We analyze fabrication-induced imperfections and disorder in our photonic crystals (PC) fabricated by microsystem technologies. Based on a correspondence between holograms and photonic crystals, we introduce technological figures of merit valid for arbitrary PC structures. We use these figures of merit to analyze a practical example of a 1D PC structure. To this purpose we designed our PCs for middle-wavelength infrared range using the transfer matrix technique and fabricated them in silicon/silica using rf sputtering. We used scanning electron microscopy to determine the cross-sectional geometrical parameters of PCs and to find out their deviations from the designed values. Fourier infrared spectroscopy was used to measure spectral transmittance of the samples. The observed imperfections result in spectral transmission curves deviating from the designed characteristics, and reduce overall transmission by scattering. The presented analysis enables the prediction of attainable quality o...f PCs. The approach is applicable to any of 1D, 2D or 3D photonic crystals.
Keywords:
Photonic crystals / Optical scattering / Personal communication networks / Optical refraction / Optical variables control / Microwave technology
Source:
23rd International Conference on Microelectronics, MIEL 2002 - Proceedings, 2002, 1, 293-296
TY - CONF
AU - Jakšić, Zoran
AU - Jakšić, Olga
AU - Vujanić, Aleksandar
AU - Đurić, Zoran G.
AU - Petrović, Radomir
AU - Ranđelović, Danijela
PY - 2002
UR - http://cer.ihtm.bg.ac.rs/handle/123456789/85
AB - We analyze fabrication-induced imperfections and disorder in our photonic crystals (PC) fabricated by microsystem technologies. Based on a correspondence between holograms and photonic crystals, we introduce technological figures of merit valid for arbitrary PC structures. We use these figures of merit to analyze a practical example of a 1D PC structure. To this purpose we designed our PCs for middle-wavelength infrared range using the transfer matrix technique and fabricated them in silicon/silica using rf sputtering. We used scanning electron microscopy to determine the cross-sectional geometrical parameters of PCs and to find out their deviations from the designed values. Fourier infrared spectroscopy was used to measure spectral transmittance of the samples. The observed imperfections result in spectral transmission curves deviating from the designed characteristics, and reduce overall transmission by scattering. The presented analysis enables the prediction of attainable quality of PCs. The approach is applicable to any of 1D, 2D or 3D photonic crystals.
PB - IEEE Computer Society
C3 - 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings
T1 - A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies
VL - 1
SP - 293
EP - 296
DO - 10.1109/MIEL.2002.1003195
ER -
@conference{
author = "Jakšić, Zoran and Jakšić, Olga and Vujanić, Aleksandar and Đurić, Zoran G. and Petrović, Radomir and Ranđelović, Danijela",
year = "2002",
url = "http://cer.ihtm.bg.ac.rs/handle/123456789/85",
abstract = "We analyze fabrication-induced imperfections and disorder in our photonic crystals (PC) fabricated by microsystem technologies. Based on a correspondence between holograms and photonic crystals, we introduce technological figures of merit valid for arbitrary PC structures. We use these figures of merit to analyze a practical example of a 1D PC structure. To this purpose we designed our PCs for middle-wavelength infrared range using the transfer matrix technique and fabricated them in silicon/silica using rf sputtering. We used scanning electron microscopy to determine the cross-sectional geometrical parameters of PCs and to find out their deviations from the designed values. Fourier infrared spectroscopy was used to measure spectral transmittance of the samples. The observed imperfections result in spectral transmission curves deviating from the designed characteristics, and reduce overall transmission by scattering. The presented analysis enables the prediction of attainable quality of PCs. The approach is applicable to any of 1D, 2D or 3D photonic crystals.",
publisher = "IEEE Computer Society",
journal = "23rd International Conference on Microelectronics, MIEL 2002 - Proceedings",
title = "A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies",
volume = "1",
pages = "293-296",
doi = "10.1109/MIEL.2002.1003195"
}
Jakšić Z, Jakšić O, Vujanić A, Đurić ZG, Petrović R, Ranđelović D. A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies. 23rd International Conference on Microelectronics, MIEL 2002 - Proceedings. 2002;1:293-296
Jakšić, Z., Jakšić, O., Vujanić, A., Đurić, Z. G., Petrović, R.,& Ranđelović, D. (2002). A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies.
23rd International Conference on Microelectronics, MIEL 2002 - ProceedingsIEEE Computer Society., 1, 293-296.
https://doi.org/10.1109/MIEL.2002.1003195
Jakšić Zoran, Jakšić Olga, Vujanić Aleksandar, Đurić Zoran G., Petrović Radomir, Ranđelović Danijela, "A consideration of fabrication-induced imperfections in photonic crystals for optical frequencies" 1 (2002):293-296,
https://doi.org/10.1109/MIEL.2002.1003195 .
