TY  - JOUR
AU  - Nenadović, Miloš
AU  - Štrbac, Svetlana
AU  - Rakočević, Zlatko Lj.
PY  - 2010
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/750
AB  - In this work, the quantitative conditions for the lift height for imaging of the magnetic field using magnetic force microscopy (MFM) were optimized. A thin cobalt film deposited on a monocrystalline silicon (1 0 0) substrate with a thickness of 55 nm and a thin nickel film deposited on a glass with a thickness of 600 nm were used as samples. The topography of the surface was acquired by tapping mode atomic force microscopy (AFM), while MFM imaging was performed in the lift mode for various lift heights. It was determined that the sensitivity of the measurements was about 10% higher for images obtained at a scan angle of 90 degrees compared to a scan angle of 0 degrees. Therefore, the three-dimensional surface texture parameters, i.e., average roughness, skewness, kurtosis and the bearing ratio, were determined in dependence on the lift height for a scan angle of 90 degrees. The results of the analyses of the surface parameters showed that the influence of the substrate and its texture on the magnetic force image could be neglected for lift heights above 40 nm and that the upper lift height limit is 100 nm. It was determined that the optimal values of the lift heights were in the range from 60 to 80 nm, depending on the nature of the sample and on the type of the tip used.
PB  - Elsevier
T2  - Applied Surface Science
T1  - Quantification of the lift height for magnetic force microscopy using 3D surface parameters
VL  - 256
IS  - 6
SP  - 1652
EP  - 1656
DO  - 10.1016/j.apsusc.2009.09.088
ER  - 

@article{
author = "Nenadović, Miloš and Štrbac, Svetlana and Rakočević, Zlatko Lj.",
year = "2010",
abstract = "In this work, the quantitative conditions for the lift height for imaging of the magnetic field using magnetic force microscopy (MFM) were optimized. A thin cobalt film deposited on a monocrystalline silicon (1 0 0) substrate with a thickness of 55 nm and a thin nickel film deposited on a glass with a thickness of 600 nm were used as samples. The topography of the surface was acquired by tapping mode atomic force microscopy (AFM), while MFM imaging was performed in the lift mode for various lift heights. It was determined that the sensitivity of the measurements was about 10% higher for images obtained at a scan angle of 90 degrees compared to a scan angle of 0 degrees. Therefore, the three-dimensional surface texture parameters, i.e., average roughness, skewness, kurtosis and the bearing ratio, were determined in dependence on the lift height for a scan angle of 90 degrees. The results of the analyses of the surface parameters showed that the influence of the substrate and its texture on the magnetic force image could be neglected for lift heights above 40 nm and that the upper lift height limit is 100 nm. It was determined that the optimal values of the lift heights were in the range from 60 to 80 nm, depending on the nature of the sample and on the type of the tip used.",
publisher = "Elsevier",
journal = "Applied Surface Science",
title = "Quantification of the lift height for magnetic force microscopy using 3D surface parameters",
volume = "256",
number = "6",
pages = "1652-1656",
doi = "10.1016/j.apsusc.2009.09.088"
}

Nenadović, M., Štrbac, S.,& Rakočević, Z. Lj.. (2010). Quantification of the lift height for magnetic force microscopy using 3D surface parameters. in Applied Surface Science
Elsevier., 256(6), 1652-1656.
https://doi.org/10.1016/j.apsusc.2009.09.088

Nenadović M, Štrbac S, Rakočević ZL. Quantification of the lift height for magnetic force microscopy using 3D surface parameters. in Applied Surface Science. 2010;256(6):1652-1656.
doi:10.1016/j.apsusc.2009.09.088 .

Nenadović, Miloš, Štrbac, Svetlana, Rakočević, Zlatko Lj., "Quantification of the lift height for magnetic force microscopy using 3D surface parameters" in Applied Surface Science, 256, no. 6 (2010):1652-1656,
https://doi.org/10.1016/j.apsusc.2009.09.088 . .

TY  - JOUR
AU  - Štrbac, Svetlana
AU  - Nenadović, Miloš
AU  - Rajaković, Ljubinka V.
AU  - Rakočević, Zlatko Lj.
PY  - 2010
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/739
AB  - High density polyethylene (HDPE) has been modified by Ag+ ion implantation with the energy of 60 keV. The total amount of implanted silver ions was 1, 5 and 12 x 10(15) ions/cm(2). The surface topography was observed by atomic forcemicroscopy (AFM), while the surface composition changes were detected using phase imaging AFM. Surface topography changes were studied in detail using 3D surface parameters analyses. The average roughness decreased for the implanted HDPE indicating the flattening of the surface. Phase AFM images indicated the homogenization of the polyethylene during ion implantation, while histogram analyses confirmed the change in surface composition.
PB  - Elsevier
T2  - Applied Surface Science
T1  - Chemical surface composition of the polyethylene implanted by Ag+ ions studied by phase imaging atomic force microscopy
VL  - 256
IS  - 12
SP  - 3895
EP  - 3899
DO  - 10.1016/j.apsusc.2010.01.046
ER  - 

@article{
author = "Štrbac, Svetlana and Nenadović, Miloš and Rajaković, Ljubinka V. and Rakočević, Zlatko Lj.",
year = "2010",
abstract = "High density polyethylene (HDPE) has been modified by Ag+ ion implantation with the energy of 60 keV. The total amount of implanted silver ions was 1, 5 and 12 x 10(15) ions/cm(2). The surface topography was observed by atomic forcemicroscopy (AFM), while the surface composition changes were detected using phase imaging AFM. Surface topography changes were studied in detail using 3D surface parameters analyses. The average roughness decreased for the implanted HDPE indicating the flattening of the surface. Phase AFM images indicated the homogenization of the polyethylene during ion implantation, while histogram analyses confirmed the change in surface composition.",
publisher = "Elsevier",
journal = "Applied Surface Science",
title = "Chemical surface composition of the polyethylene implanted by Ag+ ions studied by phase imaging atomic force microscopy",
volume = "256",
number = "12",
pages = "3895-3899",
doi = "10.1016/j.apsusc.2010.01.046"
}

Štrbac, S., Nenadović, M., Rajaković, L. V.,& Rakočević, Z. Lj.. (2010). Chemical surface composition of the polyethylene implanted by Ag+ ions studied by phase imaging atomic force microscopy. in Applied Surface Science
Elsevier., 256(12), 3895-3899.
https://doi.org/10.1016/j.apsusc.2010.01.046

Štrbac S, Nenadović M, Rajaković LV, Rakočević ZL. Chemical surface composition of the polyethylene implanted by Ag+ ions studied by phase imaging atomic force microscopy. in Applied Surface Science. 2010;256(12):3895-3899.
doi:10.1016/j.apsusc.2010.01.046 .

Štrbac, Svetlana, Nenadović, Miloš, Rajaković, Ljubinka V., Rakočević, Zlatko Lj., "Chemical surface composition of the polyethylene implanted by Ag+ ions studied by phase imaging atomic force microscopy" in Applied Surface Science, 256, no. 12 (2010):3895-3899,
https://doi.org/10.1016/j.apsusc.2010.01.046 . .

TY  - JOUR
AU  - Popović, N.
AU  - Bogdanov, Žarko D.
AU  - Goncić, B.
AU  - Štrbac, Svetlana
AU  - Rakočević, Zlatko Lj.
PY  - 2009
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/585
AB  - Nickel thin films were deposited on glass substrates at different N2 gas contents using a dc triode sputtering deposition system. Triode configuration was used to deposit nanostructured thin films with preferred orientation at lower gas pressure and at lower substrate temperature compared to the dc diode sputtering system. A gradual evolution in the composition of the films from Ni, Ni(N), to Ni3N was found by X-ray diffraction analysis. The preferred growth orientation of the nanostructured Ni films changed from (1 1 1) to (1 0 0) for 9% N2 at 100 °C. Ni3N films were formed at 23% N2 with a particle size of about 65 nm, while for 0% and 9% of nitrogen, the particles sizes were 60 nm, and 37 nm, respectively, as obtained by atomic force microscopy. Magnetic force microscopy imaging showed that the local magnetic structure changed from disordered stripe domains of about 200 nm for Ni and Ni(N) to a structure without a magnetic contrast, indicating the paramagnetic state of this material, which confirmed the structural transformation from Ni to Ni3N.
PB  - Elsevier
T2  - Applied Surface Science
T1  - Reactively sputtered Ni, Ni(N) and Ni3N films: Structural, electrical and magnetic properties
VL  - 255
IS  - 7
SP  - 4027
EP  - 4032
DO  - 10.1016/j.apsusc.2008.10.076
ER  - 

@article{
author = "Popović, N. and Bogdanov, Žarko D. and Goncić, B. and Štrbac, Svetlana and Rakočević, Zlatko Lj.",
year = "2009",
abstract = "Nickel thin films were deposited on glass substrates at different N2 gas contents using a dc triode sputtering deposition system. Triode configuration was used to deposit nanostructured thin films with preferred orientation at lower gas pressure and at lower substrate temperature compared to the dc diode sputtering system. A gradual evolution in the composition of the films from Ni, Ni(N), to Ni3N was found by X-ray diffraction analysis. The preferred growth orientation of the nanostructured Ni films changed from (1 1 1) to (1 0 0) for 9% N2 at 100 °C. Ni3N films were formed at 23% N2 with a particle size of about 65 nm, while for 0% and 9% of nitrogen, the particles sizes were 60 nm, and 37 nm, respectively, as obtained by atomic force microscopy. Magnetic force microscopy imaging showed that the local magnetic structure changed from disordered stripe domains of about 200 nm for Ni and Ni(N) to a structure without a magnetic contrast, indicating the paramagnetic state of this material, which confirmed the structural transformation from Ni to Ni3N.",
publisher = "Elsevier",
journal = "Applied Surface Science",
title = "Reactively sputtered Ni, Ni(N) and Ni3N films: Structural, electrical and magnetic properties",
volume = "255",
number = "7",
pages = "4027-4032",
doi = "10.1016/j.apsusc.2008.10.076"
}

Popović, N., Bogdanov, Ž. D., Goncić, B., Štrbac, S.,& Rakočević, Z. Lj.. (2009). Reactively sputtered Ni, Ni(N) and Ni3N films: Structural, electrical and magnetic properties. in Applied Surface Science
Elsevier., 255(7), 4027-4032.
https://doi.org/10.1016/j.apsusc.2008.10.076

Popović N, Bogdanov ŽD, Goncić B, Štrbac S, Rakočević ZL. Reactively sputtered Ni, Ni(N) and Ni3N films: Structural, electrical and magnetic properties. in Applied Surface Science. 2009;255(7):4027-4032.
doi:10.1016/j.apsusc.2008.10.076 .

Popović, N., Bogdanov, Žarko D., Goncić, B., Štrbac, Svetlana, Rakočević, Zlatko Lj., "Reactively sputtered Ni, Ni(N) and Ni3N films: Structural, electrical and magnetic properties" in Applied Surface Science, 255, no. 7 (2009):4027-4032,
https://doi.org/10.1016/j.apsusc.2008.10.076 . .

TY  - JOUR
AU  - Štrbac, Svetlana
AU  - Avramov Ivić, Milka
PY  - 2009
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/574
AB  - The oxidation of formaldehyde and ethanol on both pure Au(1 1 1) and Au(1 1 1) modified by approximately 0.3 monolayer (ML) of spontaneously deposited Ru was studied by cyclic voltammetry (CV) in 0.5 M H2SO4 solution containing either 0.25 M formaldehyde or 0.35 M ethanol. In situ scanning tunneling microscopy (STM) and CV were employed to characterize the Au(1 1 1) and Ru/Au(1 1 1) surfaces. The oxidation of HCHO on Ru/Au(1 1 1) commences at 0.1 V more negative potential than on pure Au(1 1 1). From 0.25 to 0.55 V vs. (Ag/AgCl), the reaction occurs with increasing current, showing a peak at a potential of 0.43 V. It is assumed that the increasing anodic activity of the Ru/Au(1 1 1) surface is associated with the oxidation of some reaction intermediates, facilitated by the presence of Ru in its metallic state. On the other hand, the oxidation of ethanol on Ru/Au(1 1 1) commences at 0.1 V more positive potential than on pure Au(1 1 1), and proceeds in the potential region from 0.2 to 0.5 V with significantly smaller currents, showing a peak at 0.43 V. This inhibiting effect is explained by the deactivation of the most active Au(1 1 1) step sites by high coverage with Ru islands. The appearance of a small peak at 0.43 V is most likely associated to the oxidation of some intermediates during ethanol oxidation at the Ru/Au step sites formed on the Au(1 1 1) terraces by the presence of a small coverage with Ru islands.
PB  - Oxford : Pergamon-Elsevier Science Ltd
T2  - Electrochimica Acta
T1  - Oxidation of formaldehyde and ethanol on Au(1 1 1) and Au(1 1 1) modified by spontaneously deposited Ru in sulfuric acid solution
VL  - 54
IS  - 23
SP  - 5408
EP  - 5412
DO  - 10.1016/j.electacta.2009.04.031
ER  - 

@article{
author = "Štrbac, Svetlana and Avramov Ivić, Milka",
year = "2009",
abstract = "The oxidation of formaldehyde and ethanol on both pure Au(1 1 1) and Au(1 1 1) modified by approximately 0.3 monolayer (ML) of spontaneously deposited Ru was studied by cyclic voltammetry (CV) in 0.5 M H2SO4 solution containing either 0.25 M formaldehyde or 0.35 M ethanol. In situ scanning tunneling microscopy (STM) and CV were employed to characterize the Au(1 1 1) and Ru/Au(1 1 1) surfaces. The oxidation of HCHO on Ru/Au(1 1 1) commences at 0.1 V more negative potential than on pure Au(1 1 1). From 0.25 to 0.55 V vs. (Ag/AgCl), the reaction occurs with increasing current, showing a peak at a potential of 0.43 V. It is assumed that the increasing anodic activity of the Ru/Au(1 1 1) surface is associated with the oxidation of some reaction intermediates, facilitated by the presence of Ru in its metallic state. On the other hand, the oxidation of ethanol on Ru/Au(1 1 1) commences at 0.1 V more positive potential than on pure Au(1 1 1), and proceeds in the potential region from 0.2 to 0.5 V with significantly smaller currents, showing a peak at 0.43 V. This inhibiting effect is explained by the deactivation of the most active Au(1 1 1) step sites by high coverage with Ru islands. The appearance of a small peak at 0.43 V is most likely associated to the oxidation of some intermediates during ethanol oxidation at the Ru/Au step sites formed on the Au(1 1 1) terraces by the presence of a small coverage with Ru islands.",
publisher = "Oxford : Pergamon-Elsevier Science Ltd",
journal = "Electrochimica Acta",
title = "Oxidation of formaldehyde and ethanol on Au(1 1 1) and Au(1 1 1) modified by spontaneously deposited Ru in sulfuric acid solution",
volume = "54",
number = "23",
pages = "5408-5412",
doi = "10.1016/j.electacta.2009.04.031"
}

Štrbac, S.,& Avramov Ivić, M.. (2009). Oxidation of formaldehyde and ethanol on Au(1 1 1) and Au(1 1 1) modified by spontaneously deposited Ru in sulfuric acid solution. in Electrochimica Acta
Oxford : Pergamon-Elsevier Science Ltd., 54(23), 5408-5412.
https://doi.org/10.1016/j.electacta.2009.04.031

Štrbac S, Avramov Ivić M. Oxidation of formaldehyde and ethanol on Au(1 1 1) and Au(1 1 1) modified by spontaneously deposited Ru in sulfuric acid solution. in Electrochimica Acta. 2009;54(23):5408-5412.
doi:10.1016/j.electacta.2009.04.031 .

Štrbac, Svetlana, Avramov Ivić, Milka, "Oxidation of formaldehyde and ethanol on Au(1 1 1) and Au(1 1 1) modified by spontaneously deposited Ru in sulfuric acid solution" in Electrochimica Acta, 54, no. 23 (2009):5408-5412,
https://doi.org/10.1016/j.electacta.2009.04.031 . .

TY  - JOUR
AU  - Rakočević, Zlatko Lj.
AU  - Petrovic, R.
AU  - Štrbac, Svetlana
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/455
AB  - Silver was sputter deposited on a glass with a thin film thickness ranging from 10 to 80 nm. Scanning tunnelling microscopy was used to study the morphology of the obtained Ag-glass surfaces and to estimate the surface roughness. An equation for the surface roughness of the thin film was evaluated using parameters related to the thin film features: the surface roughness of the substrate, the compressibility of the thin film and the film thickness. The experimental results were fitted using the evaluated equation, and the conditions favouring lower or higher surface roughness were analyzed.
PB  - Wiley
T2  - Journal of Microscopy
T1  - Surface roughness of ultra-thin silver films sputter deposited on a glass
VL  - 232
IS  - 3
SP  - 595
EP  - 600
DO  - 10.1111/j.1365-2818.2008.02123.x
ER  - 

@article{
author = "Rakočević, Zlatko Lj. and Petrovic, R. and Štrbac, Svetlana",
year = "2008",
abstract = "Silver was sputter deposited on a glass with a thin film thickness ranging from 10 to 80 nm. Scanning tunnelling microscopy was used to study the morphology of the obtained Ag-glass surfaces and to estimate the surface roughness. An equation for the surface roughness of the thin film was evaluated using parameters related to the thin film features: the surface roughness of the substrate, the compressibility of the thin film and the film thickness. The experimental results were fitted using the evaluated equation, and the conditions favouring lower or higher surface roughness were analyzed.",
publisher = "Wiley",
journal = "Journal of Microscopy",
title = "Surface roughness of ultra-thin silver films sputter deposited on a glass",
volume = "232",
number = "3",
pages = "595-600",
doi = "10.1111/j.1365-2818.2008.02123.x"
}

Rakočević, Z. Lj., Petrovic, R.,& Štrbac, S.. (2008). Surface roughness of ultra-thin silver films sputter deposited on a glass. in Journal of Microscopy
Wiley., 232(3), 595-600.
https://doi.org/10.1111/j.1365-2818.2008.02123.x

Rakočević ZL, Petrovic R, Štrbac S. Surface roughness of ultra-thin silver films sputter deposited on a glass. in Journal of Microscopy. 2008;232(3):595-600.
doi:10.1111/j.1365-2818.2008.02123.x .

Rakočević, Zlatko Lj., Petrovic, R., Štrbac, Svetlana, "Surface roughness of ultra-thin silver films sputter deposited on a glass" in Journal of Microscopy, 232, no. 3 (2008):595-600,
https://doi.org/10.1111/j.1365-2818.2008.02123.x . .

TY  - JOUR
AU  - Rakočević, Zlatko Lj.
AU  - Popović, N.
AU  - Bogdanov, Žarko D.
AU  - Goncic, B.
AU  - Štrbac, Svetlana
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/447
AB  - Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3× 10-4 or 4× 10-4 mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements.
PB  - AIP Publishing
T2  - Review of Scientific Instruments
T1  - Surface resistivity estimation by scanning surface potential microscopy
VL  - 79
IS  - 6
DO  - 10.1063/1.2937647
ER  - 

@article{
author = "Rakočević, Zlatko Lj. and Popović, N. and Bogdanov, Žarko D. and Goncic, B. and Štrbac, Svetlana",
year = "2008",
abstract = "Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3× 10-4 or 4× 10-4 mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements.",
publisher = "AIP Publishing",
journal = "Review of Scientific Instruments",
title = "Surface resistivity estimation by scanning surface potential microscopy",
volume = "79",
number = "6",
doi = "10.1063/1.2937647"
}

Rakočević, Z. Lj., Popović, N., Bogdanov, Ž. D., Goncic, B.,& Štrbac, S.. (2008). Surface resistivity estimation by scanning surface potential microscopy. in Review of Scientific Instruments
AIP Publishing., 79(6).
https://doi.org/10.1063/1.2937647

Rakočević ZL, Popović N, Bogdanov ŽD, Goncic B, Štrbac S. Surface resistivity estimation by scanning surface potential microscopy. in Review of Scientific Instruments. 2008;79(6).
doi:10.1063/1.2937647 .

Rakočević, Zlatko Lj., Popović, N., Bogdanov, Žarko D., Goncic, B., Štrbac, Svetlana, "Surface resistivity estimation by scanning surface potential microscopy" in Review of Scientific Instruments, 79, no. 6 (2008),
https://doi.org/10.1063/1.2937647 . .

TY  - JOUR
AU  - Rakočević, Zlatko Lj.
AU  - Štrbac, Svetlana
AU  - Behm, R.-J.
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/450
AB  - Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.
PB  - Elsevier
T2  - Thin Solid Films
T1  - Interrupted-flux deposition: Ni on Ru(0001)
VL  - 517
IS  - 2
SP  - 709
EP  - 713
DO  - 10.1016/j.tsf.2008.08.116
ER  - 

@article{
author = "Rakočević, Zlatko Lj. and Štrbac, Svetlana and Behm, R.-J.",
year = "2008",
abstract = "Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.",
publisher = "Elsevier",
journal = "Thin Solid Films",
title = "Interrupted-flux deposition: Ni on Ru(0001)",
volume = "517",
number = "2",
pages = "709-713",
doi = "10.1016/j.tsf.2008.08.116"
}

Rakočević, Z. Lj., Štrbac, S.,& Behm, R.-J.. (2008). Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films
Elsevier., 517(2), 709-713.
https://doi.org/10.1016/j.tsf.2008.08.116

Rakočević ZL, Štrbac S, Behm R. Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films. 2008;517(2):709-713.
doi:10.1016/j.tsf.2008.08.116 .

Rakočević, Zlatko Lj., Štrbac, Svetlana, Behm, R.-J., "Interrupted-flux deposition: Ni on Ru(0001)" in Thin Solid Films, 517, no. 2 (2008):709-713,
https://doi.org/10.1016/j.tsf.2008.08.116 . .

TY  - JOUR
AU  - Štrbac, Svetlana
AU  - Petrovic, S.
AU  - Vasilic, R.
AU  - Kovac, J.
AU  - Zalar, A.
AU  - Rakocevic, Z.
PY  - 2007
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3190
AB  - Platinum is deposited spontaneously on Au(1 1 1) surface from 1 mM H2PtCl6 + 1 M HClO4 solution using multiple deposition procedure. X-ray photoelectron spectroscopy (XPS) analysis has shown that after immersion into the Pt containing solution and rinsing with water, Pt(OH)2 resides on the Au(1 1 1) substrate. Consecutive depositions as well as in situ scanning tunneling microscopy (STM) and electrochemical measurements are performed on previously electrochemically reduced Pt/Au(1 1 1) surfaces. Only homogeneous distribution of thus deposited Pt islands is observed by in situ STM. With subsequent depositions, the width of deposited Pt islands increases, but stays lower than 10 nm, while a significant increase of Pt islands height is observed, leading to moderate increase of the coverage. Cyclic voltammetry (CV) profiles of obtained Pt/Au(1 1 1) surfaces, and CO stripping curves are recorded in 0.5 M H2SO4 solution. CO oxidation takes place only at higher potentials shifting negatively with increasing coverage. This is discussed with respect to Pt islands width and height distributions and to the influence of the Au(1 1 1) substrate surface.
PB  - Elsevier
T2  - Electrochimica Acta
T1  - Carbon monoxide oxidation on Au(111) surface decorated by spontaneously deposited Pt
VL  - 53
IS  - 2
SP  - 998
EP  - 1005
DO  - 10.1016/j.electacta.2007.08.019
ER  - 

@article{
author = "Štrbac, Svetlana and Petrovic, S. and Vasilic, R. and Kovac, J. and Zalar, A. and Rakocevic, Z.",
year = "2007",
abstract = "Platinum is deposited spontaneously on Au(1 1 1) surface from 1 mM H2PtCl6 + 1 M HClO4 solution using multiple deposition procedure. X-ray photoelectron spectroscopy (XPS) analysis has shown that after immersion into the Pt containing solution and rinsing with water, Pt(OH)2 resides on the Au(1 1 1) substrate. Consecutive depositions as well as in situ scanning tunneling microscopy (STM) and electrochemical measurements are performed on previously electrochemically reduced Pt/Au(1 1 1) surfaces. Only homogeneous distribution of thus deposited Pt islands is observed by in situ STM. With subsequent depositions, the width of deposited Pt islands increases, but stays lower than 10 nm, while a significant increase of Pt islands height is observed, leading to moderate increase of the coverage. Cyclic voltammetry (CV) profiles of obtained Pt/Au(1 1 1) surfaces, and CO stripping curves are recorded in 0.5 M H2SO4 solution. CO oxidation takes place only at higher potentials shifting negatively with increasing coverage. This is discussed with respect to Pt islands width and height distributions and to the influence of the Au(1 1 1) substrate surface.",
publisher = "Elsevier",
journal = "Electrochimica Acta",
title = "Carbon monoxide oxidation on Au(111) surface decorated by spontaneously deposited Pt",
volume = "53",
number = "2",
pages = "998-1005",
doi = "10.1016/j.electacta.2007.08.019"
}

Štrbac, S., Petrovic, S., Vasilic, R., Kovac, J., Zalar, A.,& Rakocevic, Z.. (2007). Carbon monoxide oxidation on Au(111) surface decorated by spontaneously deposited Pt. in Electrochimica Acta
Elsevier., 53(2), 998-1005.
https://doi.org/10.1016/j.electacta.2007.08.019

Štrbac S, Petrovic S, Vasilic R, Kovac J, Zalar A, Rakocevic Z. Carbon monoxide oxidation on Au(111) surface decorated by spontaneously deposited Pt. in Electrochimica Acta. 2007;53(2):998-1005.
doi:10.1016/j.electacta.2007.08.019 .

Štrbac, Svetlana, Petrovic, S., Vasilic, R., Kovac, J., Zalar, A., Rakocevic, Z., "Carbon monoxide oxidation on Au(111) surface decorated by spontaneously deposited Pt" in Electrochimica Acta, 53, no. 2 (2007):998-1005,
https://doi.org/10.1016/j.electacta.2007.08.019 . .

TY  - JOUR
AU  - Štrbac, Svetlana
AU  - Johnston, Christina Marie
AU  - Wiȩckowski, Andrzej
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4349
AB  - The structure and reactivity of bimetallic electrodes obtained by spontaneous deposition of Ru and Os on Au(111) single-crystal surfaces are studied. In situ electrochemical STM and cyclic voltammetry are used to characterize a wide range of surface morphologies thus produced. The STM results on Ru/Au(111) demonstrate a pronounced step decoration, while a random distribution of Ru nuclei, quite uniform in size, occurs on terraces. Osmium deposits show a slight preference for deposition on steps, but it also occurs readily on terraces. However, many of the Os islands grow into multilayer heights. The coverage of the Au(111) by the deposited Ru or Os islands for a particular solution concentration depends on the deposition time. Nanostructures of Ru and Os are tested for catalytic behavior and correlated to CO oxidation activity as measured by CO stripping voltammetry
PB  - Russia : Maik Nauka-Interperiodica Publishing
T2  - Russian Journal of Electrochemistry
T1  - Decorated Ru/Au(111) and Os/Au(111) surfaces: An in situ STM and electrochemistry study
VL  - 42
IS  - 11
SP  - 1244
EP  - 1250
DO  - 10.1134/S1023193506110115
ER  - 

@article{
author = "Štrbac, Svetlana and Johnston, Christina Marie and Wiȩckowski, Andrzej",
year = "2006",
abstract = "The structure and reactivity of bimetallic electrodes obtained by spontaneous deposition of Ru and Os on Au(111) single-crystal surfaces are studied. In situ electrochemical STM and cyclic voltammetry are used to characterize a wide range of surface morphologies thus produced. The STM results on Ru/Au(111) demonstrate a pronounced step decoration, while a random distribution of Ru nuclei, quite uniform in size, occurs on terraces. Osmium deposits show a slight preference for deposition on steps, but it also occurs readily on terraces. However, many of the Os islands grow into multilayer heights. The coverage of the Au(111) by the deposited Ru or Os islands for a particular solution concentration depends on the deposition time. Nanostructures of Ru and Os are tested for catalytic behavior and correlated to CO oxidation activity as measured by CO stripping voltammetry",
publisher = "Russia : Maik Nauka-Interperiodica Publishing",
journal = "Russian Journal of Electrochemistry",
title = "Decorated Ru/Au(111) and Os/Au(111) surfaces: An in situ STM and electrochemistry study",
volume = "42",
number = "11",
pages = "1244-1250",
doi = "10.1134/S1023193506110115"
}

Štrbac, S., Johnston, C. M.,& Wiȩckowski, A.. (2006). Decorated Ru/Au(111) and Os/Au(111) surfaces: An in situ STM and electrochemistry study. in Russian Journal of Electrochemistry
Russia : Maik Nauka-Interperiodica Publishing., 42(11), 1244-1250.
https://doi.org/10.1134/S1023193506110115

Štrbac S, Johnston CM, Wiȩckowski A. Decorated Ru/Au(111) and Os/Au(111) surfaces: An in situ STM and electrochemistry study. in Russian Journal of Electrochemistry. 2006;42(11):1244-1250.
doi:10.1134/S1023193506110115 .

Štrbac, Svetlana, Johnston, Christina Marie, Wiȩckowski, Andrzej, "Decorated Ru/Au(111) and Os/Au(111) surfaces: An in situ STM and electrochemistry study" in Russian Journal of Electrochemistry, 42, no. 11 (2006):1244-1250,
https://doi.org/10.1134/S1023193506110115 . .