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Wet isotropic chemical etching of Pyrex glass with masking layers Cr/Au

dc.creatorLazić, Žarko
dc.creatorSmiljanić, Milče M.
dc.creatorRašljić, Milena
dc.creatorMladenović, Ivana
dc.creatorRadulović, Katarina
dc.creatorSarajlić, Milija
dc.creatorVasiljević-Radović, Dana
dc.date.accessioned2023-02-18T23:27:34Z
dc.date.available2023-02-18T23:27:34Z
dc.date.issued2014
dc.identifier.isbn978-86-80509-70-9
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/5735
dc.description.abstractIn this paper we developed various techniques of wet isotropic chemical etching of Pyrex glass in an aqueous solution of 49% HF. The techniques are based on the processes of sputtering and photolithography. The various thin films of Cr/Au were sputtered. Layers of Cr/Au and photoresist serve as a masking material during etching of Pyrex glass in aqueous HF.sr
dc.language.isoensr
dc.publisherBeograd : Društvo za ETRAN / Belgrade : ETRAN Societysr
dc.relationinfo:eu-repo/grantAgreement/MESTD/Technological Development (TD or TR)/32008/RS//sr
dc.rightsopenAccesssr
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.sourceProceedings - 1st International Conference on Electrical, Electronic and Computing Engineering IcETRAN 2014sr
dc.subjectwet etchingsr
dc.subjectPyrex glasssr
dc.subjectmasking layersr
dc.subjectCrsr
dc.subjectAusr
dc.titleWet isotropic chemical etching of Pyrex glass with masking layers Cr/Ausr
dc.typeconferenceObjectsr
dc.rights.licenseBYsr
dc.citation.spagepp. MOI1.1.1
dc.citation.epagepp. MOI1.1.4
dc.identifier.rcubhttps://hdl.handle.net/21.15107/rcub_cer_5735
dc.identifier.fulltexthttp://cer.ihtm.bg.ac.rs/bitstream/id/23838/IcETRAN2014Lazic.pdf
dc.type.versionpublishedVersionsr


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