Surface diffusion of clusters and thin film growth
Abstract
An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed.
Keywords:
Clusters / Growth / Nucleation / Scanning tunneling microscopy / Semi-empirical models and model calculations / Sputter deposition / Surface diffusionSource:
Surface Science, 1995, 343, 3, 247-260Publisher:
- Elsevier
Collections
Institution/Community
IHTMTY - JOUR AU - Rakočević, Zlatko Lj. AU - Štrbac, Svetlana AU - Bibić, Nataša M. AU - Nenadović, Tomislav M. PY - 1995 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4346 AB - An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed. PB - Elsevier T2 - Surface Science T1 - Surface diffusion of clusters and thin film growth VL - 343 IS - 3 SP - 247 EP - 260 DO - 10.1016/0039-6028(95)00816-0 ER -
@article{ author = "Rakočević, Zlatko Lj. and Štrbac, Svetlana and Bibić, Nataša M. and Nenadović, Tomislav M.", year = "1995", abstract = "An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed.", publisher = "Elsevier", journal = "Surface Science", title = "Surface diffusion of clusters and thin film growth", volume = "343", number = "3", pages = "247-260", doi = "10.1016/0039-6028(95)00816-0" }
Rakočević, Z. Lj., Štrbac, S., Bibić, N. M.,& Nenadović, T. M.. (1995). Surface diffusion of clusters and thin film growth. in Surface Science Elsevier., 343(3), 247-260. https://doi.org/10.1016/0039-6028(95)00816-0
Rakočević ZL, Štrbac S, Bibić NM, Nenadović TM. Surface diffusion of clusters and thin film growth. in Surface Science. 1995;343(3):247-260. doi:10.1016/0039-6028(95)00816-0 .
Rakočević, Zlatko Lj., Štrbac, Svetlana, Bibić, Nataša M., Nenadović, Tomislav M., "Surface diffusion of clusters and thin film growth" in Surface Science, 343, no. 3 (1995):247-260, https://doi.org/10.1016/0039-6028(95)00816-0 . .