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Surface resistivity estimation by scanning surface potential microscopy

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2008
rakocevic2008.pdf (204.0Kb)
Authors
Rakočević, Zlatko Lj.
Popović, N.
Bogdanov, Žarko D.
Goncic, B.
Štrbac, Svetlana
Article (Published version)
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Abstract
Nickel was sputter deposited on a glass with a thin film thickness of 600 nm under either in an argon atmosphere or under a partial pressure of nitrogen of either 1.3× 10-4 or 4× 10-4 mbar. Atomic force microscopy and scanning surface potential microscopy (SSPM) were used to study the morphology and to estimate the surface resistivity of the obtained Ni thin films taking into account surface-roughness effects. For the three samples investigated, the surface resistivity values as estimated using SSPM were in good agreement with the results obtained by standard four-point probe measurements.
Source:
Review of Scientific Instruments, 2008, 79, 6
Projects:
  • Dobijanje i karakterizacija površina nanostrukturnih materijala (RS-141001)

DOI: 10.1063/1.2937647

ISSN: 0034-6748

WoS: 000257283700048

Scopus: 2-s2.0-46449112477
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URI
http://cer.ihtm.bg.ac.rs/handle/123456789/447
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