Dojčinović, I.P.

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  • Dojčinović, I.P. (2)
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Author's Bibliography

Magnetic field influence on silicon surface periodic structures obtained by plasma flow action

Dojčinović, I.P.; Kuraica, Milorad M.; Mitrovi, Ć M.; Randjelović, Danijela; Matić, M.; Puri, Ć J.

(2006)

TY  - CONF
AU  - Dojčinović, I.P.
AU  - Kuraica, Milorad M.
AU  - Mitrovi, Ć M.
AU  - Randjelović, Danijela
AU  - Matić, M.
AU  - Puri, Ć J.
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/277
AB  - External magnetic field influence on silicon submicron surface periodic structures obtained by the action of nitrogen supersonic quasistationary compression plasma flow (CPF) is studied. CPF is generated by magnetoplasma compressor. It was found that, without external magnetic field, highly-oriented silicon periodic cylindrical shape structures are produced during single pulse surface treatment. Silicon periodic structures were modified by external constant magnetic field. Hexagonal structures of the side length about 500 nm and height of the order of 10 nm, are obtained. Morphology investigation was made by SEM and AFM microscopy.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - Magnetic field influence on silicon surface periodic structures obtained by plasma flow action
SP  - 149
EP  - 152
DO  - 10.1109/ICMEL.2006.1650916
ER  - 
@conference{
author = "Dojčinović, I.P. and Kuraica, Milorad M. and Mitrovi, Ć M. and Randjelović, Danijela and Matić, M. and Puri, Ć J.",
year = "2006",
abstract = "External magnetic field influence on silicon submicron surface periodic structures obtained by the action of nitrogen supersonic quasistationary compression plasma flow (CPF) is studied. CPF is generated by magnetoplasma compressor. It was found that, without external magnetic field, highly-oriented silicon periodic cylindrical shape structures are produced during single pulse surface treatment. Silicon periodic structures were modified by external constant magnetic field. Hexagonal structures of the side length about 500 nm and height of the order of 10 nm, are obtained. Morphology investigation was made by SEM and AFM microscopy.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "Magnetic field influence on silicon surface periodic structures obtained by plasma flow action",
pages = "149-152",
doi = "10.1109/ICMEL.2006.1650916"
}
Dojčinović, I.P., Kuraica, M. M., Mitrovi, Ć. M., Randjelović, D., Matić, M.,& Puri, Ć. J.. (2006). Magnetic field influence on silicon surface periodic structures obtained by plasma flow action. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings, 149-152.
https://doi.org/10.1109/ICMEL.2006.1650916
Dojčinović I, Kuraica MM, Mitrovi ĆM, Randjelović D, Matić M, Puri ĆJ. Magnetic field influence on silicon surface periodic structures obtained by plasma flow action. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:149-152.
doi:10.1109/ICMEL.2006.1650916 .
Dojčinović, I.P., Kuraica, Milorad M., Mitrovi, Ć M., Randjelović, Danijela, Matić, M., Puri, Ć J., "Magnetic field influence on silicon surface periodic structures obtained by plasma flow action" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):149-152,
https://doi.org/10.1109/ICMEL.2006.1650916 . .

Silicon surface exfoliation under compression plasma flow action

Dojčinović, I.P.; Kuraica, Milorad M.; Randjelović, Danijela; Mati, Ć M.; Puri, Ć J.

(2006)

TY  - CONF
AU  - Dojčinović, I.P.
AU  - Kuraica, Milorad M.
AU  - Randjelović, Danijela
AU  - Mati, Ć M.
AU  - Puri, Ć J.
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/284
AB  - Silicon single crystal surfaces have been modified by supersonic compression plasma flows (CPF) action. Triangular and rhombic regular fracture features are obtained on the Si (111), while rectangular ones are produced on Si (100) surface. Some of these regular structures can become free from the underlying bulk, formed as blocks ejected from the surface. Surface cleavage and exfoliation phenomena as the results of specific conditions during CPF interaction on silicon surface are, also, observed. Such conditions are the results of rapid heating and melting of surface layer, long existence of molten layer (∼40 μs) and fast cooling and recrystalisation taking place under the high dynamic pressure and thermodynamic parameters gradients.
C3  - 25th International Conference on Microelectronics, MIEL 2006 - Proceedings
T1  - Silicon surface exfoliation under compression plasma flow action
SP  - 145
EP  - 148
DO  - 10.1109/ICMEL.2006.1650915
ER  - 
@conference{
author = "Dojčinović, I.P. and Kuraica, Milorad M. and Randjelović, Danijela and Mati, Ć M. and Puri, Ć J.",
year = "2006",
abstract = "Silicon single crystal surfaces have been modified by supersonic compression plasma flows (CPF) action. Triangular and rhombic regular fracture features are obtained on the Si (111), while rectangular ones are produced on Si (100) surface. Some of these regular structures can become free from the underlying bulk, formed as blocks ejected from the surface. Surface cleavage and exfoliation phenomena as the results of specific conditions during CPF interaction on silicon surface are, also, observed. Such conditions are the results of rapid heating and melting of surface layer, long existence of molten layer (∼40 μs) and fast cooling and recrystalisation taking place under the high dynamic pressure and thermodynamic parameters gradients.",
journal = "25th International Conference on Microelectronics, MIEL 2006 - Proceedings",
title = "Silicon surface exfoliation under compression plasma flow action",
pages = "145-148",
doi = "10.1109/ICMEL.2006.1650915"
}
Dojčinović, I.P., Kuraica, M. M., Randjelović, D., Mati, Ć. M.,& Puri, Ć. J.. (2006). Silicon surface exfoliation under compression plasma flow action. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings, 145-148.
https://doi.org/10.1109/ICMEL.2006.1650915
Dojčinović I, Kuraica MM, Randjelović D, Mati ĆM, Puri ĆJ. Silicon surface exfoliation under compression plasma flow action. in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings. 2006;:145-148.
doi:10.1109/ICMEL.2006.1650915 .
Dojčinović, I.P., Kuraica, Milorad M., Randjelović, Danijela, Mati, Ć M., Puri, Ć J., "Silicon surface exfoliation under compression plasma flow action" in 25th International Conference on Microelectronics, MIEL 2006 - Proceedings (2006):145-148,
https://doi.org/10.1109/ICMEL.2006.1650915 . .