Pulsating potential electrolysis in the deposition of copper
Samo za registrovane korisnike
1973
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
A very low impedance circuit was constructed in order to provide a pulsating cathodic potential for a copper electrode immersed in a copper sulphate solution of the type used in copper refining. The increase in surface roughness during a fixed period of plating was investigated as a function of the frequency of pulsation. It was established that the relative increase in surface roughness depended linearly on the square root of the reciprocal frequency. This is in accordance with the theory based on the model of amplification of surface roughness being a transport controlled phenomenon.
Ključne reči:
electrolysis / deposition / copper / copper electrode / copper refiningIzvor:
Electrodeposition and Surface Treatments, 1973, 1, 6, 429-438Izdavač:
- Elsevier
Finansiranje / projekti:
- The Fund for Research of the SR Serbia
- The National Science Foundation, USA (Grant No. GF-31057)
Institucija/grupa
IHTMTY - JOUR AU - Savić Maglić, G. AU - Despić, A.R. PY - 1973 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4717 AB - A very low impedance circuit was constructed in order to provide a pulsating cathodic potential for a copper electrode immersed in a copper sulphate solution of the type used in copper refining. The increase in surface roughness during a fixed period of plating was investigated as a function of the frequency of pulsation. It was established that the relative increase in surface roughness depended linearly on the square root of the reciprocal frequency. This is in accordance with the theory based on the model of amplification of surface roughness being a transport controlled phenomenon. PB - Elsevier T2 - Electrodeposition and Surface Treatments T1 - Pulsating potential electrolysis in the deposition of copper VL - 1 IS - 6 SP - 429 EP - 438 DO - 10.1016/0300-9416(73)90026-6 ER -
@article{ author = "Savić Maglić, G. and Despić, A.R.", year = "1973", abstract = "A very low impedance circuit was constructed in order to provide a pulsating cathodic potential for a copper electrode immersed in a copper sulphate solution of the type used in copper refining. The increase in surface roughness during a fixed period of plating was investigated as a function of the frequency of pulsation. It was established that the relative increase in surface roughness depended linearly on the square root of the reciprocal frequency. This is in accordance with the theory based on the model of amplification of surface roughness being a transport controlled phenomenon.", publisher = "Elsevier", journal = "Electrodeposition and Surface Treatments", title = "Pulsating potential electrolysis in the deposition of copper", volume = "1", number = "6", pages = "429-438", doi = "10.1016/0300-9416(73)90026-6" }
Savić Maglić, G.,& Despić, A.R.. (1973). Pulsating potential electrolysis in the deposition of copper. in Electrodeposition and Surface Treatments Elsevier., 1(6), 429-438. https://doi.org/10.1016/0300-9416(73)90026-6
Savić Maglić G, Despić A. Pulsating potential electrolysis in the deposition of copper. in Electrodeposition and Surface Treatments. 1973;1(6):429-438. doi:10.1016/0300-9416(73)90026-6 .
Savić Maglić, G., Despić, A.R., "Pulsating potential electrolysis in the deposition of copper" in Electrodeposition and Surface Treatments, 1, no. 6 (1973):429-438, https://doi.org/10.1016/0300-9416(73)90026-6 . .