Приказ основних података о документу

dc.creatorKozlowski, Mark R.
dc.creatorSmyrl, William H.
dc.creatorAtanasoska, Ljiljana L.
dc.creatorAtanasoski, Radoslav T.
dc.date.accessioned2021-02-04T14:58:28Z
dc.date.available2021-02-04T14:58:28Z
dc.date.issued1989
dc.identifier.issn0013-4686
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/4202
dc.description.abstractAuger depth profiling was used to determine the local film thickness of a thin anodic oxide grown on a polycrystalline Ti substrate. The oxide thickness was studied as a function of substrate crystallography and final growth voltage. These results were related to local photocurrent measurements obtained using photoelectrochemical microscopy. Variations in the film thickness are too small to account for the non-uniform photocurrent response. The non-uniform photoresponse is instead attributed to variations in the defect density of the oxidesr
dc.language.isoensr
dc.publisherElseviersr
dc.rightsrestrictedAccesssr
dc.sourceElectrochimica Actasr
dc.subjectlocal film thicknesssr
dc.subjectphotoresponsesr
dc.subjectpolycrystalline Ti substratesr
dc.subjectoxidesr
dc.subjectphotocurrent measurementssr
dc.titleLocal film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titaniumsr
dc.typearticlesr
dc.rights.licenseARRsr
dcterms.abstractСмyрл, Wиллиам Х.; Aтанасоски, Радослав Т.; Козлоwски, Марк Р.; Aтанасоска, Љиљана Л.;
dc.citation.volume34
dc.citation.issue12
dc.citation.spage1763
dc.citation.epage1768
dc.identifier.doi10.1016/0013-4686(89)85062-5
dc.identifier.scopus2-s2.0-0001108581
dc.type.versionpublishedVersionsr


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Приказ основних података о документу