Fundamental aspects of plating technology I: The determination of the optimum deposition current density
Samo za registrovane korisnike
1983
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process.
Ključne reči:
electroplating / plating technology / polycrystalline metal deposits / electrode / Polarization CurveIzvor:
Surface Technology, 1983, 20, 3, 199-202Izdavač:
- Elsevier
Institucija/grupa
IHTMTY - JOUR AU - Popov, Konstantin I. AU - Krstajić, Nedeljko V. AU - Popov, Svetlana R. PY - 1983 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4417 AB - It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process. PB - Elsevier T2 - Surface Technology T1 - Fundamental aspects of plating technology I: The determination of the optimum deposition current density VL - 20 IS - 3 SP - 199 EP - 202 DO - 10.1016/0376-4583(83)90003-1 ER -
@article{ author = "Popov, Konstantin I. and Krstajić, Nedeljko V. and Popov, Svetlana R.", year = "1983", abstract = "It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process.", publisher = "Elsevier", journal = "Surface Technology", title = "Fundamental aspects of plating technology I: The determination of the optimum deposition current density", volume = "20", number = "3", pages = "199-202", doi = "10.1016/0376-4583(83)90003-1" }
Popov, K. I., Krstajić, N. V.,& Popov, S. R.. (1983). Fundamental aspects of plating technology I: The determination of the optimum deposition current density. in Surface Technology Elsevier., 20(3), 199-202. https://doi.org/10.1016/0376-4583(83)90003-1
Popov KI, Krstajić NV, Popov SR. Fundamental aspects of plating technology I: The determination of the optimum deposition current density. in Surface Technology. 1983;20(3):199-202. doi:10.1016/0376-4583(83)90003-1 .
Popov, Konstantin I., Krstajić, Nedeljko V., Popov, Svetlana R., "Fundamental aspects of plating technology I: The determination of the optimum deposition current density" in Surface Technology, 20, no. 3 (1983):199-202, https://doi.org/10.1016/0376-4583(83)90003-1 . .