Nanofabrication of negative refractive index metasurfaces
Само за регистроване кориснике
2006
Аутори
Jakšić, ZoranVasiljević-Radović, Dana
Maksimović, Milan
Sarajlić, Milija
Vujanić, Aleksandar
Đurić, Zoran G.
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
We designed and fabricated planar metamaterial ‘particles’ (metasurfaces) intended to achieve negative effective refractive index in mid-infrared. We considered double split ring resonators (negative permeability particles) with additional capacitive gaps to compensate for the inertial inductance, as well as complementary double split rings (negative permittivity). We calculated dispersion relations and considered scaling conditions for our structures. For the fabrication of our experimental samples we used scanning probe nanolithography with z-scanner movement in 20 nm thin silver layers sputtered on positive photoresist or on polycarbonate. The morphology of our structures was characterized by atomic force microscope. We utilized a line width of 80–120 nm and the nanolithographic groove depth in different samples ranged from 4 to 80 nm. We believe our approach could be useful as a simple and low-cost tool for fabrication, assessment and optimization of different metamaterial geometri...es before larger arrays of particles are fabricated using other, more sophisticated and complex methods.
Кључне речи:
Nanolithography / Nanophotonics / Metamaterials / Mesoscopic optics / Subwavelength opticsИзвор:
Microelectronic Engineering, 2006, 83, 4-9, 1786-1791Издавач:
- Elsevier
DOI: 10.1016/j.mee.2006.01.197
ISSN: 0167-9317
WoS: 000237581900280
Scopus: 2-s2.0-33646037338
Институција/група
IHTMTY - JOUR AU - Jakšić, Zoran AU - Vasiljević-Radović, Dana AU - Maksimović, Milan AU - Sarajlić, Milija AU - Vujanić, Aleksandar AU - Đurić, Zoran G. PY - 2006 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/3240 AB - We designed and fabricated planar metamaterial ‘particles’ (metasurfaces) intended to achieve negative effective refractive index in mid-infrared. We considered double split ring resonators (negative permeability particles) with additional capacitive gaps to compensate for the inertial inductance, as well as complementary double split rings (negative permittivity). We calculated dispersion relations and considered scaling conditions for our structures. For the fabrication of our experimental samples we used scanning probe nanolithography with z-scanner movement in 20 nm thin silver layers sputtered on positive photoresist or on polycarbonate. The morphology of our structures was characterized by atomic force microscope. We utilized a line width of 80–120 nm and the nanolithographic groove depth in different samples ranged from 4 to 80 nm. We believe our approach could be useful as a simple and low-cost tool for fabrication, assessment and optimization of different metamaterial geometries before larger arrays of particles are fabricated using other, more sophisticated and complex methods. PB - Elsevier T2 - Microelectronic Engineering T1 - Nanofabrication of negative refractive index metasurfaces VL - 83 IS - 4-9 SP - 1786 EP - 1791 DO - 10.1016/j.mee.2006.01.197 ER -
@article{ author = "Jakšić, Zoran and Vasiljević-Radović, Dana and Maksimović, Milan and Sarajlić, Milija and Vujanić, Aleksandar and Đurić, Zoran G.", year = "2006", abstract = "We designed and fabricated planar metamaterial ‘particles’ (metasurfaces) intended to achieve negative effective refractive index in mid-infrared. We considered double split ring resonators (negative permeability particles) with additional capacitive gaps to compensate for the inertial inductance, as well as complementary double split rings (negative permittivity). We calculated dispersion relations and considered scaling conditions for our structures. For the fabrication of our experimental samples we used scanning probe nanolithography with z-scanner movement in 20 nm thin silver layers sputtered on positive photoresist or on polycarbonate. The morphology of our structures was characterized by atomic force microscope. We utilized a line width of 80–120 nm and the nanolithographic groove depth in different samples ranged from 4 to 80 nm. We believe our approach could be useful as a simple and low-cost tool for fabrication, assessment and optimization of different metamaterial geometries before larger arrays of particles are fabricated using other, more sophisticated and complex methods.", publisher = "Elsevier", journal = "Microelectronic Engineering", title = "Nanofabrication of negative refractive index metasurfaces", volume = "83", number = "4-9", pages = "1786-1791", doi = "10.1016/j.mee.2006.01.197" }
Jakšić, Z., Vasiljević-Radović, D., Maksimović, M., Sarajlić, M., Vujanić, A.,& Đurić, Z. G.. (2006). Nanofabrication of negative refractive index metasurfaces. in Microelectronic Engineering Elsevier., 83(4-9), 1786-1791. https://doi.org/10.1016/j.mee.2006.01.197
Jakšić Z, Vasiljević-Radović D, Maksimović M, Sarajlić M, Vujanić A, Đurić ZG. Nanofabrication of negative refractive index metasurfaces. in Microelectronic Engineering. 2006;83(4-9):1786-1791. doi:10.1016/j.mee.2006.01.197 .
Jakšić, Zoran, Vasiljević-Radović, Dana, Maksimović, Milan, Sarajlić, Milija, Vujanić, Aleksandar, Đurić, Zoran G., "Nanofabrication of negative refractive index metasurfaces" in Microelectronic Engineering, 83, no. 4-9 (2006):1786-1791, https://doi.org/10.1016/j.mee.2006.01.197 . .