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Micromachining by maskless wet anisotropic etching {hkl} structures on {100} oriented silicon

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2010
Authors
Jović, Vesna
Lamovec, Jelena
Smiljanić, Milče
Popović, Mina
Conference object (Published version)
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Abstract
The paper presents investigation of micromechanical technique using 3D anisotropically etched Si structures. Ridge-like structure oriented along LT 110> direction is first etched with mask following maskless etching in 25 wt. % TMAH solution in water at 80°C. The ridge structures investigated by maskless etching are convex prismatic edges included by {100} and {111} planes. Experimental results verify that the cutting planes developed at the ridge corners are {733} planes. From analytical relations applied to experiments, the ratio between the etching rates for the {733} (the fastest etching plane at the edge step) and {100} planes is found.
Source:
27th International Conference on Microelectronics, MIEL 2010 - Proceedings, 2010, 243-246
Projects:
  • Inteligentni industrijski transmiteri na bazi sopstvenih IHTM senzora (RS-11025)

DOI: 10.1109/MIEL.2010.5490489

ISBN: 978-142447201-7

Scopus: 2-s2.0-77955182615
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URI
http://cer.ihtm.bg.ac.rs/handle/123456789/757
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