Interrupted-flux deposition: Ni on Ru(0001)
Abstract
Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.
Keywords:
Interrupted flux / Nickel / Ru(0001) / UHV-STM / Vacuum depositionSource:
Thin Solid Films, 2008, 517, 2, 709-713Publisher:
- Elsevier
Funding / projects:
DOI: 10.1016/j.tsf.2008.08.116
ISSN: 0040-6090
WoS: 000261693900046
Scopus: 2-s2.0-55149091560
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Institution/Community
IHTMTY - JOUR AU - Rakočević, Zlatko Lj. AU - Štrbac, Svetlana AU - Behm, R.-J. PY - 2008 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/450 AB - Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition. PB - Elsevier T2 - Thin Solid Films T1 - Interrupted-flux deposition: Ni on Ru(0001) VL - 517 IS - 2 SP - 709 EP - 713 DO - 10.1016/j.tsf.2008.08.116 ER -
@article{ author = "Rakočević, Zlatko Lj. and Štrbac, Svetlana and Behm, R.-J.", year = "2008", abstract = "Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.", publisher = "Elsevier", journal = "Thin Solid Films", title = "Interrupted-flux deposition: Ni on Ru(0001)", volume = "517", number = "2", pages = "709-713", doi = "10.1016/j.tsf.2008.08.116" }
Rakočević, Z. Lj., Štrbac, S.,& Behm, R.-J.. (2008). Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films Elsevier., 517(2), 709-713. https://doi.org/10.1016/j.tsf.2008.08.116
Rakočević ZL, Štrbac S, Behm R. Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films. 2008;517(2):709-713. doi:10.1016/j.tsf.2008.08.116 .
Rakočević, Zlatko Lj., Štrbac, Svetlana, Behm, R.-J., "Interrupted-flux deposition: Ni on Ru(0001)" in Thin Solid Films, 517, no. 2 (2008):709-713, https://doi.org/10.1016/j.tsf.2008.08.116 . .