Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
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2008
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Metapodaci
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Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Izvor:
26th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 2008, 355-358Izdavač:
- Institute of Electrical and Electronics Engineers Inc.
DOI: 10.1109/ICMEL.2008.4559295
ISSN: 2159-1660
WoS: 000257432600073
Scopus: 2-s2.0-51749098774
Institucija/grupa
IHTMTY - CONF AU - Jović, Vesna AU - Lamovec, Jelena AU - Popović, Mirjana PY - 2008 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/423 AB - Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions. PB - Institute of Electrical and Electronics Engineers Inc. C3 - 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings T1 - Investigation of silicon anisotropic etching in alkaline solutions with propanol addition SP - 355 EP - 358 DO - 10.1109/ICMEL.2008.4559295 ER -
@conference{ author = "Jović, Vesna and Lamovec, Jelena and Popović, Mirjana", year = "2008", abstract = "Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.", publisher = "Institute of Electrical and Electronics Engineers Inc.", journal = "26th International Conference on Microelectronics, Vols 1 and 2, Proceedings", title = "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition", pages = "355-358", doi = "10.1109/ICMEL.2008.4559295" }
Jović, V., Lamovec, J.,& Popović, M.. (2008). Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings Institute of Electrical and Electronics Engineers Inc.., 355-358. https://doi.org/10.1109/ICMEL.2008.4559295
Jović V, Lamovec J, Popović M. Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings. 2008;:355-358. doi:10.1109/ICMEL.2008.4559295 .
Jović, Vesna, Lamovec, Jelena, Popović, Mirjana, "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition" in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings (2008):355-358, https://doi.org/10.1109/ICMEL.2008.4559295 . .