Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry
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We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm.
Keywords:
silicon / fiber optic sensors / microelectronics / Interferometry / Micro Electronic and Mechanical SystemsSource:
Micro Electronic and Mechanical Systems, 2008, 51-60Publisher:
- IntechOpen
Funding / projects:
- The Austrian Science Fund (FWF) - the Project L139-N02 “Nanoscale measurement of physical parameters”
- The Integrated Microsystems Austria, IMA GmbH
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IHTMTY - CHAP AU - Đinović, Zoran AU - Tomić, Miloš AU - Manojlović, Lazo AU - Lazić, Žarko AU - Smiljanić, Milče M. PY - 2008 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4442 AB - We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm. PB - IntechOpen T2 - Micro Electronic and Mechanical Systems T1 - Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry SP - 51 EP - 60 DO - 10.5772/7003 ER -
@inbook{ author = "Đinović, Zoran and Tomić, Miloš and Manojlović, Lazo and Lazić, Žarko and Smiljanić, Milče M.", year = "2008", abstract = "We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm.", publisher = "IntechOpen", journal = "Micro Electronic and Mechanical Systems", booktitle = "Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry", pages = "51-60", doi = "10.5772/7003" }
Đinović, Z., Tomić, M., Manojlović, L., Lazić, Ž.,& Smiljanić, M. M.. (2008). Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry. in Micro Electronic and Mechanical Systems IntechOpen., 51-60. https://doi.org/10.5772/7003
Đinović Z, Tomić M, Manojlović L, Lazić Ž, Smiljanić MM. Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry. in Micro Electronic and Mechanical Systems. 2008;:51-60. doi:10.5772/7003 .
Đinović, Zoran, Tomić, Miloš, Manojlović, Lazo, Lazić, Žarko, Smiljanić, Milče M., "Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry" in Micro Electronic and Mechanical Systems (2008):51-60, https://doi.org/10.5772/7003 . .