This paper presents fabrication of microcantilevers on {100} oriented Si substrate by bulk micromachining.
Two types of CCC (Convex Corner Compensation) structures, namely ⟨100⟩ oriented simple beam and structure using
symmetric rectangular blocks oriented in the ⟨110⟩ direction at the apex of the square peg have been analyzed. Etching
solution has been KOH water solution (80 wt. %) at etching temperature of 80 o
C. Detailed construction and etching
behavior of both structures have been given and explained.
TY - CONF
AU - Jović, Vesna
AU - Lamovec, Jelena
AU - Smiljanić, Milče M.
AU - Lazić, Žarko
AU - Popović, Bogdan
AU - Poljak, Predrag
PY - 2016
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/5775
AB - This paper presents fabrication of microcantilevers on {100} oriented Si substrate by bulk micromachining.
Two types of CCC (Convex Corner Compensation) structures, namely ⟨100⟩ oriented simple beam and structure using
symmetric rectangular blocks oriented in the ⟨110⟩ direction at the apex of the square peg have been analyzed. Etching
solution has been KOH water solution (80 wt. %) at etching temperature of 80 o
C. Detailed construction and etching
behavior of both structures have been given and explained.
PB - Belgrade : The Military Technical Institute
C3 - Proceedings - 7th International scientific conference on defensive technologies-proceedings, OTEH 2016, Belgrade, Serbia
T1 - A comparison of different convex corner compensation strucutures applicable in anisotropic wet chemical etching of {100} oriented silicon
UR - https://hdl.handle.net/21.15107/rcub_cer_5775
ER -
@conference{
author = "Jović, Vesna and Lamovec, Jelena and Smiljanić, Milče M. and Lazić, Žarko and Popović, Bogdan and Poljak, Predrag",
year = "2016",
abstract = "This paper presents fabrication of microcantilevers on {100} oriented Si substrate by bulk micromachining.
Two types of CCC (Convex Corner Compensation) structures, namely ⟨100⟩ oriented simple beam and structure using
symmetric rectangular blocks oriented in the ⟨110⟩ direction at the apex of the square peg have been analyzed. Etching
solution has been KOH water solution (80 wt. %) at etching temperature of 80 o
C. Detailed construction and etching
behavior of both structures have been given and explained.",
publisher = "Belgrade : The Military Technical Institute",
journal = "Proceedings - 7th International scientific conference on defensive technologies-proceedings, OTEH 2016, Belgrade, Serbia",
title = "A comparison of different convex corner compensation strucutures applicable in anisotropic wet chemical etching of {100} oriented silicon",
url = "https://hdl.handle.net/21.15107/rcub_cer_5775"
}
Jović, V., Lamovec, J., Smiljanić, M. M., Lazić, Ž., Popović, B.,& Poljak, P.. (2016). A comparison of different convex corner compensation strucutures applicable in anisotropic wet chemical etching of {100} oriented silicon. in Proceedings - 7th International scientific conference on defensive technologies-proceedings, OTEH 2016, Belgrade, Serbia
Belgrade : The Military Technical Institute..
https://hdl.handle.net/21.15107/rcub_cer_5775
Jović V, Lamovec J, Smiljanić MM, Lazić Ž, Popović B, Poljak P. A comparison of different convex corner compensation strucutures applicable in anisotropic wet chemical etching of {100} oriented silicon. in Proceedings - 7th International scientific conference on defensive technologies-proceedings, OTEH 2016, Belgrade, Serbia. 2016;.
https://hdl.handle.net/21.15107/rcub_cer_5775 .
Jović, Vesna, Lamovec, Jelena, Smiljanić, Milče M., Lazić, Žarko, Popović, Bogdan, Poljak, Predrag, "A comparison of different convex corner compensation strucutures applicable in anisotropic wet chemical etching of {100} oriented silicon" in Proceedings - 7th International scientific conference on defensive technologies-proceedings, OTEH 2016, Belgrade, Serbia (2016),
https://hdl.handle.net/21.15107/rcub_cer_5775 .
