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Investigation of silicon anisotropic etching in alkaline solutions with propanol addition

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2008
Authors
Jović, Vesna
Lamovec, Jelena
Popović, Mirjana
Conference object (Published version)
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Abstract
Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Source:
26th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 2008, 355-358
Publisher:
  • Institute of Electrical and Electronics Engineers Inc.

DOI: 10.1109/ICMEL.2008.4559295

ISSN: 2159-1660

WoS: 000257432600073

Scopus: 2-s2.0-51749098774
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5
1
URI
https://cer.ihtm.bg.ac.rs/handle/123456789/423
Collections
  • Radovi istraživača / Researchers' publications
Institution/Community
IHTM
TY  - CONF
AU  - Jović, Vesna
AU  - Lamovec, Jelena
AU  - Popović, Mirjana
PY  - 2008
UR  - https://cer.ihtm.bg.ac.rs/handle/123456789/423
AB  - Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si  LT  100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
PB  - Institute of Electrical and Electronics Engineers Inc.
C3  - 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings
T1  - Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
SP  - 355
EP  - 358
DO  - 10.1109/ICMEL.2008.4559295
ER  - 
@conference{
author = "Jović, Vesna and Lamovec, Jelena and Popović, Mirjana",
year = "2008",
abstract = "Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si  LT  100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "26th International Conference on Microelectronics, Vols 1 and 2, Proceedings",
title = "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition",
pages = "355-358",
doi = "10.1109/ICMEL.2008.4559295"
}
Jović, V., Lamovec, J.,& Popović, M.. (2008). Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings
Institute of Electrical and Electronics Engineers Inc.., 355-358.
https://doi.org/10.1109/ICMEL.2008.4559295
Jović V, Lamovec J, Popović M. Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings. 2008;:355-358.
doi:10.1109/ICMEL.2008.4559295 .
Jović, Vesna, Lamovec, Jelena, Popović, Mirjana, "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition" in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings (2008):355-358,
https://doi.org/10.1109/ICMEL.2008.4559295 . .

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