TR6151 - Micro and Nanosystem Technologies, Structures and Sensors

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TR6151 - Micro and Nanosystem Technologies, Structures and Sensors

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Publications

Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates

Lamovec, Jelena; Jović, Vesna; Aleksić, Radoslav; Radojević, Vesna

(Serbian Chemical Society, 2009)

TY  - JOUR
AU  - Lamovec, Jelena
AU  - Jović, Vesna
AU  - Aleksić, Radoslav
AU  - Radojević, Vesna
PY  - 2009
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/540
AB  - Fine-structured nickel coatings were electrodeposited from a sulfamate-based electrolyte onto different substrates: polycrystalline cold-rolled copper and single crystal silicon with (111) orientation. The influence of the substrate layers and chosen plating conditions on the mechanical and structural properties of these composite structures were investigated by Vickers microhardness testing for different loads. Above a certain critical penetration depth, the measured hardness value was not the hardness of the electrodeposited film, but the so-called 'composite hardness', because the substrate also participated in the plastic deformations during the indentation process. Two composite hardness models (Chicot-Lesage and Korsunsky), constructed on different principles, were chosen and applied to the experimental data in order to distinguish film and substrate hardness. The microhardness values of the electrodeposited nickel layers were mainly influenced by the current density. Increasing the current density led to a decrease in grain size, which resulted in higher values of the microhardness.
AB  - Sitnozrne prevlake nikla su elektrodeponovane iz sulfamatnog kupatila na različitim supstratima: hladno-valjanom polikristalnom bakru i monokristalnom silicijumu (111) orijentacije. Uticaj supstrata i odabranih parametara elektrodepozicije na mehanička i strukturna svojstva ovih kompozitnih struktura ispitivan je testovima mikrotvrdoće po Vickers-u pri različitim opterećenjima. Iznad kritične dubine utiskivanja, izmerena vrednost tvrdoće nije tvrdoća elektrodeponovanog filma, već takozvana 'kompozitna mikrotvrdoća', jer supstrat učestvuje u plastičnoj deformaciji tokom procesa utiskivanja. Odabrana su dva modela kompozitne tvrdoće bazirana na različitim principima (model Chicot-Lesage i Korsunsky) i primenjena na eksperimentalne rezultate u cilju izračunavanja tvrdoće filma. Vrednosti mikrotvrdoće elektrodeponovanih prevlaka nikla zavise od vrednosti gustine struje. Povećanje gustine struje vodi smanjenju veličine zrna i povećanju vrednosti mikrotvrdoće.
PB  - Serbian Chemical Society
T2  - Journal of the Serbian Chemical Society
T1  - Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates
T1  - Mikromehanička i strukturna svojstva elektrodeponovanih prevlaka nikla na različitim supstratima
VL  - 74
IS  - 7
SP  - 817
EP  - 831
DO  - 10.2298/JSC0907817L
ER  - 
@article{
author = "Lamovec, Jelena and Jović, Vesna and Aleksić, Radoslav and Radojević, Vesna",
year = "2009",
abstract = "Fine-structured nickel coatings were electrodeposited from a sulfamate-based electrolyte onto different substrates: polycrystalline cold-rolled copper and single crystal silicon with (111) orientation. The influence of the substrate layers and chosen plating conditions on the mechanical and structural properties of these composite structures were investigated by Vickers microhardness testing for different loads. Above a certain critical penetration depth, the measured hardness value was not the hardness of the electrodeposited film, but the so-called 'composite hardness', because the substrate also participated in the plastic deformations during the indentation process. Two composite hardness models (Chicot-Lesage and Korsunsky), constructed on different principles, were chosen and applied to the experimental data in order to distinguish film and substrate hardness. The microhardness values of the electrodeposited nickel layers were mainly influenced by the current density. Increasing the current density led to a decrease in grain size, which resulted in higher values of the microhardness., Sitnozrne prevlake nikla su elektrodeponovane iz sulfamatnog kupatila na različitim supstratima: hladno-valjanom polikristalnom bakru i monokristalnom silicijumu (111) orijentacije. Uticaj supstrata i odabranih parametara elektrodepozicije na mehanička i strukturna svojstva ovih kompozitnih struktura ispitivan je testovima mikrotvrdoće po Vickers-u pri različitim opterećenjima. Iznad kritične dubine utiskivanja, izmerena vrednost tvrdoće nije tvrdoća elektrodeponovanog filma, već takozvana 'kompozitna mikrotvrdoća', jer supstrat učestvuje u plastičnoj deformaciji tokom procesa utiskivanja. Odabrana su dva modela kompozitne tvrdoće bazirana na različitim principima (model Chicot-Lesage i Korsunsky) i primenjena na eksperimentalne rezultate u cilju izračunavanja tvrdoće filma. Vrednosti mikrotvrdoće elektrodeponovanih prevlaka nikla zavise od vrednosti gustine struje. Povećanje gustine struje vodi smanjenju veličine zrna i povećanju vrednosti mikrotvrdoće.",
publisher = "Serbian Chemical Society",
journal = "Journal of the Serbian Chemical Society",
title = "Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates, Mikromehanička i strukturna svojstva elektrodeponovanih prevlaka nikla na različitim supstratima",
volume = "74",
number = "7",
pages = "817-831",
doi = "10.2298/JSC0907817L"
}
Lamovec, J., Jović, V., Aleksić, R.,& Radojević, V.. (2009). Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates. in Journal of the Serbian Chemical Society
Serbian Chemical Society., 74(7), 817-831.
https://doi.org/10.2298/JSC0907817L
Lamovec J, Jović V, Aleksić R, Radojević V. Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates. in Journal of the Serbian Chemical Society. 2009;74(7):817-831.
doi:10.2298/JSC0907817L .
Lamovec, Jelena, Jović, Vesna, Aleksić, Radoslav, Radojević, Vesna, "Micromechanical and structural properties of nickel coatings electrodeposited on two different substrates" in Journal of the Serbian Chemical Society, 74, no. 7 (2009):817-831,
https://doi.org/10.2298/JSC0907817L . .
7
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Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates

Lamovec, Jelena; Jović, Vesna; Randjelović, Danijela; Aleksić, Radoslav; Radojević, Vesna

(Elsevier Science Sa, Lausanne, 2008)

TY  - JOUR
AU  - Lamovec, Jelena
AU  - Jović, Vesna
AU  - Randjelović, Danijela
AU  - Aleksić, Radoslav
AU  - Radojević, Vesna
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/392
AB  - Fine-grained nickel thin films were electrodeposited from a self-made sulphamate-based electrolyte on different substrates: polycrystalline cold-rolled copper and single crystal silicon with two different orientations, namely (100) and (111). The influence of the substrate and chosen plating conditions on mechanical properties of these composite structures were investigated by Vickers microhardness testing for different loads. Above a certain critical penetration depth, a measured hardness value is not the hardness of the electrodeposited film, but the so-called "composite hardness", because the substrate also participates in the plastic deformations during the indentation process. Four composite hardness models (Jonsson-Hogmark, Burnett-Rickerby, Chicot-Lesage and Korsunsky models) are chosen and applied to the experimental data. The applicability of mentioned models is critically tested on two types of composite systems: Ni film on Cu substrate, which is example for "hard film on soft substrate" and electrodeposited Ni on Si substrate ("soft film on hard substrate") and their reliability is given.
PB  - Elsevier Science Sa, Lausanne
T2  - Thin Solid Films
T1  - Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates
VL  - 516
IS  - 23
SP  - 8646
EP  - 8654
DO  - 10.1016/j.tsf.2008.06.035
ER  - 
@article{
author = "Lamovec, Jelena and Jović, Vesna and Randjelović, Danijela and Aleksić, Radoslav and Radojević, Vesna",
year = "2008",
abstract = "Fine-grained nickel thin films were electrodeposited from a self-made sulphamate-based electrolyte on different substrates: polycrystalline cold-rolled copper and single crystal silicon with two different orientations, namely (100) and (111). The influence of the substrate and chosen plating conditions on mechanical properties of these composite structures were investigated by Vickers microhardness testing for different loads. Above a certain critical penetration depth, a measured hardness value is not the hardness of the electrodeposited film, but the so-called "composite hardness", because the substrate also participates in the plastic deformations during the indentation process. Four composite hardness models (Jonsson-Hogmark, Burnett-Rickerby, Chicot-Lesage and Korsunsky models) are chosen and applied to the experimental data. The applicability of mentioned models is critically tested on two types of composite systems: Ni film on Cu substrate, which is example for "hard film on soft substrate" and electrodeposited Ni on Si substrate ("soft film on hard substrate") and their reliability is given.",
publisher = "Elsevier Science Sa, Lausanne",
journal = "Thin Solid Films",
title = "Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates",
volume = "516",
number = "23",
pages = "8646-8654",
doi = "10.1016/j.tsf.2008.06.035"
}
Lamovec, J., Jović, V., Randjelović, D., Aleksić, R.,& Radojević, V.. (2008). Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates. in Thin Solid Films
Elsevier Science Sa, Lausanne., 516(23), 8646-8654.
https://doi.org/10.1016/j.tsf.2008.06.035
Lamovec J, Jović V, Randjelović D, Aleksić R, Radojević V. Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates. in Thin Solid Films. 2008;516(23):8646-8654.
doi:10.1016/j.tsf.2008.06.035 .
Lamovec, Jelena, Jović, Vesna, Randjelović, Danijela, Aleksić, Radoslav, Radojević, Vesna, "Analysis of the composite and film hardness of electrodeposited nickel coatings on different substrates" in Thin Solid Films, 516, no. 23 (2008):8646-8654,
https://doi.org/10.1016/j.tsf.2008.06.035 . .
30
26
30

Investigation of interface and surface energy states in semiconductors by PA method

Todorović, D. M.; Smiljanić, Miloljub; Jović, Vesna; Sarajlić, Milija; Grozdić, T.

(2008)

TY  - CONF
AU  - Todorović, D. M.
AU  - Smiljanić, Miloljub
AU  - Jović, Vesna
AU  - Sarajlić, Milija
AU  - Grozdić, T.
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/481
AB  - The photoacoustic (PA) signal should generally change with the extent of damage, in the form of surface energy states (SES) or interface energy states (IES). For a mechanically, chemically or particles processed (Ar-plasma etching, ion implantation, etc) semiconductor surface, the measured PA signal can be expect to increase as a consequence of the surface (interface) optical, thermal and carrier transport properties changes. The SES on Si wafer and IES in SiO2 film/Si substrate are investigated by PA spectroscopy. The sub-bandgap PA spectra are used to obtain the energy-dependent distribution of SES or IES.
C3  - European Physical Journal: Special Topics
T1  - Investigation of interface and surface energy states in semiconductors by PA method
VL  - 153
IS  - 1
SP  - 247
EP  - 250
DO  - 10.1140/epjst/e2008-00437-1
ER  - 
@conference{
author = "Todorović, D. M. and Smiljanić, Miloljub and Jović, Vesna and Sarajlić, Milija and Grozdić, T.",
year = "2008",
abstract = "The photoacoustic (PA) signal should generally change with the extent of damage, in the form of surface energy states (SES) or interface energy states (IES). For a mechanically, chemically or particles processed (Ar-plasma etching, ion implantation, etc) semiconductor surface, the measured PA signal can be expect to increase as a consequence of the surface (interface) optical, thermal and carrier transport properties changes. The SES on Si wafer and IES in SiO2 film/Si substrate are investigated by PA spectroscopy. The sub-bandgap PA spectra are used to obtain the energy-dependent distribution of SES or IES.",
journal = "European Physical Journal: Special Topics",
title = "Investigation of interface and surface energy states in semiconductors by PA method",
volume = "153",
number = "1",
pages = "247-250",
doi = "10.1140/epjst/e2008-00437-1"
}
Todorović, D. M., Smiljanić, M., Jović, V., Sarajlić, M.,& Grozdić, T.. (2008). Investigation of interface and surface energy states in semiconductors by PA method. in European Physical Journal: Special Topics, 153(1), 247-250.
https://doi.org/10.1140/epjst/e2008-00437-1
Todorović DM, Smiljanić M, Jović V, Sarajlić M, Grozdić T. Investigation of interface and surface energy states in semiconductors by PA method. in European Physical Journal: Special Topics. 2008;153(1):247-250.
doi:10.1140/epjst/e2008-00437-1 .
Todorović, D. M., Smiljanić, Miloljub, Jović, Vesna, Sarajlić, Milija, Grozdić, T., "Investigation of interface and surface energy states in semiconductors by PA method" in European Physical Journal: Special Topics, 153, no. 1 (2008):247-250,
https://doi.org/10.1140/epjst/e2008-00437-1 . .

Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases

Đurić, Zoran G.; Jokić, Ivana; Frantlović, Miloš; Jakšić, Olga

(Elsevier, 2007)

TY  - JOUR
AU  - Đurić, Zoran G.
AU  - Jokić, Ivana
AU  - Frantlović, Miloš
AU  - Jakšić, Olga
PY  - 2007
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/368
AB  - In this paper the theory of the adsorption and desorption process of an arbitrary number of gases on the sensor surface is presented. It is assumed that the sorption follows the Langmuir isotherm. The exact expressions are derived for the power spectral density of the fluctuations of the number of adsorbed particles for each gas from the mixture, as well as for the total adsorbed mass fluctuation, using the analytical Langevin approach. Since these fluctuations cause adsorption-desorption (AD) noise, the presented theory enables determination of the limiting performance of various micro/nanoelectromechanical devices (micro/nanocantilever sensors and oscillators), resistive gas sensors and chemical and biochemical sensors based on surface plasmon resonance effect, and optimization of their parameters. This model is also applicable for the theoretical study of adsorption-desorption processes in general. We used it for investigation of the possibility of identification of gases in the mixture, based on the power spectral density of the adsorbed mass fluctuations. We also considered the possibility of the lowering the adsorbed mass fluctuations (i.e. AD noise level) by adding a certain amount of a gas to the mixture. As an example of the application of the presented theory, we calculate the fluctuations of the mass adsorbed on the surface of the silicon micro/nanocantilever sensor surrounded by the atmosphere of two and three gases.
PB  - Elsevier
T2  - Sensors and Actuators, B: Chemical
T1  - Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases
VL  - 127
IS  - 2
SP  - 625
EP  - 631
DO  - 10.1016/j.snb.2007.05.025
ER  - 
@article{
author = "Đurić, Zoran G. and Jokić, Ivana and Frantlović, Miloš and Jakšić, Olga",
year = "2007",
abstract = "In this paper the theory of the adsorption and desorption process of an arbitrary number of gases on the sensor surface is presented. It is assumed that the sorption follows the Langmuir isotherm. The exact expressions are derived for the power spectral density of the fluctuations of the number of adsorbed particles for each gas from the mixture, as well as for the total adsorbed mass fluctuation, using the analytical Langevin approach. Since these fluctuations cause adsorption-desorption (AD) noise, the presented theory enables determination of the limiting performance of various micro/nanoelectromechanical devices (micro/nanocantilever sensors and oscillators), resistive gas sensors and chemical and biochemical sensors based on surface plasmon resonance effect, and optimization of their parameters. This model is also applicable for the theoretical study of adsorption-desorption processes in general. We used it for investigation of the possibility of identification of gases in the mixture, based on the power spectral density of the adsorbed mass fluctuations. We also considered the possibility of the lowering the adsorbed mass fluctuations (i.e. AD noise level) by adding a certain amount of a gas to the mixture. As an example of the application of the presented theory, we calculate the fluctuations of the mass adsorbed on the surface of the silicon micro/nanocantilever sensor surrounded by the atmosphere of two and three gases.",
publisher = "Elsevier",
journal = "Sensors and Actuators, B: Chemical",
title = "Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases",
volume = "127",
number = "2",
pages = "625-631",
doi = "10.1016/j.snb.2007.05.025"
}
Đurić, Z. G., Jokić, I., Frantlović, M.,& Jakšić, O.. (2007). Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases. in Sensors and Actuators, B: Chemical
Elsevier., 127(2), 625-631.
https://doi.org/10.1016/j.snb.2007.05.025
Đurić ZG, Jokić I, Frantlović M, Jakšić O. Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases. in Sensors and Actuators, B: Chemical. 2007;127(2):625-631.
doi:10.1016/j.snb.2007.05.025 .
Đurić, Zoran G., Jokić, Ivana, Frantlović, Miloš, Jakšić, Olga, "Fluctuations of the number of particles and mass adsorbed on the sensor surface surrounded by a mixture of an arbitrary number of gases" in Sensors and Actuators, B: Chemical, 127, no. 2 (2007):625-631,
https://doi.org/10.1016/j.snb.2007.05.025 . .
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19
22

Boron redistribution during SOI wafers thermal oxidation

Đurić, Zoran G.; Smiljanić, Milče; Radulović, Katarina; Lazić, Žarko

(Institute of Electrical and Electronics Engineers Inc., 2006)

TY  - CONF
AU  - Đurić, Zoran G.
AU  - Smiljanić, Milče
AU  - Radulović, Katarina
AU  - Lazić, Žarko
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/245
AB  - We fabricated Silicon-On-Insulator (Sol) pressure sensors intended for operation in a wide temperature range. After the thermal oxidation process, the measured sheet resistance of the silicon active layer was higher than expected for the case when the dopant distribution in the active layer is uniform and the layer thickness reduced. The reason was the redistribution of dopant (boron) in the active layer during the high temperature thermal oxidation processes. We developed a model to calculate the boron redistribution in an Sol wafer which was initially uniformly doped. The temperature dependence of hole mobility (and, based on it, the sheet resistance and its temperature dependence) was determined for a calculated impurity profile after oxidation in wet O-2. The experimental temperature dependence of sheet resistance was obtained by measuring the temperature dependence of piezoresistor resistance. The best match between the theoretical and experimental TCR (temperature coefficient of resistance) was achieved by slightly modifying the Arora's model for hole mobility.
PB  - Institute of Electrical and Electronics Engineers Inc.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - Boron redistribution during SOI wafers thermal oxidation
SP  - 333
EP  - 336
DO  - 10.1109/ICMEL.2006.1650961
ER  - 
@conference{
author = "Đurić, Zoran G. and Smiljanić, Milče and Radulović, Katarina and Lazić, Žarko",
year = "2006",
abstract = "We fabricated Silicon-On-Insulator (Sol) pressure sensors intended for operation in a wide temperature range. After the thermal oxidation process, the measured sheet resistance of the silicon active layer was higher than expected for the case when the dopant distribution in the active layer is uniform and the layer thickness reduced. The reason was the redistribution of dopant (boron) in the active layer during the high temperature thermal oxidation processes. We developed a model to calculate the boron redistribution in an Sol wafer which was initially uniformly doped. The temperature dependence of hole mobility (and, based on it, the sheet resistance and its temperature dependence) was determined for a calculated impurity profile after oxidation in wet O-2. The experimental temperature dependence of sheet resistance was obtained by measuring the temperature dependence of piezoresistor resistance. The best match between the theoretical and experimental TCR (temperature coefficient of resistance) was achieved by slightly modifying the Arora's model for hole mobility.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "Boron redistribution during SOI wafers thermal oxidation",
pages = "333-336",
doi = "10.1109/ICMEL.2006.1650961"
}
Đurić, Z. G., Smiljanić, M., Radulović, K.,& Lazić, Ž.. (2006). Boron redistribution during SOI wafers thermal oxidation. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
Institute of Electrical and Electronics Engineers Inc.., 333-336.
https://doi.org/10.1109/ICMEL.2006.1650961
Đurić ZG, Smiljanić M, Radulović K, Lazić Ž. Boron redistribution during SOI wafers thermal oxidation. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:333-336.
doi:10.1109/ICMEL.2006.1650961 .
Đurić, Zoran G., Smiljanić, Milče, Radulović, Katarina, Lazić, Žarko, "Boron redistribution during SOI wafers thermal oxidation" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):333-336,
https://doi.org/10.1109/ICMEL.2006.1650961 . .
4
1
4

A consideration of transparent metal structures for subwavelength diffraction management

Jakšić, Zoran; Sarajlić, Milija; Maksimović, Milan; Vasiljević-Radović, Dana; Jovanović, Dušan M.

(Institute of Electrical and Electronics Engineers Inc., 2006)

TY  - CONF
AU  - Jakšić, Zoran
AU  - Sarajlić, Milija
AU  - Maksimović, Milan
AU  - Vasiljević-Radović, Dana
AU  - Jovanović, Dušan M.
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/243
AB  - We considered theoretically and experimentally one-dimensional multilayered metallodielectric nanofilms with nanometric thickness for imaging below the diffraction limit. We investigated their behavior in the ultravioled and visible spectrum from the point of view of near field optics, but also considered some of their properties in the far field. We designed our structures using the transfer matrix method and utilized RF sputtering to fabricate them. We consider some possible approaches to extract optical information from such multilavers.
PB  - Institute of Electrical and Electronics Engineers Inc.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - A consideration of transparent metal structures for subwavelength diffraction management
SP  - 153
DO  - 10.1109/ICMEL.2006.1650917
ER  - 
@conference{
author = "Jakšić, Zoran and Sarajlić, Milija and Maksimović, Milan and Vasiljević-Radović, Dana and Jovanović, Dušan M.",
year = "2006",
abstract = "We considered theoretically and experimentally one-dimensional multilayered metallodielectric nanofilms with nanometric thickness for imaging below the diffraction limit. We investigated their behavior in the ultravioled and visible spectrum from the point of view of near field optics, but also considered some of their properties in the far field. We designed our structures using the transfer matrix method and utilized RF sputtering to fabricate them. We consider some possible approaches to extract optical information from such multilavers.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "A consideration of transparent metal structures for subwavelength diffraction management",
pages = "153",
doi = "10.1109/ICMEL.2006.1650917"
}
Jakšić, Z., Sarajlić, M., Maksimović, M., Vasiljević-Radović, D.,& Jovanović, D. M.. (2006). A consideration of transparent metal structures for subwavelength diffraction management. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
Institute of Electrical and Electronics Engineers Inc.., 153.
https://doi.org/10.1109/ICMEL.2006.1650917
Jakšić Z, Sarajlić M, Maksimović M, Vasiljević-Radović D, Jovanović DM. A consideration of transparent metal structures for subwavelength diffraction management. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:153.
doi:10.1109/ICMEL.2006.1650917 .
Jakšić, Zoran, Sarajlić, Milija, Maksimović, Milan, Vasiljević-Radović, Dana, Jovanović, Dušan M., "A consideration of transparent metal structures for subwavelength diffraction management" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):153,
https://doi.org/10.1109/ICMEL.2006.1650917 . .
1
1

Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing

Jakšić, Zoran; Maksimović, Milan; Vasiljević-Radović, Dana; Tanasković, Dragan; Sarajlić, Milija

(Institute of Electrical and Electronics Engineers Inc., 2006)

TY  - CONF
AU  - Jakšić, Zoran
AU  - Maksimović, Milan
AU  - Vasiljević-Radović, Dana
AU  - Tanasković, Dragan
AU  - Sarajlić, Milija
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/241
AB  - We analyzed the use of subwaveleneth ordered nanohole patterns for detection of miniscule amounts of biological analytes. Owing to their surface plasmon resonance (SPR) operation, such structures show an extraordinarily, high optical transmission in visible spectrum. at the same time concentrating the illumination to the very small area of the nanoholes and being much more sensitive to refractive index changes than the conventional SPR sensors. We applied in approximate analytical approach to design our V-shaped, nanometer-sized hole arrays. We utilized scanning-probe nanolithography to fabricate the designed nanoholes in silver substrate. We investigated the topography of the obtained patterns by atomic force microscopy. Compared to conventional SPR optical sensors. the nanohole array-based structures allow for the detection of smaller quantities of analytes. enhance nonlinear effects and ensure improved sensitivities to different analytes.
PB  - Institute of Electrical and Electronics Engineers Inc.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing
SP  - 107
DO  - 10.1109/ICMEL.2006.1650905
ER  - 
@conference{
author = "Jakšić, Zoran and Maksimović, Milan and Vasiljević-Radović, Dana and Tanasković, Dragan and Sarajlić, Milija",
year = "2006",
abstract = "We analyzed the use of subwaveleneth ordered nanohole patterns for detection of miniscule amounts of biological analytes. Owing to their surface plasmon resonance (SPR) operation, such structures show an extraordinarily, high optical transmission in visible spectrum. at the same time concentrating the illumination to the very small area of the nanoholes and being much more sensitive to refractive index changes than the conventional SPR sensors. We applied in approximate analytical approach to design our V-shaped, nanometer-sized hole arrays. We utilized scanning-probe nanolithography to fabricate the designed nanoholes in silver substrate. We investigated the topography of the obtained patterns by atomic force microscopy. Compared to conventional SPR optical sensors. the nanohole array-based structures allow for the detection of smaller quantities of analytes. enhance nonlinear effects and ensure improved sensitivities to different analytes.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing",
pages = "107",
doi = "10.1109/ICMEL.2006.1650905"
}
Jakšić, Z., Maksimović, M., Vasiljević-Radović, D., Tanasković, D.,& Sarajlić, M.. (2006). Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
Institute of Electrical and Electronics Engineers Inc.., 107.
https://doi.org/10.1109/ICMEL.2006.1650905
Jakšić Z, Maksimović M, Vasiljević-Radović D, Tanasković D, Sarajlić M. Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:107.
doi:10.1109/ICMEL.2006.1650905 .
Jakšić, Zoran, Maksimović, Milan, Vasiljević-Radović, Dana, Tanasković, Dragan, Sarajlić, Milija, "Scanning probe-shaped nanohole arrays with extraordinary optical transmission as platform for enhanced surface plasmon-based biosensing" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):107,
https://doi.org/10.1109/ICMEL.2006.1650905 . .
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Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture

Đurić, Zoran G.; Jakšić, Olga; Jokić, Ivana; Frantlović, Miloš

(Institute of Electrical and Electronics Engineers Inc., 2006)

TY  - CONF
AU  - Đurić, Zoran G.
AU  - Jakšić, Olga
AU  - Jokić, Ivana
AU  - Frantlović, Miloš
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/253
AB  - Micro/nanoresonator mass and frequency fluctuations caused by sorption processes on a resonator surface are investigated. Arbitrary gas mixture is considered. assuming that particle arrivals at the surface are all poissonian in nature. independent from each other, and that sorption dynamics follows the Langmuir isotherm. Power spectral density for mass fluctuations are derived using the analytical Langevin approach. The results of simulations are given for a silicon micro/nanocantilever in the atmosphere of four gases. The presented analysis is useful for calculation of the ultimate performance of MEMS/NEMS sensors and oscillators, as well as for investigation of the possibilities of their parameters optimization by choosing the gas mixture in the cantilever's atmosphere. Another objective is to consider the possibility of identification of gases in the mixture, based on the power spectral density of the adsorbed mass fluctuation.
PB  - Institute of Electrical and Electronics Engineers Inc.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture
SP  - 103
DO  - 10.1109/ICMEL.2006.1650904
ER  - 
@conference{
author = "Đurić, Zoran G. and Jakšić, Olga and Jokić, Ivana and Frantlović, Miloš",
year = "2006",
abstract = "Micro/nanoresonator mass and frequency fluctuations caused by sorption processes on a resonator surface are investigated. Arbitrary gas mixture is considered. assuming that particle arrivals at the surface are all poissonian in nature. independent from each other, and that sorption dynamics follows the Langmuir isotherm. Power spectral density for mass fluctuations are derived using the analytical Langevin approach. The results of simulations are given for a silicon micro/nanocantilever in the atmosphere of four gases. The presented analysis is useful for calculation of the ultimate performance of MEMS/NEMS sensors and oscillators, as well as for investigation of the possibilities of their parameters optimization by choosing the gas mixture in the cantilever's atmosphere. Another objective is to consider the possibility of identification of gases in the mixture, based on the power spectral density of the adsorbed mass fluctuation.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture",
pages = "103",
doi = "10.1109/ICMEL.2006.1650904"
}
Đurić, Z. G., Jakšić, O., Jokić, I.,& Frantlović, M.. (2006). Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
Institute of Electrical and Electronics Engineers Inc.., 103.
https://doi.org/10.1109/ICMEL.2006.1650904
Đurić ZG, Jakšić O, Jokić I, Frantlović M. Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:103.
doi:10.1109/ICMEL.2006.1650904 .
Đurić, Zoran G., Jakšić, Olga, Jokić, Ivana, Frantlović, Miloš, "Adsorbed mass fluctuations of a micro/nanoresonator surrounded by an arbitrary gas mixture" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):103,
https://doi.org/10.1109/ICMEL.2006.1650904 . .
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