@conference{
author = "Smiljanić, Milče M. and Lazić, Žarko and Radjenović, Branislav and Radjenović-Radmilović, Marija and Jović, Vesna and Rašljić, Milena and Cvetanović, Katarina and Filipović, Ana",
year = "2019",
abstract = "In this paper, we present and analyze etching of
parallelogram patterns in the masking layer on a (100) silicon in
25 wt % TMAH water solution at the temperature of 80 0C. Sides
of parallelogram islands in the masking layer are designed along
<n10> and <100> crystallographic directions. A 3D simulation of
the profile evolution from these patterns during etching of silicon
using the level set method is also presented. We determined all
crystallographic planes that appear during etching in the
experiment and obtained simulated etching profiles of these 3D
structures. A good agreement between dominant
crystallographic planes through experiments and simulations is
obtained.",
publisher = "Society for Electronics, Telecommunications, Computers, Automatic Control and Nuclear Engineering",
journal = "Proceedings - 6th International Conference on Electrical, Electronic and Computing Engineering, IcETRAN 2019, June 03 – 06, 2019, Silver Lake, Serbia",
title = "Etched Parallelogram Patterns with Sides Along <100> and <n10> Directions in 25 wt % TMAH",
pages = "584-589",
url = "https://hdl.handle.net/21.15107/rcub_cer_5771"
}