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Electrochemical deposition of titanium and aluminium from equimolar AlCl3+NaCl melt
(Romanian Chemical Society, 2019)
Electrodeposition of Al-Ti based materials is an attractive process offering
many advantages over more conventional processing methods. A number of articles on
aluminium-titanium intermetallics electrodeposited from ...
Preparation and mechanical characterization of copper thin films with additives on alloy substrates
(Belgrade : Institute of Chemistry, Technology and Metallurgy, 2017)
Thin copper films have various application in the electronic industry for the fabrication of
contacts in integrated circuits. Copper electroplating has been widely employed for
fabricating the wires of printed circuit ...
PdNi alloys as efficient catalysts for alcohol oxidation
(Crnogorsko društvo za koroziju, zaštitu materijala i zaštitu životne sredine, 2018)
The investigated PdNi alloys were prepared by electrochemical procedures
through simultaneous deposition of metals from the mixed solutions of their
precursors (0.01M PdCl2 + 0.6MNiCl2 + 2 MNH4Cl). Electrodeposited ...
Analysis and interpretation of bimetallic plasmonic metamaterial properties for forensic applications
(Belgrade : University of Criminal Investigation and Police Studies, 2023)
Plasmonic biochemical sensors, as a subgroup of optical refractometric sensors, are a topic of rapid research and development due to their ability to detect trace amounts of biochemical agents, ...
Electrochemical formation of magnesium oxide/hydroxide structures / Elektrohemijsko formiranje različitih oblika magnezijum oksida/hidroksida
(Serbian Society of Corrosion and Materials Protection (UISKoZaM), 2017)
Nanocrystalline magnesium oxides and hydroxides are attracting comprehensive attention due to their high surface area and their specific optical, thermal, electrical and chemical characteristics. Magnesium oxides and ...
Influence of parameters of the pulsating current (PC) regime on morphological, structural and hardness characteristics of copper coatings electrodeposited on Si(111)
(Niš, Serbia : RAD Centre, 2021)
Electrodeposition of Cu was performed on Si(111) by the pulsating current (PC) regime in the
range of the average current densities (jav) between 15 and 70 mA cm-2
. The selected values of the
average current densities ...