Приказ основних података о документу
Wet isotropic chemical etching of Pyrex glass with masking layers Cr/Au
dc.creator | Lazić, Žarko | |
dc.creator | Smiljanić, Milče M. | |
dc.creator | Rašljić, Milena | |
dc.creator | Mladenović, Ivana | |
dc.creator | Radulović, Katarina | |
dc.creator | Sarajlić, Milija | |
dc.creator | Vasiljević-Radović, Dana | |
dc.date.accessioned | 2023-02-18T23:27:34Z | |
dc.date.available | 2023-02-18T23:27:34Z | |
dc.date.issued | 2014 | |
dc.identifier.isbn | 978-86-80509-70-9 | |
dc.identifier.uri | https://cer.ihtm.bg.ac.rs/handle/123456789/5735 | |
dc.description.abstract | In this paper we developed various techniques of wet isotropic chemical etching of Pyrex glass in an aqueous solution of 49% HF. The techniques are based on the processes of sputtering and photolithography. The various thin films of Cr/Au were sputtered. Layers of Cr/Au and photoresist serve as a masking material during etching of Pyrex glass in aqueous HF. | sr |
dc.language.iso | en | sr |
dc.publisher | Beograd : Društvo za ETRAN / Belgrade : ETRAN Society | sr |
dc.relation | info:eu-repo/grantAgreement/MESTD/Technological Development (TD or TR)/32008/RS// | sr |
dc.rights | openAccess | sr |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | |
dc.source | Proceedings - 1st International Conference on Electrical, Electronic and Computing Engineering IcETRAN 2014 | sr |
dc.subject | wet etching | sr |
dc.subject | Pyrex glass | sr |
dc.subject | masking layer | sr |
dc.subject | Cr | sr |
dc.subject | Au | sr |
dc.title | Wet isotropic chemical etching of Pyrex glass with masking layers Cr/Au | sr |
dc.type | conferenceObject | sr |
dc.rights.license | BY | sr |
dc.citation.spage | pp. MOI1.1.1 | |
dc.citation.epage | pp. MOI1.1.4 | |
dc.identifier.rcub | https://hdl.handle.net/21.15107/rcub_cer_5735 | |
dc.identifier.fulltext | http://cer.ihtm.bg.ac.rs/bitstream/id/23838/IcETRAN2014Lazic.pdf | |
dc.type.version | publishedVersion | sr |