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Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range

Authorized Users Only
2012
Authors
Nikolić, Nebojša D.
Branković, Goran
Maksimović, Vesna M.
Article (Published version)
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Abstract
The effect of the regime of pulsating current (PC) on copper electrodeposition in the hydrogen co-deposition range was examined by the techniques of scanning electron and optical microscopes. The quantities of evolved hydrogen and morphologies of electrodeposited copper strongly depended on the applied parameters of square waves PC, such as the current density amplitude (or the amplitude of the cathodic current density), deposition pulse, and pause duration. The increase of the current density amplitude led to intensification of hydrogen evolution reaction, and the change of morphology of electrodeposited copper from dendrites and shallow holes to dish-like holes was observed. For the constant pause duration, the prolonging deposition pulses intensify hydrogen evolution reaction leading to the formation of the honeycomb-like structures. The set of modified equations considering the effect of hydrogen generated during metal electrodeposition processes by the pulsating current regime is ...also presented. The concept of "effective overpotential amplitude" was proposed to explain the change of copper surface morphology with the intensification of hydrogen evolution reaction.

Keywords:
Electrodeposition / Copper / Hydrogen / Pulsating current / Scanning electron microscope (SEM) / Optical microscope
Source:
Journal of Solid State Electrochemistry, 2012, 16, 1, 321-328
Publisher:
  • Springer, New York
Funding / projects:
  • Electrochemical synthesis and characterization of nanostructured functional materials for application in new technologies (RS-172046)

DOI: 10.1007/s10008-011-1331-x

ISSN: 1432-8488

WoS: 000298651700040

Scopus: 2-s2.0-84855538319
[ Google Scholar ]
19
15
URI
https://cer.ihtm.bg.ac.rs/handle/123456789/1012
Collections
  • Radovi istraživača / Researchers' publications
Institution/Community
IHTM
TY  - JOUR
AU  - Nikolić, Nebojša D.
AU  - Branković, Goran
AU  - Maksimović, Vesna M.
PY  - 2012
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/1012
AB  - The effect of the regime of pulsating current (PC) on copper electrodeposition in the hydrogen co-deposition range was examined by the techniques of scanning electron and optical microscopes. The quantities of evolved hydrogen and morphologies of electrodeposited copper strongly depended on the applied parameters of square waves PC, such as the current density amplitude (or the amplitude of the cathodic current density), deposition pulse, and pause duration. The increase of the current density amplitude led to intensification of hydrogen evolution reaction, and the change of morphology of electrodeposited copper from dendrites and shallow holes to dish-like holes was observed. For the constant pause duration, the prolonging deposition pulses intensify hydrogen evolution reaction leading to the formation of the honeycomb-like structures. The set of modified equations considering the effect of hydrogen generated during metal electrodeposition processes by the pulsating current regime is also presented. The concept of "effective overpotential amplitude" was proposed to explain the change of copper surface morphology with the intensification of hydrogen evolution reaction.
PB  - Springer, New York
T2  - Journal of Solid State Electrochemistry
T1  - Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range
VL  - 16
IS  - 1
SP  - 321
EP  - 328
DO  - 10.1007/s10008-011-1331-x
ER  - 
@article{
author = "Nikolić, Nebojša D. and Branković, Goran and Maksimović, Vesna M.",
year = "2012",
abstract = "The effect of the regime of pulsating current (PC) on copper electrodeposition in the hydrogen co-deposition range was examined by the techniques of scanning electron and optical microscopes. The quantities of evolved hydrogen and morphologies of electrodeposited copper strongly depended on the applied parameters of square waves PC, such as the current density amplitude (or the amplitude of the cathodic current density), deposition pulse, and pause duration. The increase of the current density amplitude led to intensification of hydrogen evolution reaction, and the change of morphology of electrodeposited copper from dendrites and shallow holes to dish-like holes was observed. For the constant pause duration, the prolonging deposition pulses intensify hydrogen evolution reaction leading to the formation of the honeycomb-like structures. The set of modified equations considering the effect of hydrogen generated during metal electrodeposition processes by the pulsating current regime is also presented. The concept of "effective overpotential amplitude" was proposed to explain the change of copper surface morphology with the intensification of hydrogen evolution reaction.",
publisher = "Springer, New York",
journal = "Journal of Solid State Electrochemistry",
title = "Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range",
volume = "16",
number = "1",
pages = "321-328",
doi = "10.1007/s10008-011-1331-x"
}
Nikolić, N. D., Branković, G.,& Maksimović, V. M.. (2012). Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range. in Journal of Solid State Electrochemistry
Springer, New York., 16(1), 321-328.
https://doi.org/10.1007/s10008-011-1331-x
Nikolić ND, Branković G, Maksimović VM. Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range. in Journal of Solid State Electrochemistry. 2012;16(1):321-328.
doi:10.1007/s10008-011-1331-x .
Nikolić, Nebojša D., Branković, Goran, Maksimović, Vesna M., "Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range" in Journal of Solid State Electrochemistry, 16, no. 1 (2012):321-328,
https://doi.org/10.1007/s10008-011-1331-x . .

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