Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface
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1988
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Thin electrochemically grown oxide films on polycrystalline titanium substrates were examined by photoelectrochemical and electron diffraction techniques. Photoelectrochemical microscopy, based on illumination by a focused laser beam, was used to measure the local photoresponse of the oxide films. For oxide films grown slowly (1 nm/h)if, by ramping the electrode potential at 0.1 mV/s, the oxide photoresponse was found to map the grain structure of the underlying substrate. As the oxide growth rate was increased the photoresponse became more homogeneous and the average photocurrent decreased. The photoresponse heterogeneities were associated with variations in the structure of the oxide film. Electron diffraction studies showed that for slowly grown films, an ordered oxide structure was present with a preferential growth direction of [110] occurring on some substrate grains. As the oxide growth rate was increased the film structure became more homogeneous and the average oxide crystalli...ne size decreased. The decrease in oxide crystallinity with increase in oxide growth rate was also observed in photospectroscopy measurements as a loss of the 3.7 eV direct bandgap. For all oxide films studied here, rutile was the only identifiable phase.
Ključne reči:
oxide films / Photoelectrochemical microscopy / Electrochemistry / oxide growth / photoresponseIzvor:
Surface Science, 1988, 194, 3, 505-530Izdavač:
- Elsevier
Finansiranje / projekti:
- DOE, Agreement No. DOE/DE-FG02-84E~,45173
- Yugoslav-American Fund for Scientific Cooperation, DOE Grant No. 675.
Institucija/grupa
IHTMTY - JOUR AU - Kozlowski, Mark R. AU - Tyler, Paul S. AU - Smyrl, William H. AU - Atanasoski, Radoslav T. PY - 1988 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4217 AB - Thin electrochemically grown oxide films on polycrystalline titanium substrates were examined by photoelectrochemical and electron diffraction techniques. Photoelectrochemical microscopy, based on illumination by a focused laser beam, was used to measure the local photoresponse of the oxide films. For oxide films grown slowly (1 nm/h)if, by ramping the electrode potential at 0.1 mV/s, the oxide photoresponse was found to map the grain structure of the underlying substrate. As the oxide growth rate was increased the photoresponse became more homogeneous and the average photocurrent decreased. The photoresponse heterogeneities were associated with variations in the structure of the oxide film. Electron diffraction studies showed that for slowly grown films, an ordered oxide structure was present with a preferential growth direction of [110] occurring on some substrate grains. As the oxide growth rate was increased the film structure became more homogeneous and the average oxide crystalline size decreased. The decrease in oxide crystallinity with increase in oxide growth rate was also observed in photospectroscopy measurements as a loss of the 3.7 eV direct bandgap. For all oxide films studied here, rutile was the only identifiable phase. PB - Elsevier T2 - Surface Science T1 - Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface VL - 194 IS - 3 SP - 505 EP - 530 DO - 10.1016/0039-6028(88)90866-7 ER -
@article{ author = "Kozlowski, Mark R. and Tyler, Paul S. and Smyrl, William H. and Atanasoski, Radoslav T.", year = "1988", abstract = "Thin electrochemically grown oxide films on polycrystalline titanium substrates were examined by photoelectrochemical and electron diffraction techniques. Photoelectrochemical microscopy, based on illumination by a focused laser beam, was used to measure the local photoresponse of the oxide films. For oxide films grown slowly (1 nm/h)if, by ramping the electrode potential at 0.1 mV/s, the oxide photoresponse was found to map the grain structure of the underlying substrate. As the oxide growth rate was increased the photoresponse became more homogeneous and the average photocurrent decreased. The photoresponse heterogeneities were associated with variations in the structure of the oxide film. Electron diffraction studies showed that for slowly grown films, an ordered oxide structure was present with a preferential growth direction of [110] occurring on some substrate grains. As the oxide growth rate was increased the film structure became more homogeneous and the average oxide crystalline size decreased. The decrease in oxide crystallinity with increase in oxide growth rate was also observed in photospectroscopy measurements as a loss of the 3.7 eV direct bandgap. For all oxide films studied here, rutile was the only identifiable phase.", publisher = "Elsevier", journal = "Surface Science", title = "Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface", volume = "194", number = "3", pages = "505-530", doi = "10.1016/0039-6028(88)90866-7" }
Kozlowski, M. R., Tyler, P. S., Smyrl, W. H.,& Atanasoski, R. T.. (1988). Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface. in Surface Science Elsevier., 194(3), 505-530. https://doi.org/10.1016/0039-6028(88)90866-7
Kozlowski MR, Tyler PS, Smyrl WH, Atanasoski RT. Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface. in Surface Science. 1988;194(3):505-530. doi:10.1016/0039-6028(88)90866-7 .
Kozlowski, Mark R., Tyler, Paul S., Smyrl, William H., Atanasoski, Radoslav T., "Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interface" in Surface Science, 194, no. 3 (1988):505-530, https://doi.org/10.1016/0039-6028(88)90866-7 . .