Investigation of silicon anisotropic etching in alkaline solutions with propanol addition

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2008
Authors
Jović, Vesna
Lamovec, Jelena
Popović, Mina
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Abstract
Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Source:
26th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 2008, 355-358
Publisher:
  • Institute of Electrical and Electronics Engineers Inc.

DOI: 10.1109/ICMEL.2008.4559295

ISSN: 2159-1660

WoS: 000257432600073

Scopus: 2-s2.0-51749098774
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http://cer.ihtm.bg.ac.rs/handle/123456789/423
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