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dc.creatorAdžić, Radoslav R.
dc.creatorDespić, Aleksandar R.
dc.date.accessioned2021-06-24T14:56:24Z
dc.date.available2021-06-24T14:56:24Z
dc.date.issued1974
dc.identifier.issn0021-9606
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/4723
dc.description.abstractElectrochemical deposition of up to a monolayer of metal on foreign substrates at potentials positive to the reversible one (underpotential deposition) has been known for some time. 1,2 It appeared interesting to see if an electrochemically deposited layer of these adatoms, with partial ionic character, 3,4 would affect the kinetics of some electrochemical process compared to that at a bare electrode surface.sr
dc.language.isoensr
dc.publisherAIP Publishingsr
dc.rightsrestrictedAccesssr
dc.sourceThe Journal of Chemical Physicssr
dc.subjectcatalysissr
dc.subjectmetal adatomssr
dc.subjectelectrochemistrysr
dc.subjectelectrochemical processsr
dc.subjectelectrodesr
dc.subjectbare electrode surfacesr
dc.titleCatalytic effect of metal adatoms deposited at underpotentialsr
dc.typearticlesr
dc.rights.licenseARRsr
dcterms.abstractAджић, Радослав Р.; Деспић, Aлександар Р.;
dc.citation.volume61
dc.citation.issue8
dc.citation.spage3482
dc.citation.epage3483
dc.identifier.doi10.1063/1.1682519
dc.identifier.scopus2-s2.0-0007867113
dc.type.versionpublishedVersionsr


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Приказ основних података о документу