We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also
show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role.
Keywords:
Eletrodeposition / Nickel / Copper / Nanocontacts / Magnetic field
Source:
Journal of Magnetism and Magnetic Materials, 2004, 272-276, 3, 2436-
TY - JOUR
AU - Nikolić, Nebojša D.
AU - Wang, Hai
AU - Cheng, Hao
AU - Guerrero, C.A.
AU - Garcia, N.
PY - 2004
UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4132
AB - We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also
show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role.
PB - Elsevier
T2 - Journal of Magnetism and Magnetic Materials
T1 - Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires
VL - 272-276
VL - 2438
IS - 3
SP - 2436
DO - 10.1016/j.jmmm.2003.12.1203
ER -
@article{
author = "Nikolić, Nebojša D. and Wang, Hai and Cheng, Hao and Guerrero, C.A. and Garcia, N.",
year = "2004",
url = "https://cer.ihtm.bg.ac.rs/handle/123456789/4132",
abstract = "We present a study of electrodeposition of Ni nanocontacts in thin film and microwires gaps under an external applied magnetic field. The study is performed in comparison with electrodeposition of Cu that is not a magnetic material and therefore one can obtain conclusion from the electrodeposited structures on the effect of the magnetic field on the magnetic properties of the deposition. We show that indeed there is a magnetohydrodynamic effect. But we also
show, what is more important, that the magnetic properties of the deposit are crucial for the deposited structure. In particular, for this case, the magnetoresistance plays a dominant role.",
publisher = "Elsevier",
journal = "Journal of Magnetism and Magnetic Materials",
title = "Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires",
volume = "272-276, 2438",
number = "3",
pages = "2436",
doi = "10.1016/j.jmmm.2003.12.1203"
}
Nikolić, N. D., Wang, H., Cheng, H., Guerrero, C.A.,& Garcia, N. (2004). Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires.
Journal of Magnetism and Magnetic Materials
Elsevier., 2438(3), 2436.
https://doi.org/10.1016/j.jmmm.2003.12.1203
Nikolić ND, Wang H, Cheng H, Guerrero C, Garcia N. Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires. Journal of Magnetism and Magnetic Materials. 2004;2438(3):2436
Nikolić Nebojša D., Wang Hai, Cheng Hao, Guerrero C.A., Garcia N., "Influence of the magnetic field and magnetoresistance on the electrodeposition of Ni nanocontacts in thin films and microwires" Journal of Magnetism and Magnetic Materials, 2438, no. 3 (2004):2436,
https://doi.org/10.1016/j.jmmm.2003.12.1203 .
