Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
Source:
26th International Conference on Microelectronics, Vols 1 and 2, Proceedings, 2008, 355-358
Publisher:
Institute of Electrical and Electronics Engineers Inc.
TY - CONF
AU - Jović, Vesna
AU - Lamovec, Jelena
AU - Popović, Mirjana
PY - 2008
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/423
AB - Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.
PB - Institute of Electrical and Electronics Engineers Inc.
C3 - 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings
T1 - Investigation of silicon anisotropic etching in alkaline solutions with propanol addition
SP - 355
EP - 358
DO - 10.1109/ICMEL.2008.4559295
ER -
@conference{
author = "Jović, Vesna and Lamovec, Jelena and Popović, Mirjana",
year = "2008",
abstract = "Different propanol isomers additives to 26 wt. % KOH water solution have been studied. It was stated that addition of both isomers result in changing etching anisotropy of (110) oriented corners on Si LT 100 >. For the same etching depth, IPA addition causes higher corner undercutting than 1-propanol addition. Surface topography is better in IPA containing solutions.",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
journal = "26th International Conference on Microelectronics, Vols 1 and 2, Proceedings",
title = "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition",
pages = "355-358",
doi = "10.1109/ICMEL.2008.4559295"
}
Jović, V., Lamovec, J.,& Popović, M.. (2008). Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings
Institute of Electrical and Electronics Engineers Inc.., 355-358.
https://doi.org/10.1109/ICMEL.2008.4559295
Jović V, Lamovec J, Popović M. Investigation of silicon anisotropic etching in alkaline solutions with propanol addition. in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings. 2008;:355-358.
doi:10.1109/ICMEL.2008.4559295 .
Jović, Vesna, Lamovec, Jelena, Popović, Mirjana, "Investigation of silicon anisotropic etching in alkaline solutions with propanol addition" in 26th International Conference on Microelectronics, Vols 1 and 2, Proceedings (2008):355-358,
https://doi.org/10.1109/ICMEL.2008.4559295 . .
