Auger depth profiling was used to determine the local film thickness of a thin anodic oxide grown on a polycrystalline Ti substrate. The oxide thickness was studied as a function of substrate crystallography and final growth voltage. These results were related to local photocurrent measurements obtained using photoelectrochemical microscopy. Variations in the film thickness are too small to account for the non-uniform photocurrent response. The non-uniform photoresponse is instead attributed to variations in the defect density of the oxide
Keywords:
local film thickness / photoresponse / polycrystalline Ti substrate / oxide / photocurrent measurements
TY - JOUR
AU - Kozlowski, Mark R.
AU - Smyrl, William H.
AU - Atanasoska, Ljiljana L.
AU - Atanasoski, Radoslav T.
PY - 1989
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4202
AB - Auger depth profiling was used to determine the local film thickness of a thin anodic oxide grown on a polycrystalline Ti substrate. The oxide thickness was studied as a function of substrate crystallography and final growth voltage. These results were related to local photocurrent measurements obtained using photoelectrochemical microscopy. Variations in the film thickness are too small to account for the non-uniform photocurrent response. The non-uniform photoresponse is instead attributed to variations in the defect density of the oxide
PB - Elsevier
T2 - Electrochimica Acta
T1 - Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titanium
VL - 34
IS - 12
SP - 1763
EP - 1768
DO - 10.1016/0013-4686(89)85062-5
ER -
@article{
author = "Kozlowski, Mark R. and Smyrl, William H. and Atanasoska, Ljiljana L. and Atanasoski, Radoslav T.",
year = "1989",
abstract = "Auger depth profiling was used to determine the local film thickness of a thin anodic oxide grown on a polycrystalline Ti substrate. The oxide thickness was studied as a function of substrate crystallography and final growth voltage. These results were related to local photocurrent measurements obtained using photoelectrochemical microscopy. Variations in the film thickness are too small to account for the non-uniform photocurrent response. The non-uniform photoresponse is instead attributed to variations in the defect density of the oxide",
publisher = "Elsevier",
journal = "Electrochimica Acta",
title = "Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titanium",
volume = "34",
number = "12",
pages = "1763-1768",
doi = "10.1016/0013-4686(89)85062-5"
}
Kozlowski, M. R., Smyrl, W. H., Atanasoska, L. L.,& Atanasoski, R. T.. (1989). Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titanium. in Electrochimica Acta
Elsevier., 34(12), 1763-1768.
https://doi.org/10.1016/0013-4686(89)85062-5
Kozlowski MR, Smyrl WH, Atanasoska LL, Atanasoski RT. Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titanium. in Electrochimica Acta. 1989;34(12):1763-1768.
doi:10.1016/0013-4686(89)85062-5 .
Kozlowski, Mark R., Smyrl, William H., Atanasoska, Ljiljana L., Atanasoski, Radoslav T., "Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titanium" in Electrochimica Acta, 34, no. 12 (1989):1763-1768,
https://doi.org/10.1016/0013-4686(89)85062-5 . .
