Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires
Само за регистроване кориснике
2004
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also
show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role.
Кључне речи:
Eletrodeposition / Nickel / Copper / Nanocontacts / Magnetic fieldИзвор:
Journal of Magnetism and Magnetic Materials, 2004, 272-276, 3, 2436-Издавач:
- Elsevier
Финансирање / пројекти:
- Spanish DGICyT
Институција/група
IHTMTY - JOUR AU - Nikolić, Nebojša D. AU - Wang, Hai AU - Cheng, Hao AU - Guerrero, C.A. AU - Garcia, N. PY - 2004 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4132 AB - We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role. PB - Elsevier T2 - Journal of Magnetism and Magnetic Materials T1 - Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires VL - 272-276 VL - 2438 IS - 3 SP - 2436 DO - 10.1016/j.jmmm.2003.12.1203 ER -
@article{ author = "Nikolić, Nebojša D. and Wang, Hai and Cheng, Hao and Guerrero, C.A. and Garcia, N.", year = "2004", abstract = "We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role.", publisher = "Elsevier", journal = "Journal of Magnetism and Magnetic Materials", title = "Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires", volume = "272-276, 2438", number = "3", pages = "2436", doi = "10.1016/j.jmmm.2003.12.1203" }
Nikolić, N. D., Wang, H., Cheng, H., Guerrero, C.A.,& Garcia, N.. (2004). Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires. in Journal of Magnetism and Magnetic Materials Elsevier., 272-276(3), 2436. https://doi.org/10.1016/j.jmmm.2003.12.1203
Nikolić ND, Wang H, Cheng H, Guerrero C, Garcia N. Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires. in Journal of Magnetism and Magnetic Materials. 2004;272-276(3):2436. doi:10.1016/j.jmmm.2003.12.1203 .
Nikolić, Nebojša D., Wang, Hai, Cheng, Hao, Guerrero, C.A., Garcia, N., "Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires" in Journal of Magnetism and Magnetic Materials, 272-276, no. 3 (2004):2436, https://doi.org/10.1016/j.jmmm.2003.12.1203 . .