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Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry

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2008
osnovni rad (689.0Kb)
Authors
Đinović, Zoran
Tomić, Miloš
Manojlović, Lazo
Lazić, Žarko
Smiljanić, Milče M.
Book part (Published version)
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Abstract
We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm.
Keywords:
silicon / fiber optic sensors / microelectronics / Interferometry / Micro Electronic and Mechanical Systems
Source:
Micro Electronic and Mechanical Systems, 2008, 51-60
Publisher:
  • IntechOpen
Funding / projects:
  • The Austrian Science Fund (FWF) - the Project L139-N02 “Nanoscale measurement of physical parameters”
  • The Integrated Microsystems Austria, IMA GmbH

DOI: 10.5772/7003

ISBN: 978-953-307-027-8

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URI
https://cer.ihtm.bg.ac.rs/handle/123456789/4442
Collections
  • Radovi istraživača / Researchers' publications
Institution/Community
IHTM
TY  - CHAP
AU  - Đinović, Zoran
AU  - Tomić, Miloš
AU  - Manojlović, Lazo
AU  - Lazić, Žarko
AU  - Smiljanić, Milče M.
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/4442
AB  - We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm.
PB  - IntechOpen
T2  - Micro Electronic and Mechanical Systems
T1  - Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry
SP  - 51
EP  - 60
DO  - 10.5772/7003
ER  - 
@inbook{
author = "Đinović, Zoran and Tomić, Miloš and Manojlović, Lazo and Lazić, Žarko and Smiljanić, Milče M.",
year = "2008",
abstract = "We presented here one contact-less optical technique based on low-coherence interferometry for measurement of thickness and uniformity of Si membranes. We performed a single-mode fiber-optic sensing configuration that is also applicable for the in situ measurement of membrane thickness. Space resolution was defined by diameter of spot of the impinging light of about 20 µm. The accuracy of the technique is about 100 nm.",
publisher = "IntechOpen",
journal = "Micro Electronic and Mechanical Systems",
booktitle = "Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry",
pages = "51-60",
doi = "10.5772/7003"
}
Đinović, Z., Tomić, M., Manojlović, L., Lazić, Ž.,& Smiljanić, M. M.. (2008). Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry. in Micro Electronic and Mechanical Systems
IntechOpen., 51-60.
https://doi.org/10.5772/7003
Đinović Z, Tomić M, Manojlović L, Lazić Ž, Smiljanić MM. Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry. in Micro Electronic and Mechanical Systems. 2008;:51-60.
doi:10.5772/7003 .
Đinović, Zoran, Tomić, Miloš, Manojlović, Lazo, Lazić, Žarko, Smiljanić, Milče M., "Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry" in Micro Electronic and Mechanical Systems (2008):51-60,
https://doi.org/10.5772/7003 . .

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