Vujanić, Aleksandar

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  • Vujanić, Aleksandar (3)
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Author's Bibliography

Nanofabrication of negative refractive index metasurfaces

Jakšić, Zoran; Vasiljević-Radović, Dana; Maksimović, Milan; Sarajlić, Milija; Vujanić, Aleksandar; Đurić, Zoran G.

(Elsevier, 2006)

TY  - JOUR
AU  - Jakšić, Zoran
AU  - Vasiljević-Radović, Dana
AU  - Maksimović, Milan
AU  - Sarajlić, Milija
AU  - Vujanić, Aleksandar
AU  - Đurić, Zoran G.
PY  - 2006
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3240
AB  - We designed and fabricated planar metamaterial ‘particles’ (metasurfaces) intended to achieve negative effective refractive index in mid-infrared. We considered double split ring resonators (negative permeability particles) with additional capacitive gaps to compensate for the inertial inductance, as well as complementary double split rings (negative permittivity). We calculated dispersion relations and considered scaling conditions for our structures. For the fabrication of our experimental samples we used scanning probe nanolithography with z-scanner movement in 20 nm thin silver layers sputtered on positive photoresist or on polycarbonate. The morphology of our structures was characterized by atomic force microscope. We utilized a line width of 80–120 nm and the nanolithographic groove depth in different samples ranged from 4 to 80 nm. We believe our approach could be useful as a simple and low-cost tool for fabrication, assessment and optimization of different metamaterial geometries before larger arrays of particles are fabricated using other, more sophisticated and complex methods.
PB  - Elsevier
T2  - Microelectronic Engineering
T1  - Nanofabrication of negative refractive index metasurfaces
VL  - 83
IS  - 4-9
SP  - 1786
EP  - 1791
DO  - 10.1016/j.mee.2006.01.197
ER  - 
@article{
author = "Jakšić, Zoran and Vasiljević-Radović, Dana and Maksimović, Milan and Sarajlić, Milija and Vujanić, Aleksandar and Đurić, Zoran G.",
year = "2006",
abstract = "We designed and fabricated planar metamaterial ‘particles’ (metasurfaces) intended to achieve negative effective refractive index in mid-infrared. We considered double split ring resonators (negative permeability particles) with additional capacitive gaps to compensate for the inertial inductance, as well as complementary double split rings (negative permittivity). We calculated dispersion relations and considered scaling conditions for our structures. For the fabrication of our experimental samples we used scanning probe nanolithography with z-scanner movement in 20 nm thin silver layers sputtered on positive photoresist or on polycarbonate. The morphology of our structures was characterized by atomic force microscope. We utilized a line width of 80–120 nm and the nanolithographic groove depth in different samples ranged from 4 to 80 nm. We believe our approach could be useful as a simple and low-cost tool for fabrication, assessment and optimization of different metamaterial geometries before larger arrays of particles are fabricated using other, more sophisticated and complex methods.",
publisher = "Elsevier",
journal = "Microelectronic Engineering",
title = "Nanofabrication of negative refractive index metasurfaces",
volume = "83",
number = "4-9",
pages = "1786-1791",
doi = "10.1016/j.mee.2006.01.197"
}
Jakšić, Z., Vasiljević-Radović, D., Maksimović, M., Sarajlić, M., Vujanić, A.,& Đurić, Z. G.. (2006). Nanofabrication of negative refractive index metasurfaces. in Microelectronic Engineering
Elsevier., 83(4-9), 1786-1791.
https://doi.org/10.1016/j.mee.2006.01.197
Jakšić Z, Vasiljević-Radović D, Maksimović M, Sarajlić M, Vujanić A, Đurić ZG. Nanofabrication of negative refractive index metasurfaces. in Microelectronic Engineering. 2006;83(4-9):1786-1791.
doi:10.1016/j.mee.2006.01.197 .
Jakšić, Zoran, Vasiljević-Radović, Dana, Maksimović, Milan, Sarajlić, Milija, Vujanić, Aleksandar, Đurić, Zoran G., "Nanofabrication of negative refractive index metasurfaces" in Microelectronic Engineering, 83, no. 4-9 (2006):1786-1791,
https://doi.org/10.1016/j.mee.2006.01.197 . .
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A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies

Jakšić, Zoran; Jakšić, Olga; Vujanić, Aleksandar; Đurić, Zoran G.; Petrović, Radomir; Randjelović, Danijela

(IEEE Computer Society, 2002)

TY  - CONF
AU  - Jakšić, Zoran
AU  - Jakšić, Olga
AU  - Vujanić, Aleksandar
AU  - Đurić, Zoran G.
AU  - Petrović, Radomir
AU  - Randjelović, Danijela
PY  - 2002
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/85
AB  - We analyze fabrication-induced imperfections and disorder in our photonic crystals (PC) fabricated by microsystem technologies. Based on a correspondence between holograms and photonic crystals, we introduce technological figures of merit valid for arbitrary PC structures. We use these figures of merit to analyze a practical example of a 1D PC structure. To this purpose we designed our PCs for middle-wavelength infrared range using the transfer matrix technique and fabricated them in silicon/silica using rf sputtering. We used scanning electron microscopy to determine the cross-sectional geometrical parameters of PCs and to find out their deviations from the designed values. Fourier infrared spectroscopy was used to measure spectral transmittance of the samples. The observed imperfections result in spectral transmission curves deviating from the designed characteristics, and reduce overall transmission by scattering. The presented analysis enables the prediction of attainable quality of PCs. The approach is applicable to any of 1D, 2D or 3D photonic crystals.
PB  - IEEE Computer Society
C3  - 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings
T1  - A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies
VL  - 1
SP  - 293
EP  - 296
DO  - 10.1109/MIEL.2002.1003195
ER  - 
@conference{
author = "Jakšić, Zoran and Jakšić, Olga and Vujanić, Aleksandar and Đurić, Zoran G. and Petrović, Radomir and Randjelović, Danijela",
year = "2002",
abstract = "We analyze fabrication-induced imperfections and disorder in our photonic crystals (PC) fabricated by microsystem technologies. Based on a correspondence between holograms and photonic crystals, we introduce technological figures of merit valid for arbitrary PC structures. We use these figures of merit to analyze a practical example of a 1D PC structure. To this purpose we designed our PCs for middle-wavelength infrared range using the transfer matrix technique and fabricated them in silicon/silica using rf sputtering. We used scanning electron microscopy to determine the cross-sectional geometrical parameters of PCs and to find out their deviations from the designed values. Fourier infrared spectroscopy was used to measure spectral transmittance of the samples. The observed imperfections result in spectral transmission curves deviating from the designed characteristics, and reduce overall transmission by scattering. The presented analysis enables the prediction of attainable quality of PCs. The approach is applicable to any of 1D, 2D or 3D photonic crystals.",
publisher = "IEEE Computer Society",
journal = "23rd International Conference on Microelectronics, MIEL 2002 - Proceedings",
title = "A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies",
volume = "1",
pages = "293-296",
doi = "10.1109/MIEL.2002.1003195"
}
Jakšić, Z., Jakšić, O., Vujanić, A., Đurić, Z. G., Petrović, R.,& Randjelović, D.. (2002). A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies. in 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings
IEEE Computer Society., 1, 293-296.
https://doi.org/10.1109/MIEL.2002.1003195
Jakšić Z, Jakšić O, Vujanić A, Đurić ZG, Petrović R, Randjelović D. A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies. in 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings. 2002;1:293-296.
doi:10.1109/MIEL.2002.1003195 .
Jakšić, Zoran, Jakšić, Olga, Vujanić, Aleksandar, Đurić, Zoran G., Petrović, Radomir, Randjelović, Danijela, "A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies" in 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings, 1 (2002):293-296,
https://doi.org/10.1109/MIEL.2002.1003195 . .

Photodiode quantum efficiency optimization using spherical pits on active surfaces

Vujanić, Aleksandar; Smiljanić, Miloljub

(Elsevier, 1995)

TY  - JOUR
AU  - Vujanić, Aleksandar
AU  - Smiljanić, Miloljub
PY  - 1995
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/3072
AB  - A numerical model of a photodiode with etched spherical pits on an active surface has been developed. Several geometrical parameters (radius of curvature, depth and arrangement of spherical pits, sample thickness and area, and thickness of the anti-reflection layer) were varied and their influence on the quantum efficiency of the structure was considered. It has been shown that the photodiode quantum efficiency can be optimized by the proper choice of these parameters. From the technological point of view, it is very important that the optimized quantum efficiency can be achieved without a strict definition of the device geometry.
PB  - Elsevier
T2  - Microelectronics Journal
T1  - Photodiode quantum efficiency optimization using spherical pits on active surfaces
VL  - 26
IS  - 5
SP  - 413
EP  - 419
DO  - 10.1016/0026-2692(95)98943-L
ER  - 
@article{
author = "Vujanić, Aleksandar and Smiljanić, Miloljub",
year = "1995",
abstract = "A numerical model of a photodiode with etched spherical pits on an active surface has been developed. Several geometrical parameters (radius of curvature, depth and arrangement of spherical pits, sample thickness and area, and thickness of the anti-reflection layer) were varied and their influence on the quantum efficiency of the structure was considered. It has been shown that the photodiode quantum efficiency can be optimized by the proper choice of these parameters. From the technological point of view, it is very important that the optimized quantum efficiency can be achieved without a strict definition of the device geometry.",
publisher = "Elsevier",
journal = "Microelectronics Journal",
title = "Photodiode quantum efficiency optimization using spherical pits on active surfaces",
volume = "26",
number = "5",
pages = "413-419",
doi = "10.1016/0026-2692(95)98943-L"
}
Vujanić, A.,& Smiljanić, M.. (1995). Photodiode quantum efficiency optimization using spherical pits on active surfaces. in Microelectronics Journal
Elsevier., 26(5), 413-419.
https://doi.org/10.1016/0026-2692(95)98943-L
Vujanić A, Smiljanić M. Photodiode quantum efficiency optimization using spherical pits on active surfaces. in Microelectronics Journal. 1995;26(5):413-419.
doi:10.1016/0026-2692(95)98943-L .
Vujanić, Aleksandar, Smiljanić, Miloljub, "Photodiode quantum efficiency optimization using spherical pits on active surfaces" in Microelectronics Journal, 26, no. 5 (1995):413-419,
https://doi.org/10.1016/0026-2692(95)98943-L . .
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