An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed.
TY - JOUR
AU - Rakočević, Zlatko Lj.
AU - Štrbac, Svetlana
AU - Bibić, Nataša M.
AU - Nenadović, Tomislav M.
PY - 1995
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4346
AB - An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed.
PB - Elsevier
T2 - Surface Science
T1 - Surface diffusion of clusters and thin film growth
VL - 343
IS - 3
SP - 247
EP - 260
DO - 10.1016/0039-6028(95)00816-0
ER -
@article{
author = "Rakočević, Zlatko Lj. and Štrbac, Svetlana and Bibić, Nataša M. and Nenadović, Tomislav M.",
year = "1995",
url = "https://cer.ihtm.bg.ac.rs/handle/123456789/4346",
abstract = "An analogy between the behavior of real gases and the behavior of clusters deposited on a surface has been established. A relation similar to the Van der Waals equation was used, with the variables corresponding to the deposition process. It was found that the critical parameters and the Boyle temperature of the substrate define the conditions of a particular nucleation and of the thin film growth mode and the conditions when one growth mode converts to the other. It has been shown that the introduced analogy is in a good agreement with the recent experiments of nucleation and growth of thin films. The applicability of the proposed analogy to the epitaxial growth and surface sputtering has been discussed.",
publisher = "Elsevier",
journal = "Surface Science",
title = "Surface diffusion of clusters and thin film growth",
volume = "343",
number = "3",
pages = "247-260",
doi = "10.1016/0039-6028(95)00816-0"
}
Rakočević, Z. Lj., Štrbac, S., Bibić, N. M.,& Nenadović, T. M. (1995). Surface diffusion of clusters and thin film growth.
Surface Science
Elsevier., 343(3), 247-260.
https://doi.org/10.1016/0039-6028(95)00816-0
Rakočević ZL, Štrbac S, Bibić NM, Nenadović TM. Surface diffusion of clusters and thin film growth. Surface Science. 1995;343(3):247-260
Rakočević Zlatko Lj., Štrbac Svetlana, Bibić Nataša M., Nenadović Tomislav M., "Surface diffusion of clusters and thin film growth" Surface Science, 343, no. 3 (1995):247-260,
https://doi.org/10.1016/0039-6028(95)00816-0 .
