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Morphology and internal structure of copper deposits electrodeposited by the pulsating current regime in the hydrogen co-deposition range
(Springer, New York, 2012)
The effect of the regime of pulsating current (PC) on copper electrodeposition in the hydrogen co-deposition range was examined by the techniques of scanning electron and optical microscopes. The quantities of evolved ...
Application of pulsating overpotential regime on the formation of copper deposits in the range of hydrogen co-deposition
(Springer, New York, 2010)
Electrodeposition of copper by pulsating overpotential (PO) regime in the range of hydrogen co-deposition was examined by scanning electron microscopy. It was found that the increase of the pause-to-pulse ratio produced a ...