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Effect of the anodic current density on copper electrodeposition in the hydrogen co-deposition range by the reversing current (RC) regime
(Elsevier, 2011)
In this study, the effect of the anodic current density in the regime of reversing current (RC) on the quantity of evolved hydrogen and morphology of copper deposits was considered. The quantity of evolved hydrogen was ...
Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range
(Springer, New York, 2012)
The effect of the regime of pulsating current (PC) on copper electrodeposition in the hydrogen co-deposition range was examined by the techniques of scanning electron and optical microscopes. The quantities of evolved ...
Application of pulsating overpotential regime on the formation of copper deposits in the range of hydrogen co-deposition
(Springer, New York, 2010)
Electrodeposition of copper by pulsating overpotential (PO) regime in the range of hydrogen co-deposition was examined by scanning electron microscopy. It was found that the increase of the pause-to-pulse ratio produced a ...
Formation of dish-like holes and a channel structure in electrodeposition of copper under hydrogen co-deposition
(Elsevier, 2007)
Copper electrodeposition from acid sulfate solutions at an overpotential of 1000 mV, which is about 250 mV outside the plateau of the limiting diffusion current density, was examined by the determination of the average ...