Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
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Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Source:26th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 2008, 355-358
- Institute of Electrical and Electronics Engineers Inc.