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Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH

Kontrolisan raspored integrisanih prepreka u silicijumskim mikrokanalima nagrizanim u 25 mas.% rastvoru tetrametilamonijum hidroksida

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Authors
Smiljanić, Milče M.
Radjenović, Branislav
Lazić, Žarko
Radmilović Radjenović, Marija
Rašljić Rafajilović, Milena
Cvetanović Zobenica, Katarina
Milinković, Evgenija
Filipović, Ana
Article (Published version)
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Abstract
In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80 C is presented and analysed. We studied basic island patterns, which present union of two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45o. We have derived analytical relations for determining dimensions of the integrated obstacles. The developed etching technique provides reduction of the distance between the obstacles. Before the experiments, we performed simulations of pattern etching based on the level set method and presented evolution of the etched basic patterns for the predetermined crystallographic directions <n10>. Combination of basic patterns with sides along the <610> and <100> crystallographic directions ...is used to fabricate a matrix of two row of silicon obstacles in a microchannel. We obtained a good agreement between the experimental results and simulations. Our results enable simple and cost-effective fabrication of various complex microfluidic silicon platforms with integrated obstacles.

U ovom radu je prezentovana i analizirana izrada silicijumskih mikrokanala sa integrisanim preprekama u vodenom rastvoru 25 mas.% tetrametilamonijum hidroksida (TMAH) na temperaturi od 80 oC. Proučavani su osnovni oblici maski koji predstavljaju uniju dva simetrična ostrva u obliku paralelograma čije su stranice duž unapred određenih kristalografskih pravaca (2<n<8) i <100>. Oštri uglovi paralelograma su manji od 45˚. Izvedene su formule za izračunavanje dimenzija integrisanih prepreka. Razvijena je tehnika nagrizanja koja smanjuje rastojanje između prepreka. Pre eksperimenata izvršene su simulacije osnovnih oblika koje se baziraju na metodi implicitno definisanih nivoa (engl. level set method). Prezentovan je razvoj nagrizanih osnovnih oblika maski za unapred određene kristalografske pravce <n10>. Kombinacija osnovnih oblika maski čije su stranice duž kristalografskih pravaca <610> i <100> je iskorišćena za izradu dva reda matrice silicijumskih prepreka u mikrokanalu. Dobijeno je dobr...o slaganje između eksperimenata i simulacija. Dobijeni rezultati omogućavaju jednostavnu i jeftinu izradu različitih kompleksnih mikrofluidnih silicijumskih platformi sa integrisanim preprekama.

Keywords:
wet etching / level set method simulation / 3D silicon structures / microfludic platform / vlažno hemijsko nagrizanje / simulacija na bazi implicitno definisanih nivoa / 3D silicijumske strukture / mikrofluidna platforma
Source:
Hemijska industrija, 2021, 75, 1, 15-24
Publisher:
  • Association of Chemical Engeneers of Serbia
Funding / projects:
  • Ministry of Education, Science and Technological Development, Republic of Serbia, Grant no. 200026 (University of Belgrade, Institute of Chemistry, Technology and Metallurgy - IChTM) (RS-200026)

DOI: 10.2298/HEMIND200807005S

ISSN: 0367-598X; 2217-7426

WoS: 000625283300002

Scopus: 2-s2.0-85102707994
[ Google Scholar ]
URI
https://cer.ihtm.bg.ac.rs/handle/123456789/4453
Collections
  • Radovi istraživača / Researchers' publications
Institution/Community
IHTM
TY  - JOUR
AU  - Smiljanić, Milče M.
AU  - Radjenović, Branislav
AU  - Lazić, Žarko
AU  - Radmilović Radjenović, Marija
AU  - Rašljić Rafajilović, Milena
AU  - Cvetanović Zobenica, Katarina
AU  - Milinković, Evgenija
AU  - Filipović, Ana
PY  - 2021
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4453
AB  - In  this  paper,  fabrication  of  silicon  microchannels  with  integrated  obstacles  by  using  25 wt.% tetramethylammonium  hydroxide  (TMAH)  aqueous  solution  at  the  temperature  of  80 C  is presented  and  analysed.  We  studied  basic  island  patterns,  which present  union  of  two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45o. We have derived analytical  relations  for  determining  dimensions  of  the  integrated  obstacles.  The  developed etching  technique  provides  reduction  of  the  distance  between  the  obstacles.  Before  the experiments, we performed simulations of pattern etching based on the level set method and presented  evolution  of  the  etched basic  patterns  for  the  predetermined  crystallographic directions  <n10>.  Combination  of  basic  patterns  with  sides  along  the  <610>  and  <100> crystallographic  directions  is  used  to  fabricate  a  matrix  of  two  row  of  silicon  obstacles  in  a microchannel.   We   obtained   a   good   agreement   between   the   experimental   results   and simulations.   Our   results   enable   simple  and   cost-effective  fabrication   of  various   complex microfluidic silicon platforms with integrated obstacles.
AB  - U ovom radu je prezentovana i analizirana izrada silicijumskih mikrokanala sa integrisanim preprekama u vodenom rastvoru 25 mas.% tetrametilamonijum hidroksida (TMAH) na temperaturi od 80 oC. Proučavani su osnovni oblici maski koji predstavljaju uniju dva simetrična ostrva u obliku paralelograma čije su stranice duž unapred određenih kristalografskih pravaca (2<n<8) i <100>. Oštri uglovi paralelograma su manji od 45˚. Izvedene su formule za izračunavanje dimenzija integrisanih prepreka. Razvijena je tehnika nagrizanja koja smanjuje rastojanje između prepreka. Pre eksperimenata izvršene su simulacije osnovnih oblika koje se baziraju na metodi implicitno definisanih nivoa (engl. level set method). Prezentovan je razvoj nagrizanih osnovnih oblika maski za unapred određene kristalografske pravce <n10>. Kombinacija osnovnih oblika maski čije su stranice duž kristalografskih pravaca <610> i <100> je iskorišćena za izradu dva reda matrice silicijumskih prepreka u mikrokanalu. Dobijeno je dobro slaganje između eksperimenata i simulacija. Dobijeni rezultati omogućavaju jednostavnu i jeftinu izradu različitih kompleksnih mikrofluidnih silicijumskih platformi sa integrisanim preprekama.
PB  - Association of Chemical Engeneers of Serbia
T2  - Hemijska industrija
T1  - Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH
T1  - Kontrolisan raspored integrisanih prepreka u silicijumskim mikrokanalima nagrizanim u 25 mas.% rastvoru tetrametilamonijum hidroksida
VL  - 75
IS  - 1
SP  - 15
EP  - 24
DO  - 10.2298/HEMIND200807005S
ER  - 
@article{
author = "Smiljanić, Milče M. and Radjenović, Branislav and Lazić, Žarko and Radmilović Radjenović, Marija and Rašljić Rafajilović, Milena and Cvetanović Zobenica, Katarina and Milinković, Evgenija and Filipović, Ana",
year = "2021",
abstract = "In  this  paper,  fabrication  of  silicon  microchannels  with  integrated  obstacles  by  using  25 wt.% tetramethylammonium  hydroxide  (TMAH)  aqueous  solution  at  the  temperature  of  80 C  is presented  and  analysed.  We  studied  basic  island  patterns,  which present  union  of  two symmetrical parallelograms with the sides along predetermined crystallographic directions <n10> (2<n<8) and <100>. Acute angles of the parallelograms were smaller than 45o. We have derived analytical  relations  for  determining  dimensions  of  the  integrated  obstacles.  The  developed etching  technique  provides  reduction  of  the  distance  between  the  obstacles.  Before  the experiments, we performed simulations of pattern etching based on the level set method and presented  evolution  of  the  etched basic  patterns  for  the  predetermined  crystallographic directions  <n10>.  Combination  of  basic  patterns  with  sides  along  the  <610>  and  <100> crystallographic  directions  is  used  to  fabricate  a  matrix  of  two  row  of  silicon  obstacles  in  a microchannel.   We   obtained   a   good   agreement   between   the   experimental   results   and simulations.   Our   results   enable   simple  and   cost-effective  fabrication   of  various   complex microfluidic silicon platforms with integrated obstacles., U ovom radu je prezentovana i analizirana izrada silicijumskih mikrokanala sa integrisanim preprekama u vodenom rastvoru 25 mas.% tetrametilamonijum hidroksida (TMAH) na temperaturi od 80 oC. Proučavani su osnovni oblici maski koji predstavljaju uniju dva simetrična ostrva u obliku paralelograma čije su stranice duž unapred određenih kristalografskih pravaca (2<n<8) i <100>. Oštri uglovi paralelograma su manji od 45˚. Izvedene su formule za izračunavanje dimenzija integrisanih prepreka. Razvijena je tehnika nagrizanja koja smanjuje rastojanje između prepreka. Pre eksperimenata izvršene su simulacije osnovnih oblika koje se baziraju na metodi implicitno definisanih nivoa (engl. level set method). Prezentovan je razvoj nagrizanih osnovnih oblika maski za unapred određene kristalografske pravce <n10>. Kombinacija osnovnih oblika maski čije su stranice duž kristalografskih pravaca <610> i <100> je iskorišćena za izradu dva reda matrice silicijumskih prepreka u mikrokanalu. Dobijeno je dobro slaganje između eksperimenata i simulacija. Dobijeni rezultati omogućavaju jednostavnu i jeftinu izradu različitih kompleksnih mikrofluidnih silicijumskih platformi sa integrisanim preprekama.",
publisher = "Association of Chemical Engeneers of Serbia",
journal = "Hemijska industrija",
title = "Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH, Kontrolisan raspored integrisanih prepreka u silicijumskim mikrokanalima nagrizanim u 25 mas.% rastvoru tetrametilamonijum hidroksida",
volume = "75",
number = "1",
pages = "15-24",
doi = "10.2298/HEMIND200807005S"
}
Smiljanić, M. M., Radjenović, B., Lazić, Ž., Radmilović Radjenović, M., Rašljić Rafajilović, M., Cvetanović Zobenica, K., Milinković, E.,& Filipović, A.. (2021). Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH. in Hemijska industrija
Association of Chemical Engeneers of Serbia., 75(1), 15-24.
https://doi.org/10.2298/HEMIND200807005S
Smiljanić MM, Radjenović B, Lazić Ž, Radmilović Radjenović M, Rašljić Rafajilović M, Cvetanović Zobenica K, Milinković E, Filipović A. Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH. in Hemijska industrija. 2021;75(1):15-24.
doi:10.2298/HEMIND200807005S .
Smiljanić, Milče M., Radjenović, Branislav, Lazić, Žarko, Radmilović Radjenović, Marija, Rašljić Rafajilović, Milena, Cvetanović Zobenica, Katarina, Milinković, Evgenija, Filipović, Ana, "Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH" in Hemijska industrija, 75, no. 1 (2021):15-24,
https://doi.org/10.2298/HEMIND200807005S . .

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