Fundamental aspects of plating technology I: The determination of the optimum deposition current density

dc.creator	Popov, Konstantin I.
dc.creator	Krstajić, Nedeljko V.
dc.creator	Popov, Svetlana R.
dc.date.accessioned	2021-04-05T09:01:57Z
dc.date.available	2021-04-05T09:01:57Z
dc.date.issued	1983
dc.identifier.issn	0376-4583
dc.identifier.uri	https://cer.ihtm.bg.ac.rs/handle/123456789/4417
dc.description.abstract	It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process.	sr
dc.language.iso	en	sr
dc.publisher	Elsevier	sr
dc.rights	restrictedAccess	sr
dc.source	Surface Technology	sr
dc.subject	electroplating	sr
dc.subject	plating technology	sr
dc.subject	polycrystalline metal deposits	sr
dc.subject	electrode	sr
dc.subject	Polarization Curve	sr
dc.title	Fundamental aspects of plating technology I: The determination of the optimum deposition current density	sr
dc.type	article	sr
dc.rights.license	ARR	sr
dcterms.abstract	Попов, Константин; Крстајић, Недељко В.; Попов, Светлана Р.;
dc.citation.volume	20
dc.citation.issue	3
dc.citation.spage	199
dc.citation.epage	202
dc.identifier.doi	10.1016/0376-4583(83)90003-1
dc.identifier.scopus	2-s2.0-0020849191
dc.type.version	publishedVersion	sr