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Response Surface Methodology and Artificial Neural Network-Based Models for Predicting Roughness of Cu coatings
(Belgrade: ETRAN – Society for electronics, telecommunication, computing, automatics and nuclear angineering, 2020)
Copper coatings are produced on silicon wafer by electrodeposition (ED) in pulsating current (PC) regime. Electrodeposition was performed at various current density amplitudes in the range of 80−140 mA cm-2, frequency in ...
Optimization of electrodeposition parameters to improve composite hardness of nickel coatings on brass substrate for varying film thicknesses and applied indentation loads
(Belgrade : ETRAN Society, 2022)
In this investigation, nickel coatings were electrodeposited on brass substrate. The effects of
electrodeposition process parameters such as, current density and deposition time (coatings thickness), on surface morphology ...