Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.
TY - JOUR
AU - Rakočević, Zlatko Lj.
AU - Štrbac, Svetlana
AU - Behm, R.-J.
PY - 2008
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/450
AB - Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.
PB - Elsevier
T2 - Thin Solid Films
T1 - Interrupted-flux deposition: Ni on Ru(0001)
VL - 517
IS - 2
SP - 709
EP - 713
DO - 10.1016/j.tsf.2008.08.116
ER -
@article{
author = "Rakočević, Zlatko Lj. and Štrbac, Svetlana and Behm, R.-J.",
year = "2008",
abstract = "Nickel was deposited on Ru(0001) in a vacuum chamber at a temperature of 295 K. The depositions were performed using both a continuous and an interrupted flux of Ni, up to the same coverage of 0.25 monolayer. The growth of Ni on Ru(0001) was studied by ultra-high vacuum scanning tunneling microscopy. It is shown that changing the deposition or the pause duration leads to a change of the dominant growth carriers in the postnucleation period, affecting thus the morphology of the obtained Ni/Ru(0001) surfaces. For a pause duration of 10 s, the saturation cluster density obtained by interrupted-flux deposition was two times higher than one obtained with continuous deposition, and increases with the number of periods. With further increase of the pause duration, the saturation cluster density decreased due to the formation of larger clusters, and might even fall below the value obtained for continuous deposition.",
publisher = "Elsevier",
journal = "Thin Solid Films",
title = "Interrupted-flux deposition: Ni on Ru(0001)",
volume = "517",
number = "2",
pages = "709-713",
doi = "10.1016/j.tsf.2008.08.116"
}
Rakočević, Z. Lj., Štrbac, S.,& Behm, R.-J.. (2008). Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films
Elsevier., 517(2), 709-713.
https://doi.org/10.1016/j.tsf.2008.08.116
Rakočević ZL, Štrbac S, Behm R. Interrupted-flux deposition: Ni on Ru(0001). in Thin Solid Films. 2008;517(2):709-713.
doi:10.1016/j.tsf.2008.08.116 .
Rakočević, Zlatko Lj., Štrbac, Svetlana, Behm, R.-J., "Interrupted-flux deposition: Ni on Ru(0001)" in Thin Solid Films, 517, no. 2 (2008):709-713,
https://doi.org/10.1016/j.tsf.2008.08.116 . .
