Photothermal elastic vibration spectra of SiO2 film on Si
Само за регистроване кориснике
2010
Конференцијски прилог (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.
Извор:
27th International Conference on Microelectronics, MIEL 2010 - Proceedings, 2010, 247-250Институција/група
IHTMTY - CONF AU - Todorović, D. M. AU - Cretin, B. AU - Song, Y.Q. AU - Jović, Vesna PY - 2010 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/751 AB - The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures. C3 - 27th International Conference on Microelectronics, MIEL 2010 - Proceedings T1 - Photothermal elastic vibration spectra of SiO2 film on Si SP - 247 EP - 250 DO - 10.1109/MIEL.2010.5490490 ER -
@conference{ author = "Todorović, D. M. and Cretin, B. and Song, Y.Q. and Jović, Vesna", year = "2010", abstract = "The silicon-dioxide film on the silicon substrate (SiO2/Si) samples were investigated by the photothermal elastic vibration method. The photothermal elastic vibrations in two-layer rectangular plates were optically excited by the focused laser beam and the generated vibrations were measured with a sensitive optical probe (the double-heterodyne interferometer). The photothermal elastic vibrations spectra were measured and analyzed for different types of Si substrate (with and without the SiO2 films) vs the frequency of modulation of the excitation laser. This investigation is important for analysis of the influence of the different technological processes to the vibrations of the optically driven micromechanical structures, i.e. how the technological processes change the characteristics of micromechanical structures.", journal = "27th International Conference on Microelectronics, MIEL 2010 - Proceedings", title = "Photothermal elastic vibration spectra of SiO2 film on Si", pages = "247-250", doi = "10.1109/MIEL.2010.5490490" }
Todorović, D. M., Cretin, B., Song, Y.Q.,& Jović, V.. (2010). Photothermal elastic vibration spectra of SiO2 film on Si. in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings, 247-250. https://doi.org/10.1109/MIEL.2010.5490490
Todorović DM, Cretin B, Song Y, Jović V. Photothermal elastic vibration spectra of SiO2 film on Si. in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings. 2010;:247-250. doi:10.1109/MIEL.2010.5490490 .
Todorović, D. M., Cretin, B., Song, Y.Q., Jović, Vesna, "Photothermal elastic vibration spectra of SiO2 film on Si" in 27th International Conference on Microelectronics, MIEL 2010 - Proceedings (2010):247-250, https://doi.org/10.1109/MIEL.2010.5490490 . .