Beograd : Društvo za ETRAN
C3  - Proceedings of papers - (Ic) ETRAN 6th International Conference on Electrical, Electronical and Computing Engineering, June 03-06 2019, Silver Lake, Serbia
T1  - Microselectromechanical system (MEMS) based microfluidic platforms
SP  - 570
EP  - 570
UR  - https://hdl.handle.net/21.15107/rcub_cer_7420
ER  - 

@conference{
author = "Vasiljević-Radović, Dana and Rašljić, Milena and Smiljanić, Milče M. and Lazić, Žarko and Radulović, Katarina and Cvetanović-Zobenica, Katarina",
year = "2019",
abstract = "In this work an overview of Micro Electromechanical
Systems (MEMS)-based microfluidic platforms for
different applications is presented. Microfluidics refers
to a set of technologies that control the flow of liquids or
gases through miniaturized systems in typical amounts of
nano- and pico- liters. Microfluidic devices are
characterized by microchannels with characteristic
dimensions in the micrometer range. The main
techniques, technologies and materials used for
fabrication of MEMS microfluidic devices and systems
are presented. The used materials and their properties are
very important for the final characteristics and
functionalities of devices. As an example, the design and
fabrication of our opto-fluidic lab-on-a-chip device based
on silicon and pyrex glass is given.",
publisher = "Belgrade : ETRAN Society / Beograd : Društvo za ETRAN",
journal = "Proceedings of papers - (Ic) ETRAN 6th International Conference on Electrical, Electronical and Computing Engineering, June 03-06 2019, Silver Lake, Serbia",
title = "Microselectromechanical system (MEMS) based microfluidic platforms",
pages = "570-570",
url = "https://hdl.handle.net/21.15107/rcub_cer_7420"
}

Vasiljević-Radović, D., Rašljić, M., Smiljanić, M. M., Lazić, Ž., Radulović, K.,& Cvetanović-Zobenica, K.. (2019). Microselectromechanical system (MEMS) based microfluidic platforms. in Proceedings of papers - (Ic) ETRAN 6th International Conference on Electrical, Electronical and Computing Engineering, June 03-06 2019, Silver Lake, Serbia
Belgrade : ETRAN Society / Beograd : Društvo za ETRAN., 570-570.
https://hdl.handle.net/21.15107/rcub_cer_7420

Vasiljević-Radović D, Rašljić M, Smiljanić MM, Lazić Ž, Radulović K, Cvetanović-Zobenica K. Microselectromechanical system (MEMS) based microfluidic platforms. in Proceedings of papers - (Ic) ETRAN 6th International Conference on Electrical, Electronical and Computing Engineering, June 03-06 2019, Silver Lake, Serbia. 2019;:570-570.
https://hdl.handle.net/21.15107/rcub_cer_7420 .

Vasiljević-Radović, Dana, Rašljić, Milena, Smiljanić, Milče M., Lazić, Žarko, Radulović, Katarina, Cvetanović-Zobenica, Katarina, "Microselectromechanical system (MEMS) based microfluidic platforms" in Proceedings of papers - (Ic) ETRAN 6th International Conference on Electrical, Electronical and Computing Engineering, June 03-06 2019, Silver Lake, Serbia (2019):570-570,
https://hdl.handle.net/21.15107/rcub_cer_7420 .

TY  - CONF
AU  - Andrić, Stevan
AU  - Tomašević-Ilić, Tijana
AU  - Sarajlić, Milija
AU  - Lazić, Žarko
AU  - Cvetanović-Zobenica, Katarina
AU  - Rašljić, Milena
AU  - Smiljanić, Milče
AU  - Spasenović, Marko
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/7421
AB  - Chemical sensors are an enabling tool across many industries, including the largest ones such as  energy, transport, and construction. Low-cost, high performance sensors, especially ones compatible  with flexible substrates, are becoming increasingly important with the development of mobile  gadgets and wearable devices. Here we show humidity sensors produced from thin films of graphene  exfoliated in the liquid phase and deposited with Langmuir-Blodgett assembly. The films are formed  from connected nanoflakes that are ~120nm in diameter and ~10 layers thick. We show that such  films have an abundancy of reactive edges that act as binding sites for gas detection, enabling high  sensitivity to gas presence [1]. The method that we demonstrate uses low-cost processes, is highly  scalable and consistently yields films of high quality that can be deposited on any substrate, including flexible and transparent ones. We produce our thin films on top of a Si/SiO2 wafer with four contacts for measuring sheet resistance in real time as gas is introduced. The sensors that we make are more sensitive to humidity than ones demonstrated with CVD graphene [2], with up to 30% change in sheet resistance upon exposure to water vapor. Although we demonstrate detection of humidity, the same sensors can be used to detect other, both toxic and non-toxic gases.
PB  - Spain : Phantoms Foundation
PB  - France : Université de Strasbrourg / CNRS
PB  - Germany : TU Dresden / cfaed
C3  - European conference on chemistry of two-dimensional materials, Chem2Dmat - 2019, September 03-06, Dresden, Germany
T1  - Humidity sensing with Langmuir-Blodgett assembled  graphene films from liquid phase
SP  - 116
EP  - 116
UR  - https://hdl.handle.net/21.15107/rcub_cer_7421
ER  - 

@conference{
author = "Andrić, Stevan and Tomašević-Ilić, Tijana and Sarajlić, Milija and Lazić, Žarko and Cvetanović-Zobenica, Katarina and Rašljić, Milena and Smiljanić, Milče and Spasenović, Marko",
year = "2019",
abstract = "Chemical sensors are an enabling tool across many industries, including the largest ones such as  energy, transport, and construction. Low-cost, high performance sensors, especially ones compatible  with flexible substrates, are becoming increasingly important with the development of mobile  gadgets and wearable devices. Here we show humidity sensors produced from thin films of graphene  exfoliated in the liquid phase and deposited with Langmuir-Blodgett assembly. The films are formed  from connected nanoflakes that are ~120nm in diameter and ~10 layers thick. We show that such  films have an abundancy of reactive edges that act as binding sites for gas detection, enabling high  sensitivity to gas presence [1]. The method that we demonstrate uses low-cost processes, is highly  scalable and consistently yields films of high quality that can be deposited on any substrate, including flexible and transparent ones. We produce our thin films on top of a Si/SiO2 wafer with four contacts for measuring sheet resistance in real time as gas is introduced. The sensors that we make are more sensitive to humidity than ones demonstrated with CVD graphene [2], with up to 30% change in sheet resistance upon exposure to water vapor. Although we demonstrate detection of humidity, the same sensors can be used to detect other, both toxic and non-toxic gases.",
publisher = "Spain : Phantoms Foundation, France : Université de Strasbrourg / CNRS, Germany : TU Dresden / cfaed",
journal = "European conference on chemistry of two-dimensional materials, Chem2Dmat - 2019, September 03-06, Dresden, Germany",
title = "Humidity sensing with Langmuir-Blodgett assembled  graphene films from liquid phase",
pages = "116-116",
url = "https://hdl.handle.net/21.15107/rcub_cer_7421"
}

Andrić, S., Tomašević-Ilić, T., Sarajlić, M., Lazić, Ž., Cvetanović-Zobenica, K., Rašljić, M., Smiljanić, M.,& Spasenović, M.. (2019). Humidity sensing with Langmuir-Blodgett assembled  graphene films from liquid phase. in European conference on chemistry of two-dimensional materials, Chem2Dmat - 2019, September 03-06, Dresden, Germany
Spain : Phantoms Foundation., 116-116.
https://hdl.handle.net/21.15107/rcub_cer_7421

Andrić S, Tomašević-Ilić T, Sarajlić M, Lazić Ž, Cvetanović-Zobenica K, Rašljić M, Smiljanić M, Spasenović M. Humidity sensing with Langmuir-Blodgett assembled  graphene films from liquid phase. in European conference on chemistry of two-dimensional materials, Chem2Dmat - 2019, September 03-06, Dresden, Germany. 2019;:116-116.
https://hdl.handle.net/21.15107/rcub_cer_7421 .

Andrić, Stevan, Tomašević-Ilić, Tijana, Sarajlić, Milija, Lazić, Žarko, Cvetanović-Zobenica, Katarina, Rašljić, Milena, Smiljanić, Milče, Spasenović, Marko, "Humidity sensing with Langmuir-Blodgett assembled  graphene films from liquid phase" in European conference on chemistry of two-dimensional materials, Chem2Dmat - 2019, September 03-06, Dresden, Germany (2019):116-116,
https://hdl.handle.net/21.15107/rcub_cer_7421 .

TY  - CONF
AU  - Stevanović, Jelena
AU  - Lazić, Žarko
AU  - Smiljanić, Milče M.
AU  - Radulović, Katarina
AU  - Randjelović, Danijela
AU  - Frantlović, Miloš
AU  - Sarajlić, Milija
PY  - 2019
UR  - https://www.etran.rs/2019/IcETRAN/About_Conference/
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4007
AB  - A consideration study for the application of the pressure sensor SP-12 developed and produced by ICTM CMT as an ultrasound sensor is given. The interaction of ultrasound with the sensor’s membrane was analytically described, but for the initial examination of its performance, Finite Elements Method simulation was applied. The sensor SP-12 has eigenfrequencies in the range from 200 kHz to the frequencies higher than 2 MHz. The amplitude of the output signal, which is proportional to Von Mises stress, is highest for the lowest frequency, and it exponentially decreases as the eigenfrequencies increase. This makes the sensor suitable for the ultrasound measurements in the range of hundreds of kHz
PB  - Belgrade : ETRAN Society
PB  - Belgrade : Akademska misao
C3  - Proceedings - 6th International Conference on Electrical, Electronics and Computing Engineering, IcETRAN 2019
T1  - A consideration of the use of ICTM SP-12 pressure sensor for ultrasound sensing
UR  - https://hdl.handle.net/21.15107/rcub_cer_4007
ER  - 

@conference{
author = "Stevanović, Jelena and Lazić, Žarko and Smiljanić, Milče M. and Radulović, Katarina and Randjelović, Danijela and Frantlović, Miloš and Sarajlić, Milija",
year = "2019",
abstract = "A consideration study for the application of the pressure sensor SP-12 developed and produced by ICTM CMT as an ultrasound sensor is given. The interaction of ultrasound with the sensor’s membrane was analytically described, but for the initial examination of its performance, Finite Elements Method simulation was applied. The sensor SP-12 has eigenfrequencies in the range from 200 kHz to the frequencies higher than 2 MHz. The amplitude of the output signal, which is proportional to Von Mises stress, is highest for the lowest frequency, and it exponentially decreases as the eigenfrequencies increase. This makes the sensor suitable for the ultrasound measurements in the range of hundreds of kHz",
publisher = "Belgrade : ETRAN Society, Belgrade : Akademska misao",
journal = "Proceedings - 6th International Conference on Electrical, Electronics and Computing Engineering, IcETRAN 2019",
title = "A consideration of the use of ICTM SP-12 pressure sensor for ultrasound sensing",
url = "https://hdl.handle.net/21.15107/rcub_cer_4007"
}

Stevanović, J., Lazić, Ž., Smiljanić, M. M., Radulović, K., Randjelović, D., Frantlović, M.,& Sarajlić, M.. (2019). A consideration of the use of ICTM SP-12 pressure sensor for ultrasound sensing. in Proceedings - 6th International Conference on Electrical, Electronics and Computing Engineering, IcETRAN 2019
Belgrade : ETRAN Society..
https://hdl.handle.net/21.15107/rcub_cer_4007

Stevanović J, Lazić Ž, Smiljanić MM, Radulović K, Randjelović D, Frantlović M, Sarajlić M. A consideration of the use of ICTM SP-12 pressure sensor for ultrasound sensing. in Proceedings - 6th International Conference on Electrical, Electronics and Computing Engineering, IcETRAN 2019. 2019;.
https://hdl.handle.net/21.15107/rcub_cer_4007 .

Stevanović, Jelena, Lazić, Žarko, Smiljanić, Milče M., Radulović, Katarina, Randjelović, Danijela, Frantlović, Miloš, Sarajlić, Milija, "A consideration of the use of ICTM SP-12 pressure sensor for ultrasound sensing" in Proceedings - 6th International Conference on Electrical, Electronics and Computing Engineering, IcETRAN 2019 (2019),
https://hdl.handle.net/21.15107/rcub_cer_4007 .

TY  - CONF
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Radjenović, Branislav
AU  - Radjenović-Radmilović, Marija
AU  - Jović, Vesna
AU  - Rašljić, Milena
AU  - Cvetanović, Katarina
AU  - Filipović, Ana
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5771
AB  - In this paper, we present and analyze etching of 
parallelogram patterns in the masking layer on a (100) silicon in 
25 wt % TMAH water solution at the temperature of 80 0C. Sides 
of parallelogram islands in the masking layer are designed along 
<n10> and <100> crystallographic directions. A 3D simulation of 
the profile evolution from these patterns during etching of silicon 
using the level set method is also presented. We determined all
crystallographic planes that appear during etching in the 
experiment and obtained simulated etching profiles of these 3D 
structures. A good agreement between dominant 
crystallographic planes through experiments and simulations is 
obtained.
PB  - Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering
C3  - Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia
T1  - Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH
SP  - 584
EP  - 589
UR  - https://hdl.handle.net/21.15107/rcub_cer_5771
ER  - 

@conference{
author = "Smiljanić, Milče M. and Lazić, Žarko and Radjenović, Branislav and Radjenović-Radmilović, Marija and Jović, Vesna and Rašljić, Milena and Cvetanović, Katarina and Filipović, Ana",
year = "2019",
abstract = "In this paper, we present and analyze etching of 
parallelogram patterns in the masking layer on a (100) silicon in 
25 wt % TMAH water solution at the temperature of 80 0C. Sides 
of parallelogram islands in the masking layer are designed along 
<n10> and <100> crystallographic directions. A 3D simulation of 
the profile evolution from these patterns during etching of silicon 
using the level set method is also presented. We determined all
crystallographic planes that appear during etching in the 
experiment and obtained simulated etching profiles of these 3D 
structures. A good agreement between dominant 
crystallographic planes through experiments and simulations is 
obtained.",
publisher = "Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering",
journal = "Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia",
title = "Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH",
pages = "584-589",
url = "https://hdl.handle.net/21.15107/rcub_cer_5771"
}

Smiljanić, M. M., Lazić, Ž., Radjenović, B., Radjenović-Radmilović, M., Jović, V., Rašljić, M., Cvetanović, K.,& Filipović, A.. (2019). Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH. in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia
Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering., 584-589.
https://hdl.handle.net/21.15107/rcub_cer_5771

Smiljanić MM, Lazić Ž, Radjenović B, Radjenović-Radmilović M, Jović V, Rašljić M, Cvetanović K, Filipović A. Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH. in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia. 2019;:584-589.
https://hdl.handle.net/21.15107/rcub_cer_5771 .

Smiljanić, Milče M., Lazić, Žarko, Radjenović, Branislav, Radjenović-Radmilović, Marija, Jović, Vesna, Rašljić, Milena, Cvetanović, Katarina, Filipović, Ana, "Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH" in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia (2019):584-589,
https://hdl.handle.net/21.15107/rcub_cer_5771 .

TY  - CONF
AU  - Bošković, Marko
AU  - Randjelović, Danijela
AU  - Rašljić, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Lazić, Žarko
AU  - Smiljanić, Milče M.
AU  - Sarajlić, Milija
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5770
AB  - A novel concept of vacuum pressure sensor based 
on thin film technology is presented. The sensor is designed as 
a 1 µm thick aluminium film patterned as a structure of 
wedges facing each other along a sharp tip. The distance 
between the wedge tips is 3 µm. This structure is obtained by 
laser writing in vector mode. Parts of the sensor structure are 
fabricated and measured. Analytical consideration of the 
proposed structure is given together with the concept of the 
experimental set up for testing of the sensor
PB  - Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering
C3  - Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia
T1  - Consideration of Thin Film Ionization Vacuum Pressure Sensor
SP  - 579
EP  - 583
UR  - https://hdl.handle.net/21.15107/rcub_cer_5770
ER  - 

@conference{
author = "Bošković, Marko and Randjelović, Danijela and Rašljić, Milena and Cvetanović Zobenica, Katarina and Lazić, Žarko and Smiljanić, Milče M. and Sarajlić, Milija",
year = "2019",
abstract = "A novel concept of vacuum pressure sensor based 
on thin film technology is presented. The sensor is designed as 
a 1 µm thick aluminium film patterned as a structure of 
wedges facing each other along a sharp tip. The distance 
between the wedge tips is 3 µm. This structure is obtained by 
laser writing in vector mode. Parts of the sensor structure are 
fabricated and measured. Analytical consideration of the 
proposed structure is given together with the concept of the 
experimental set up for testing of the sensor",
publisher = "Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering",
journal = "Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia",
title = "Consideration of Thin Film Ionization Vacuum Pressure Sensor",
pages = "579-583",
url = "https://hdl.handle.net/21.15107/rcub_cer_5770"
}

Bošković, M., Randjelović, D., Rašljić, M., Cvetanović Zobenica, K., Lazić, Ž., Smiljanić, M. M.,& Sarajlić, M.. (2019). Consideration of Thin Film Ionization Vacuum Pressure Sensor. in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia
Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering., 579-583.
https://hdl.handle.net/21.15107/rcub_cer_5770

Bošković M, Randjelović D, Rašljić M, Cvetanović Zobenica K, Lazić Ž, Smiljanić MM, Sarajlić M. Consideration of Thin Film Ionization Vacuum Pressure Sensor. in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia. 2019;:579-583.
https://hdl.handle.net/21.15107/rcub_cer_5770 .

Bošković, Marko, Randjelović, Danijela, Rašljić, Milena, Cvetanović Zobenica, Katarina, Lazić, Žarko, Smiljanić, Milče M., Sarajlić, Milija, "Consideration of Thin Film Ionization Vacuum Pressure Sensor" in Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia (2019):579-583,
https://hdl.handle.net/21.15107/rcub_cer_5770 .

TY  - GEN
AU  - Poljak, Predrag
AU  - Frantlović, Miloš
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Jokić, Ivana
AU  - Randjelović, Danijela
AU  - Jakšić, Olga
AU  - Tanasković, Dragan
AU  - Vasiljević-Radović, Dana
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3986
AB  - Ово техничко решење обухвата хардверско-софтверски систем који омогућује
аутоматско спровођење карактеризације већег броја силицијумских пиезоотпорних
МЕМС сензора притиска истовремено. Користи се за одређивање зависности
електричних параметара таквих сензора од притиска и температуре. Апаратура, поред
комерцијално доступне, обухвата опрему развијену у Центру за микроелектронске
технологије (ИХТМ–ЦМТ), а софтверска апликација која служи за управљање
процесом је у потпуности развијена у ИХТМ–ЦМТ.
PB  - Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy
T1  - Апаратура за аутоматску карактеризацију силицијумских пиезоотпорних МЕМС сензора притиска
UR  - https://hdl.handle.net/21.15107/rcub_cer_3986
ER  - 

@misc{
author = "Poljak, Predrag and Frantlović, Miloš and Smiljanić, Milče M. and Lazić, Žarko and Jokić, Ivana and Randjelović, Danijela and Jakšić, Olga and Tanasković, Dragan and Vasiljević-Radović, Dana",
year = "2019",
abstract = "Ово техничко решење обухвата хардверско-софтверски систем који омогућује
аутоматско спровођење карактеризације већег броја силицијумских пиезоотпорних
МЕМС сензора притиска истовремено. Користи се за одређивање зависности
електричних параметара таквих сензора од притиска и температуре. Апаратура, поред
комерцијално доступне, обухвата опрему развијену у Центру за микроелектронске
технологије (ИХТМ–ЦМТ), а софтверска апликација која служи за управљање
процесом је у потпуности развијена у ИХТМ–ЦМТ.",
publisher = "Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy",
title = "Апаратура за аутоматску карактеризацију силицијумских пиезоотпорних МЕМС сензора притиска",
url = "https://hdl.handle.net/21.15107/rcub_cer_3986"
}

Poljak, P., Frantlović, M., Smiljanić, M. M., Lazić, Ž., Jokić, I., Randjelović, D., Jakšić, O., Tanasković, D.,& Vasiljević-Radović, D.. (2019). Апаратура за аутоматску карактеризацију силицијумских пиезоотпорних МЕМС сензора притиска. 
Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy..
https://hdl.handle.net/21.15107/rcub_cer_3986

Poljak P, Frantlović M, Smiljanić MM, Lazić Ž, Jokić I, Randjelović D, Jakšić O, Tanasković D, Vasiljević-Radović D. Апаратура за аутоматску карактеризацију силицијумских пиезоотпорних МЕМС сензора притиска. 2019;.
https://hdl.handle.net/21.15107/rcub_cer_3986 .

Poljak, Predrag, Frantlović, Miloš, Smiljanić, Milče M., Lazić, Žarko, Jokić, Ivana, Randjelović, Danijela, Jakšić, Olga, Tanasković, Dragan, Vasiljević-Radović, Dana, "Апаратура за аутоматску карактеризацију силицијумских пиезоотпорних МЕМС сензора притиска" (2019),
https://hdl.handle.net/21.15107/rcub_cer_3986 .

TY  - JOUR
AU  - Sarajlić, Milija
AU  - Frantlović, Miloš
AU  - Smiljanić, Milče
AU  - Rašljić, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Lazić, Žarko
AU  - Vasiljević-Radović, Dana
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3251
AB  - A temperature sensor based on four thin-film resistors is presented. Four resistors are made in the form of thin metal layer meanders on the surface of a silicon chip. Two resistors are covered with a layer of 2.3 µm thick hard baked photoresist. Two other resistors are exposed to ambient air. The photoresist cover on two of the resistors makes a mismatch in the temperature coefficient of resistance between the covered and exposed resistors, thus enabling functionality of the system as a temperature sensor. The resistors are connected in the Wheatstone bridge configuration in order to enhance the sensitivity of the structure. Resistor meanders are 500 µm  ×  500 µm in lateral dimensions, each consisting of a 10 µm wide metal strip with 10 µm clearance between the strips. The total length of each strip is 12.5 mm. The material used for the meanders is 100 nm thick sputtered gold. The sensor was tested in a temperature chamber in the range from 80 °C to  −50 °C. The matching between the sensor's output and the readings obtained by the Pt1000 reference sensor was within  ±0.1 °C (static), but the influence of water vapor adsorption at the exposed resistors surface on temperature measurements was visible. The sensor has potential applications in temperature measurements in air.
PB  - IOP Publishing
T2  - Measurement Science and Technology
T1  - Thin-film four-resistor temperature sensor for measurements in air
VL  - 30
IS  - 11
SP  - 115102
DO  - 10.1088/1361-6501/ab326c
ER  - 

@article{
author = "Sarajlić, Milija and Frantlović, Miloš and Smiljanić, Milče and Rašljić, Milena and Cvetanović Zobenica, Katarina and Lazić, Žarko and Vasiljević-Radović, Dana",
year = "2019",
abstract = "A temperature sensor based on four thin-film resistors is presented. Four resistors are made in the form of thin metal layer meanders on the surface of a silicon chip. Two resistors are covered with a layer of 2.3 µm thick hard baked photoresist. Two other resistors are exposed to ambient air. The photoresist cover on two of the resistors makes a mismatch in the temperature coefficient of resistance between the covered and exposed resistors, thus enabling functionality of the system as a temperature sensor. The resistors are connected in the Wheatstone bridge configuration in order to enhance the sensitivity of the structure. Resistor meanders are 500 µm  ×  500 µm in lateral dimensions, each consisting of a 10 µm wide metal strip with 10 µm clearance between the strips. The total length of each strip is 12.5 mm. The material used for the meanders is 100 nm thick sputtered gold. The sensor was tested in a temperature chamber in the range from 80 °C to  −50 °C. The matching between the sensor's output and the readings obtained by the Pt1000 reference sensor was within  ±0.1 °C (static), but the influence of water vapor adsorption at the exposed resistors surface on temperature measurements was visible. The sensor has potential applications in temperature measurements in air.",
publisher = "IOP Publishing",
journal = "Measurement Science and Technology",
title = "Thin-film four-resistor temperature sensor for measurements in air",
volume = "30",
number = "11",
pages = "115102",
doi = "10.1088/1361-6501/ab326c"
}

Sarajlić, M., Frantlović, M., Smiljanić, M., Rašljić, M., Cvetanović Zobenica, K., Lazić, Ž.,& Vasiljević-Radović, D.. (2019). Thin-film four-resistor temperature sensor for measurements in air. in Measurement Science and Technology
IOP Publishing., 30(11), 115102.
https://doi.org/10.1088/1361-6501/ab326c

Sarajlić M, Frantlović M, Smiljanić M, Rašljić M, Cvetanović Zobenica K, Lazić Ž, Vasiljević-Radović D. Thin-film four-resistor temperature sensor for measurements in air. in Measurement Science and Technology. 2019;30(11):115102.
doi:10.1088/1361-6501/ab326c .

Sarajlić, Milija, Frantlović, Miloš, Smiljanić, Milče, Rašljić, Milena, Cvetanović Zobenica, Katarina, Lazić, Žarko, Vasiljević-Radović, Dana, "Thin-film four-resistor temperature sensor for measurements in air" in Measurement Science and Technology, 30, no. 11 (2019):115102,
https://doi.org/10.1088/1361-6501/ab326c . .

TY  - GEN
AU  - Rašljić, Milena
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Cvetanović Zobenica, Katarina
AU  - Filipović, Ana
AU  - Sarajlić, Milija
AU  - Vasiljević-Radović, Dana
PY  - 2019
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3976
AB  - Vlažnim hemijskim nagrizanjem u vodenom rastvoru HF (49%) se mogu napraviti i
različite 3D strukture od Pyrex stakla koje daju još jedan stepen slobode u projektovanju senzora i aktuatora. Ovaj tehnološki proces omogućava dobijanje otvora, jama i kanala mikrometarskih dimenzija kvalitetnih ivica i površine boljeg kvaliteta na pločici od Pyrex stakla. U IHTM-CMT je razvijen tehnološki postupak za nagrizanje Pyrex pločice sa jedne strane. Ovo tehničko rešenje predstavlja razvijanje tehnološkog postupka koji omogućava nagrizanje pločica sa obe strane, kako istovremeno, tako i jednu po jednu stranu. Novim tehnološkim postupkom će se izrađivati hemijski mikroreaktori i biološke platforme u okviru IHTM-CMT.
PB  - Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy
T1  - Dvostrano vlažno hemijsko nagrizanje Pyrex stakla
UR  - https://hdl.handle.net/21.15107/rcub_cer_3976
ER  - 

@misc{
author = "Rašljić, Milena and Smiljanić, Milče M. and Lazić, Žarko and Cvetanović Zobenica, Katarina and Filipović, Ana and Sarajlić, Milija and Vasiljević-Radović, Dana",
year = "2019",
abstract = "Vlažnim hemijskim nagrizanjem u vodenom rastvoru HF (49%) se mogu napraviti i
različite 3D strukture od Pyrex stakla koje daju još jedan stepen slobode u projektovanju senzora i aktuatora. Ovaj tehnološki proces omogućava dobijanje otvora, jama i kanala mikrometarskih dimenzija kvalitetnih ivica i površine boljeg kvaliteta na pločici od Pyrex stakla. U IHTM-CMT je razvijen tehnološki postupak za nagrizanje Pyrex pločice sa jedne strane. Ovo tehničko rešenje predstavlja razvijanje tehnološkog postupka koji omogućava nagrizanje pločica sa obe strane, kako istovremeno, tako i jednu po jednu stranu. Novim tehnološkim postupkom će se izrađivati hemijski mikroreaktori i biološke platforme u okviru IHTM-CMT.",
publisher = "Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy",
title = "Dvostrano vlažno hemijsko nagrizanje Pyrex stakla",
url = "https://hdl.handle.net/21.15107/rcub_cer_3976"
}

Rašljić, M., Smiljanić, M. M., Lazić, Ž., Cvetanović Zobenica, K., Filipović, A., Sarajlić, M.,& Vasiljević-Radović, D.. (2019). Dvostrano vlažno hemijsko nagrizanje Pyrex stakla. 
Belgrade : University of Belgrade - Institute of Chemistry, Technology and Metallurgy..
https://hdl.handle.net/21.15107/rcub_cer_3976

Rašljić M, Smiljanić MM, Lazić Ž, Cvetanović Zobenica K, Filipović A, Sarajlić M, Vasiljević-Radović D. Dvostrano vlažno hemijsko nagrizanje Pyrex stakla. 2019;.
https://hdl.handle.net/21.15107/rcub_cer_3976 .

Rašljić, Milena, Smiljanić, Milče M., Lazić, Žarko, Cvetanović Zobenica, Katarina, Filipović, Ana, Sarajlić, Milija, Vasiljević-Radović, Dana, "Dvostrano vlažno hemijsko nagrizanje Pyrex stakla" (2019),
https://hdl.handle.net/21.15107/rcub_cer_3976 .

TY  - JOUR
AU  - Smiljanić, Milče
AU  - Lazić, Žarko
AU  - Rađenović, Branislav
AU  - Radmilović-Radjenović, Marija
AU  - Jović, Vesna
PY  - 2019
UR  - http://www.mdpi.com/2072-666X/10/2/102
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/2640
AB  - Squares and circles are basic patterns for most mask designs of silicon microdevices. Evolution of etched Si crystallographic planes defined by square and circle patterns in the masking layer is presented and analyzed in this paper. The sides of square patterns in the masking layer are designed along predetermined <n10> crystallographic directions. Etching of a (100) silicon substrate is performed in 25 wt % tetramethylammonium hydroxide (TMAH) water solution at the temperature of 80 °C. Additionally, this paper presents three-dimensional (3D) simulations of the profile evolution during silicon etching of designed patterns based on the level-set method. We analyzed etching of designed patterns in the shape of square and circle islands. The crystallographic planes that appear during etching of 3D structures in the experiment and simulated etching profiles are determined. A good agreement between dominant crystallographic planes through experiments and simulations is obtained. The etch rates of dominant exposed crystallographic planes are also analytically calculated.
PB  - MDPI
T2  - Micromachines
T2  - Micromachines
T1  - Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH
VL  - 10
IS  - 2
SP  - 102
DO  - 10.3390/mi10020102
ER  - 

@article{
author = "Smiljanić, Milče and Lazić, Žarko and Rađenović, Branislav and Radmilović-Radjenović, Marija and Jović, Vesna",
year = "2019",
abstract = "Squares and circles are basic patterns for most mask designs of silicon microdevices. Evolution of etched Si crystallographic planes defined by square and circle patterns in the masking layer is presented and analyzed in this paper. The sides of square patterns in the masking layer are designed along predetermined <n10> crystallographic directions. Etching of a (100) silicon substrate is performed in 25 wt % tetramethylammonium hydroxide (TMAH) water solution at the temperature of 80 °C. Additionally, this paper presents three-dimensional (3D) simulations of the profile evolution during silicon etching of designed patterns based on the level-set method. We analyzed etching of designed patterns in the shape of square and circle islands. The crystallographic planes that appear during etching of 3D structures in the experiment and simulated etching profiles are determined. A good agreement between dominant crystallographic planes through experiments and simulations is obtained. The etch rates of dominant exposed crystallographic planes are also analytically calculated.",
publisher = "MDPI",
journal = "Micromachines, Micromachines",
title = "Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH",
volume = "10",
number = "2",
pages = "102",
doi = "10.3390/mi10020102"
}

Smiljanić, M., Lazić, Ž., Rađenović, B., Radmilović-Radjenović, M.,& Jović, V.. (2019). Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH. in Micromachines
MDPI., 10(2), 102.
https://doi.org/10.3390/mi10020102

Smiljanić M, Lazić Ž, Rađenović B, Radmilović-Radjenović M, Jović V. Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH. in Micromachines. 2019;10(2):102.
doi:10.3390/mi10020102 .

Smiljanić, Milče, Lazić, Žarko, Rađenović, Branislav, Radmilović-Radjenović, Marija, Jović, Vesna, "Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH" in Micromachines, 10, no. 2 (2019):102,
https://doi.org/10.3390/mi10020102 . .

TY  - CONF
AU  - Sarajlić, Milija
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Cvetanović Zobenica, Katarina
AU  - Randjelović, Danijela
AU  - Vasiljević-Radović, Dana
PY  - 2018
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5793
AB  - Chemical sensors are the key part of the sensing 
platforms. They have different operating principles, but most of 
them are based on microstructures formed on the surface of the 
chip. In this paper we present technique for obtaining micro 
sized structures for the use in two different types of the chemical 
sensors. One type of the sensor is based on the electrical 
conductivity alteration in Au thin-film while the other is based 
on the optical properties of periodic metallic structures utilizing 
plasmonic effects. Technique presented here is based on the laser 
writing on the photosensitive material in “vector mode” where 
only continuous lines could be directly written. Width of the 
written lines is modified by alternating technique parameters. 
Narrowest obtained lines have width of about 1 m with 
clearance of about 3 m.
PB  - ETRAN Society
C3  - Proceedings of papers- 5th International Conference on Electrical, Electronic  and Computing Engineering, IcETRAN 2018, une 11 - 14, 2018, Palić, Serbia
T1  - Direct Laser Writing of micro-structures in vector mode for chemical sensors
SP  - 949
EP  - 952
UR  - https://hdl.handle.net/21.15107/rcub_cer_5793
ER  - 

@conference{
author = "Sarajlić, Milija and Smiljanić, Milče M. and Lazić, Žarko and Cvetanović Zobenica, Katarina and Randjelović, Danijela and Vasiljević-Radović, Dana",
year = "2018",
abstract = "Chemical sensors are the key part of the sensing 
platforms. They have different operating principles, but most of 
them are based on microstructures formed on the surface of the 
chip. In this paper we present technique for obtaining micro 
sized structures for the use in two different types of the chemical 
sensors. One type of the sensor is based on the electrical 
conductivity alteration in Au thin-film while the other is based 
on the optical properties of periodic metallic structures utilizing 
plasmonic effects. Technique presented here is based on the laser 
writing on the photosensitive material in “vector mode” where 
only continuous lines could be directly written. Width of the 
written lines is modified by alternating technique parameters. 
Narrowest obtained lines have width of about 1 m with 
clearance of about 3 m.",
publisher = "ETRAN Society",
journal = "Proceedings of papers- 5th International Conference on Electrical, Electronic  and Computing Engineering, IcETRAN 2018, une 11 - 14, 2018, Palić, Serbia",
title = "Direct Laser Writing of micro-structures in vector mode for chemical sensors",
pages = "949-952",
url = "https://hdl.handle.net/21.15107/rcub_cer_5793"
}

Sarajlić, M., Smiljanić, M. M., Lazić, Ž., Cvetanović Zobenica, K., Randjelović, D.,& Vasiljević-Radović, D.. (2018). Direct Laser Writing of micro-structures in vector mode for chemical sensors. in Proceedings of papers- 5th International Conference on Electrical, Electronic  and Computing Engineering, IcETRAN 2018, une 11 - 14, 2018, Palić, Serbia
ETRAN Society., 949-952.
https://hdl.handle.net/21.15107/rcub_cer_5793

Sarajlić M, Smiljanić MM, Lazić Ž, Cvetanović Zobenica K, Randjelović D, Vasiljević-Radović D. Direct Laser Writing of micro-structures in vector mode for chemical sensors. in Proceedings of papers- 5th International Conference on Electrical, Electronic  and Computing Engineering, IcETRAN 2018, une 11 - 14, 2018, Palić, Serbia. 2018;:949-952.
https://hdl.handle.net/21.15107/rcub_cer_5793 .

Sarajlić, Milija, Smiljanić, Milče M., Lazić, Žarko, Cvetanović Zobenica, Katarina, Randjelović, Danijela, Vasiljević-Radović, Dana, "Direct Laser Writing of micro-structures in vector mode for chemical sensors" in Proceedings of papers- 5th International Conference on Electrical, Electronic  and Computing Engineering, IcETRAN 2018, une 11 - 14, 2018, Palić, Serbia (2018):949-952,
https://hdl.handle.net/21.15107/rcub_cer_5793 .

TY  - CONF
AU  - Rašljić, Milena
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
AU  - Radulović, Katarina
AU  - Cvetanović Zobenica, Katarina
AU  - Vasiljević-Radović, Dana
PY  - 2018
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5730
AB  - In this paper it is shown how we fabricated two types of heaters for microreactors which are used in synthesis of TiO2 nanoparticles. We used standard photolithographic processes to design gold and p-type heaters diffused in n-type silicon substrate. Heaters are designed to be integrated part of microreactors. The temperature necessary for synthesis of TiO2 nanoparticles is achieved with both types of heaters. P-type diffused heaters are shown better in terms of power
consumption.
PB  - Belgrade : ETRAN Society
C3  - Proceedings of Papers – 5th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2018, 11-14.06.2018, Palić
T1  - Two types of integrated heaters for synthesis of TiO2 nanoparticles in microreactors
SP  - 953
EP  - 956
UR  - https://hdl.handle.net/21.15107/rcub_cer_5730
ER  - 

@conference{
author = "Rašljić, Milena and Smiljanić, Milče M. and Lazić, Žarko and Radulović, Katarina and Cvetanović Zobenica, Katarina and Vasiljević-Radović, Dana",
year = "2018",
abstract = "In this paper it is shown how we fabricated two types of heaters for microreactors which are used in synthesis of TiO2 nanoparticles. We used standard photolithographic processes to design gold and p-type heaters diffused in n-type silicon substrate. Heaters are designed to be integrated part of microreactors. The temperature necessary for synthesis of TiO2 nanoparticles is achieved with both types of heaters. P-type diffused heaters are shown better in terms of power
consumption.",
publisher = "Belgrade : ETRAN Society",
journal = "Proceedings of Papers – 5th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2018, 11-14.06.2018, Palić",
title = "Two types of integrated heaters for synthesis of TiO2 nanoparticles in microreactors",
pages = "953-956",
url = "https://hdl.handle.net/21.15107/rcub_cer_5730"
}

Rašljić, M., Smiljanić, M. M., Lazić, Ž., Radulović, K., Cvetanović Zobenica, K.,& Vasiljević-Radović, D.. (2018). Two types of integrated heaters for synthesis of TiO2 nanoparticles in microreactors. in Proceedings of Papers – 5th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2018, 11-14.06.2018, Palić
Belgrade : ETRAN Society., 953-956.
https://hdl.handle.net/21.15107/rcub_cer_5730

Rašljić M, Smiljanić MM, Lazić Ž, Radulović K, Cvetanović Zobenica K, Vasiljević-Radović D. Two types of integrated heaters for synthesis of TiO2 nanoparticles in microreactors. in Proceedings of Papers – 5th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2018, 11-14.06.2018, Palić. 2018;:953-956.
https://hdl.handle.net/21.15107/rcub_cer_5730 .

Rašljić, Milena, Smiljanić, Milče M., Lazić, Žarko, Radulović, Katarina, Cvetanović Zobenica, Katarina, Vasiljević-Radović, Dana, "Two types of integrated heaters for synthesis of TiO2 nanoparticles in microreactors" in Proceedings of Papers – 5th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2018, 11-14.06.2018, Palić (2018):953-956,
https://hdl.handle.net/21.15107/rcub_cer_5730 .

TY  - CONF
AU  - Jović, Vesna
AU  - Lamovec, Jelena
AU  - Starčević, Marko
AU  - Đinović, Zoran
AU  - Smiljanić, Milče M.
AU  - Lazić, Žarko
PY  - 2018
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/5795
AB  - Nowadays, with no doubt, PDMS, poly(dimethylsiloxane) elastomer is material of choice for microfluidic 
fabrication because of its unique chemical, optical and mechanical properties. Unfortunately, it is not photo-definable (i.e. 
not a photoresist) and fabrication of PDMS MEM (micro-electro-mechanical) devices is typically done using soft 
lithography. Some steps of the process are difficult to perform without manually handling PDMS layers. Next problem to be 
considered in patterning PDMS membranes is bond strength between membrane and silicon substrate. To investigate this, 
we fabricated PDMS membranes on silicon either by spin coating Si wafer or transferring previously fabricated PDMS 
membrane to Si chip with bonding layer on it. PDMS network samples for this research were synthesized with the same 
composition, which are Sylgard 184 (Dow Corning, USA) silicone elastomer base and silicone elastomer curing agent, 
volume ratio 10:1. Fabrication of test structures is based on bulk micromachining on ⟨100⟩ oriented Si wafers to fabricate 
square cavities on which PDMS membranes were realized by one of mentioned procedures. Mechanical testing of PDMS 
membranes, elastic properties and adhesion strength of membranes with different thicknesses were investigated applying 
pressurized bulge testing. Pressure was applied to the PDMS membrane via nitrogen gas and the resulting load-deflection 
curves were monitoring.
PB  - Belgrade : The Military Technical Institute
C3  - Proceedings - 8th International Scientific Conference of Defensive Technologies, OTEH 2018, 11-12.10.2018, Belgrade
T1  - Experimental study of PDMS membranes fabricated either by spin coating or transfer bonding to a silicon chip with etched cavity
SP  - 462
EP  - 467
UR  - https://hdl.handle.net/21.15107/rcub_cer_5795
ER  - 

@conference{
author = "Jović, Vesna and Lamovec, Jelena and Starčević, Marko and Đinović, Zoran and Smiljanić, Milče M. and Lazić, Žarko",
year = "2018",
abstract = "Nowadays, with no doubt, PDMS, poly(dimethylsiloxane) elastomer is material of choice for microfluidic 
fabrication because of its unique chemical, optical and mechanical properties. Unfortunately, it is not photo-definable (i.e. 
not a photoresist) and fabrication of PDMS MEM (micro-electro-mechanical) devices is typically done using soft 
lithography. Some steps of the process are difficult to perform without manually handling PDMS layers. Next problem to be 
considered in patterning PDMS membranes is bond strength between membrane and silicon substrate. To investigate this, 
we fabricated PDMS membranes on silicon either by spin coating Si wafer or transferring previously fabricated PDMS 
membrane to Si chip with bonding layer on it. PDMS network samples for this research were synthesized with the same 
composition, which are Sylgard 184 (Dow Corning, USA) silicone elastomer base and silicone elastomer curing agent, 
volume ratio 10:1. Fabrication of test structures is based on bulk micromachining on ⟨100⟩ oriented Si wafers to fabricate 
square cavities on which PDMS membranes were realized by one of mentioned procedures. Mechanical testing of PDMS 
membranes, elastic properties and adhesion strength of membranes with different thicknesses were investigated applying 
pressurized bulge testing. Pressure was applied to the PDMS membrane via nitrogen gas and the resulting load-deflection 
curves were monitoring.",
publisher = "Belgrade : The Military Technical Institute",
journal = "Proceedings - 8th International Scientific Conference of Defensive Technologies, OTEH 2018, 11-12.10.2018, Belgrade",
title = "Experimental study of PDMS membranes fabricated either by spin coating or transfer bonding to a silicon chip with etched cavity",
pages = "462-467",
url = "https://hdl.handle.net/21.15107/rcub_cer_5795"
}

Jović, V., Lamovec, J., Starčević, M., Đinović, Z., Smiljanić, M. M.,& Lazić, Ž.. (2018). Experimental study of PDMS membranes fabricated either by spin coating or transfer bonding to a silicon chip with etched cavity. in Proceedings - 8th International Scientific Conference of Defensive Technologies, OTEH 2018, 11-12.10.2018, Belgrade
Belgrade : The Military Technical Institute., 462-467.
https://hdl.handle.net/21.15107/rcub_cer_5795

Jović V, Lamovec J, Starčević M, Đinović Z, Smiljanić MM, Lazić Ž. Experimental study of PDMS membranes fabricated either by spin coating or transfer bonding to a silicon chip with etched cavity. in Proceedings - 8th International Scientific Conference of Defensive Technologies, OTEH 2018, 11-12.10.2018, Belgrade. 2018;:462-467.
https://hdl.handle.net/21.15107/rcub_cer_5795 .

Jović, Vesna, Lamovec, Jelena, Starčević, Marko, Đinović, Zoran, Smiljanić, Milče M., Lazić, Žarko, "Experimental study of PDMS membranes fabricated either by spin coating or transfer bonding to a silicon chip with etched cavity" in Proceedings - 8th International Scientific Conference of Defensive Technologies, OTEH 2018, 11-12.10.2018, Belgrade (2018):462-467,
https://hdl.handle.net/21.15107/rcub_cer_5795 .

TY  - GEN
AU  - Rašljić, Milena
AU  - Gađanski, Ivana
AU  - Smiljanić, Milče M.
AU  - Janković, Novica Z.
AU  - Lazić, Žarko
AU  - Cvetanović Zobenica, Katarina
PY  - 2018
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3985
AB  - Ovo tehničko rešenje predstavlja razvoj novog tehnološkog procesa izrade mikrokanala.
Mikrokanali su osnovni deo svake mikrofludine naprave. Mikrokanali se izrađuju u polimeru
polidimetilsiloksanu (PDMS) uz pomoć tehnike uklanjanja žrtvenog materijala. Kao žrtveni materijal se koristi terpolimer akrilonitri-butadiene-stiren (ABS). ABS je jedan od materijala koji se koristi u izradi polimernih struktura trodimenzionalnom (3D) štampom.
PB  - Belgrade : Ministartvo za prosvetu, nauku i tehnološki razvoj - Projekat TR32008
T1  - Izrada mikrokanala uz pomoć 3D štampe i PDMS
UR  - https://hdl.handle.net/21.15107/rcub_cer_3985
ER  - 

@misc{
author = "Rašljić, Milena and Gađanski, Ivana and Smiljanić, Milče M. and Janković, Novica Z. and Lazić, Žarko and Cvetanović Zobenica, Katarina",
year = "2018",
abstract = "Ovo tehničko rešenje predstavlja razvoj novog tehnološkog procesa izrade mikrokanala.
Mikrokanali su osnovni deo svake mikrofludine naprave. Mikrokanali se izrađuju u polimeru
polidimetilsiloksanu (PDMS) uz pomoć tehnike uklanjanja žrtvenog materijala. Kao žrtveni materijal se koristi terpolimer akrilonitri-butadiene-stiren (ABS). ABS je jedan od materijala koji se koristi u izradi polimernih struktura trodimenzionalnom (3D) štampom.",
publisher = "Belgrade : Ministartvo za prosvetu, nauku i tehnološki razvoj - Projekat TR32008",
title = "Izrada mikrokanala uz pomoć 3D štampe i PDMS",
url = "https://hdl.handle.net/21.15107/rcub_cer_3985"
}

Rašljić, M., Gađanski, I., Smiljanić, M. M., Janković, N. Z., Lazić, Ž.,& Cvetanović Zobenica, K.. (2018). Izrada mikrokanala uz pomoć 3D štampe i PDMS. 
Belgrade : Ministartvo za prosvetu, nauku i tehnološki razvoj - Projekat TR32008..
https://hdl.handle.net/21.15107/rcub_cer_3985

Rašljić M, Gađanski I, Smiljanić MM, Janković NZ, Lazić Ž, Cvetanović Zobenica K. Izrada mikrokanala uz pomoć 3D štampe i PDMS. 2018;.
https://hdl.handle.net/21.15107/rcub_cer_3985 .

Rašljić, Milena, Gađanski, Ivana, Smiljanić, Milče M., Janković, Novica Z., Lazić, Žarko, Cvetanović Zobenica, Katarina, "Izrada mikrokanala uz pomoć 3D štampe i PDMS" (2018),
https://hdl.handle.net/21.15107/rcub_cer_3985 .

TY  - JOUR
AU  - Rašljić, Milena
AU  - Obradov, Marko
AU  - Lazić, Žarko
AU  - Vasiljević-Radović, Dana
AU  - Čupić, Željko
AU  - Stanisavljev, Dragomir
PY  - 2018
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/2481
AB  - In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light as well as enables us to merge plasmonic sensors and microreactors into a single device.
PB  - Springer
T2  - Optical and Quantum Electronics
T1  - Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors
VL  - 50
IS  - 6
SP  - 237
DO  - 10.1007/s11082-018-1507-z
ER  - 

@article{
author = "Rašljić, Milena and Obradov, Marko and Lazić, Žarko and Vasiljević-Radović, Dana and Čupić, Željko and Stanisavljev, Dragomir",
year = "2018",
abstract = "In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light as well as enables us to merge plasmonic sensors and microreactors into a single device.",
publisher = "Springer",
journal = "Optical and Quantum Electronics",
title = "Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors",
volume = "50",
number = "6",
pages = "237",
doi = "10.1007/s11082-018-1507-z"
}

Rašljić, M., Obradov, M., Lazić, Ž., Vasiljević-Radović, D., Čupić, Ž.,& Stanisavljev, D.. (2018). Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors. in Optical and Quantum Electronics
Springer., 50(6), 237.
https://doi.org/10.1007/s11082-018-1507-z

Rašljić M, Obradov M, Lazić Ž, Vasiljević-Radović D, Čupić Ž, Stanisavljev D. Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors. in Optical and Quantum Electronics. 2018;50(6):237.
doi:10.1007/s11082-018-1507-z .

Rašljić, Milena, Obradov, Marko, Lazić, Žarko, Vasiljević-Radović, Dana, Čupić, Željko, Stanisavljev, Dragomir, "Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors" in Optical and Quantum Electronics, 50, no. 6 (2018):237,
https://doi.org/10.1007/s11082-018-1507-z . .