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dc.creatorNikolić, Nebojša
dc.creatorBranković, Goran
dc.date.accessioned2019-01-30T17:22:39Z
dc.date.available2019-01-30T17:22:39Z
dc.date.issued2010
dc.identifier.issn1388-2481
dc.identifier.urihttp://cer.ihtm.bg.ac.rs/handle/123456789/644
dc.description.abstractCopper electrodeposition processes in the hydrogen co-deposition range by the pulsating current (PC) regime were examined by the determination of the average current efficiency of hydrogen evolution and by the scanning electron microscopic (SEM) analysis of the morphology of the formed deposits. The two sets of the square-wave PC of the same pause to pulse ratios, but with different duration of deposition pulses and pauses were analyzed. The one set of square-wave PC was with the constant pause duration and different deposition pulses. In the other set, the deposition pulse was constant while the pause duration was varied. The obtained results were compared with those obtained by electrodeposition at the constant overpotential from solutions of different CuSO(4) and H(2)SO(4) concentrations. It was found that the effect of the increasing deposition pulse was equivalent to the decreasing CuSO(4) concentration, while the effect of the decreasing pause duration was equivalent to the increasing H(2)SO(4) concentration. It is shown that it is possible to achieve a substitution of more solutions of different CuSO(4) and H(2)SO(4) concentartions by the use of the only one solution if the appropriate PC parameters were applied, what can be of high technological significance.en
dc.publisherElsevier Science Inc, New York
dc.relationinfo:eu-repo/grantAgreement/MESTD/MPN2006-2010/142032/RS//
dc.rightsrestrictedAccess
dc.sourceElectrochemistry Communications
dc.subjectElectrodepositionen
dc.subjectCopperen
dc.subjectPulsating currenten
dc.subjectMorphologyen
dc.subjectScanning electron microscope (SEM)en
dc.titleEffect of parameters of square-wave pulsating current on copper electrodeposition in the hydrogen co-deposition rangeen
dc.typearticle
dc.rights.licenseARR
dcterms.abstractНиколић, Небојша; Бранковиц, Горан;
dc.citation.volume12
dc.citation.issue6
dc.citation.spage740
dc.citation.epage744
dc.citation.other12(6): 740-744
dc.citation.rankM21
dc.identifier.doi10.1016/j.elecom.2010.03.021
dc.identifier.rcubConv_2522
dc.identifier.scopus2-s2.0-77955716713
dc.identifier.wos000279215700007
dc.type.versionpublishedVersion


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