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Fundamental aspects of plating technology I: The determination of the optimum deposition current density
dc.creator | Popov, Konstantin I. | |
dc.creator | Krstajić, Nedeljko V. | |
dc.creator | Popov, Svetlana R. | |
dc.date.accessioned | 2021-04-05T09:01:57Z | |
dc.date.available | 2021-04-05T09:01:57Z | |
dc.date.issued | 1983 | |
dc.identifier.issn | 0376-4583 | |
dc.identifier.uri | https://cer.ihtm.bg.ac.rs/handle/123456789/4417 | |
dc.description.abstract | It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process. | sr |
dc.language.iso | en | sr |
dc.publisher | Elsevier | sr |
dc.rights | restrictedAccess | sr |
dc.source | Surface Technology | sr |
dc.subject | electroplating | sr |
dc.subject | plating technology | sr |
dc.subject | polycrystalline metal deposits | sr |
dc.subject | electrode | sr |
dc.subject | Polarization Curve | sr |
dc.title | Fundamental aspects of plating technology I: The determination of the optimum deposition current density | sr |
dc.type | article | sr |
dc.rights.license | ARR | sr |
dcterms.abstract | Попов, Константин; Крстајић, Недељко В.; Попов, Светлана Р.; | |
dc.citation.volume | 20 | |
dc.citation.issue | 3 | |
dc.citation.spage | 199 | |
dc.citation.epage | 202 | |
dc.identifier.doi | 10.1016/0376-4583(83)90003-1 | |
dc.identifier.scopus | 2-s2.0-0020849191 | |
dc.type.version | publishedVersion | sr |