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Realizacija Si mikrogredica vlažnim hemijskim nagrizanjem na podlogama (100) orijentacije primenom (100) kompenzacionih traka
Realization of Si microcantilevers by wet anisotropic etching on {100} oriented substrates applying <100> compensation beams
dc.creator | Jović, Vesna | |
dc.creator | Lamovec, Jelena | |
dc.creator | Mladenović, Ivana | |
dc.creator | Smiljanić, Milče | |
dc.creator | Lazić, Žarko | |
dc.date.accessioned | 2023-02-19T00:00:47Z | |
dc.date.available | 2023-02-19T00:00:47Z | |
dc.date.issued | 2013 | |
dc.identifier.isbn | 978-86-80509-68-6 | |
dc.identifier.uri | http://etran.etf.rs/etran2013/fajlovi/Program_ETRAN_2013.pdf | |
dc.identifier.uri | https://cer.ihtm.bg.ac.rs/handle/123456789/5743 | |
dc.description.abstract | U ovom radu je prikazan način realizacije mikrogredica na Si supstratu {100} orijentacije postupcima zapreminskog mikromašinstva. Rastvor za anizotropno nagrizanje je bio vodeni rastvor 30 tež. % KOH na temperaturi od 80C. Istraživanje je skoncentrisano na određivanje dimenzija kompenzacione strukture u vidu trake orijentisane u <100> pravcu kod koje postoji i bočno i čeono nagrizanje. Opisana je procedura za određivanje prirode najbrže nagrizajuće ravni i odnosa brzine nagrizanja ove ravni i podloge, jer su to parametri, osim dimenzija mikrogredice, koji se moraju poznavati da bi se odredile dimenzije kompenzacije konveksnih uglova pri anizotropnom hemijskom nagrizanju. | sr |
dc.description.abstract | This paper presents microcantilever fabrication on {100} oriented Si substrate using bulk micromachining techniques. Solution for anisotropic etching was water solution of 30 wt. % KOH on 80C temperature. Investigation concentrates on the study of compensation design for particular structure using a <100> oriented beam with lateral and frontal etching. Determination procedures for the fastest etching plane and ratio of etching rate of this plane and the substrate plane were described. These data, together with microcantilever dimensions, are necessary for determination of compensating structure which prevents convex corners undercutting during the course of anisotropic etching. | |
dc.language.iso | sr | sr |
dc.publisher | Beograd : Društvo za elektroniku, telekomunikacije, računarstvo, automatiku i nuklearnu tehniku | sr |
dc.relation | info:eu-repo/grantAgreement/MESTD/Technological Development (TD or TR)/32008/RS// | sr |
dc.rights | openAccess | sr |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | |
dc.source | Proceedings - 57th ETRAN Conference, 03-06.06.2022, Zlatibor, Serbia | sr |
dc.subject | Anizotropno vlažno nagrizanje | sr |
dc.subject | podgrizanje konveksnih uglova | sr |
dc.subject | MEMS | sr |
dc.subject | Si mikrogredice | sr |
dc.subject | kompenzaciona šema u vidu traka <100> orijentacije na Si {100} podlozi | sr |
dc.title | Realizacija Si mikrogredica vlažnim hemijskim nagrizanjem na podlogama (100) orijentacije primenom (100) kompenzacionih traka | sr |
dc.title | Realization of Si microcantilevers by wet anisotropic etching on {100} oriented substrates applying <100> compensation beams | |
dc.type | conferenceObject | sr |
dc.rights.license | BY | sr |
dc.citation.issue | MO 3.4 | |
dc.citation.spage | 1 | |
dc.citation.epage | 5 | |
dc.citation.rank | M63 | |
dc.identifier.rcub | https://hdl.handle.net/21.15107/rcub_cer_5743 | |
dc.identifier.fulltext | http://cer.ihtm.bg.ac.rs/bitstream/id/23839/bitstream_23839.pdf | |
dc.type.version | publishedVersion | sr |