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dc.creatorTodorović, D. M.
dc.creatorCretin, B.
dc.creatorSong, Y.Q.
dc.creatorJović, Vesna
dc.date.accessioned2019-01-30T17:24:55Z
dc.date.available2019-01-30T17:24:55Z
dc.date.issued2010
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/751
dc.description.abstractThe silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.en
dc.rightsrestrictedAccess
dc.source27th International Conference on Microelectronics, MIEL 2010 - Proceedings
dc.titlePhotothermal elastic vibration spectra of SiO2 film on Sien
dc.typeconferenceObject
dc.rights.licenseARR
dcterms.abstractСонг, Y.Q.; Јовић, Весна; Цретин, Б.; Тодоровић, Д. М.;
dc.citation.spage247
dc.citation.epage250
dc.citation.other: 247-250
dc.identifier.doi10.1109/MIEL.2010.5490490
dc.identifier.scopus2-s2.0-77955185079
dc.type.versionpublishedVersion


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Приказ основних података о документу