The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.
Source:
27th International Conference on Microelectronics, MIEL 2010 - Proceedings, 2010, 247-250
TY - CONF
AU - Todorović, D. M.
AU - Cretin, B.
AU - Song, Y.Q.
AU - Jović, Vesna
PY - 2010
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/751
AB - The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.
C3 - 27th International Conference on Microelectronics, MIEL 2010 - Proceedings
T1 - Photothermal elastic vibration spectra of SiO2 film on Si
SP - 247
EP - 250
DO - 10.1109/MIEL.2010.5490490
ER -
@conference{
author = "Todorović, D. M. and Cretin, B. and Song, Y.Q. and Jović, Vesna",
year = "2010",
abstract = "The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.",
journal = "27th International Conference on Microelectronics, MIEL 2010 - Proceedings",
title = "Photothermal elastic vibration spectra of SiO2 film on Si",
pages = "247-250",
doi = "10.1109/MIEL.2010.5490490"
}
Todorović, D. M., Cretin, B., Song, Y.Q.,& Jović, V.. (2010). Photothermal elastic vibration spectra of SiO2 film on Si. in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings, 247-250.
https://doi.org/10.1109/MIEL.2010.5490490
Todorović DM, Cretin B, Song Y, Jović V. Photothermal elastic vibration spectra of SiO2 film on Si. in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings. 2010;:247-250.
doi:10.1109/MIEL.2010.5490490 .
Todorović, D. M., Cretin, B., Song, Y.Q., Jović, Vesna, "Photothermal elastic vibration spectra of SiO2 film on Si" in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings (2010):247-250,
https://doi.org/10.1109/MIEL.2010.5490490 . .
