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dc.creatorPopov, Konstantin I.
dc.creatorMaksimović, Miodrag D.
dc.creatorSimičić, M.V.
dc.creatorKrstajić, Nedeljko V.
dc.date.accessioned2021-04-20T08:02:17Z
dc.date.available2021-04-20T08:02:17Z
dc.date.issued1984
dc.identifier.issn0376-4583
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/4470
dc.description.abstractIt is shown that spongy deposits are obtained under d.c. conditions and that compact deposits are obtained in pulsating current (PC) deposition with high pause-to-pulse ratios at the same average current density and deposition time. This is explained by an increased nucleation rate in PC deposition.sr
dc.language.isoensr
dc.publisherElseviersr
dc.relationThe Research Fund of SR Serbia, Yugoslaviasr
dc.rightsrestrictedAccesssr
dc.sourceSurface Technologysr
dc.subjectElectrodepositionsr
dc.subjectzinc platingsr
dc.subjectElectrochemistrysr
dc.subjectnucleation ratesr
dc.titleFundamental aspects of pulsating current metal electrodeposition IX: The prevention of spongy deposit formation on inert substratessr
dc.typearticlesr
dc.rights.licenseARRsr
dcterms.abstractКрстајић, Недељко В.; Симичић, М.В.; Максимовић, Миодраг Д.; Попов, Константин И.;
dc.citation.volume22
dc.citation.issue2
dc.citation.spage159
dc.citation.epage164
dc.identifier.doi10.1016/0376-4583(84)90052-9
dc.identifier.scopus2-s2.0-0021442257
dc.type.versionpublishedVersionsr


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