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Response Surface Methodology and Artificial Neural Network-Based Models for Predicting Roughness of Cu coatings
(Belgrade: ETRAN – Society for electronics, telecommunication, computing, automatics and nuclear angineering, 2020)
Copper coatings are produced on silicon wafer by electrodeposition (ED) in pulsating current (PC) regime. Electrodeposition was performed at various current density amplitudes in the range of 80−140 mA cm-2, frequency in ...
Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)
(Niš, Serbia : RAD Centre, 2021)
Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the
range of the average current densities (jav) between 15 and 70 mA cm-2
. The selected values of the
average current densities ...