Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps
Само за регистроване кориснике
2004
Чланак у часопису (Објављена верзија)
Метаподаци
Приказ свих података о документуАпстракт
In this paper, we review the recent advances and progress in ballistic magnetoresistance (BMR) in magnetic nanocontacts electrodeposited in thin films and micrometer gaps. We report the influence of magnetostriction in the measurements under different configurations and substrates, as well as the contribution of the magnetic material forming the contacts. To avoid the magnetostriction effect, we have fabricated magnetic nanocontacts in Cu wires and Cu films. Similar BMR results can be observed in these systems. Our results showthat the BMR effect should depend on the microproperties of the nanocontacts and should not be related with the macroproperties of the electrodes. The magnetostriction results, measured by an atomic force microscopy system with a built-in electromagnet, clearly show that there is no direct relationship between the displacement (caused by the magnetostriction effect) and the value of BMR. In fact, we present large magnetoresistance values for permalloy, coinciding... with displacements in the latter’s structure less than 1 nm, which is the smallest clearly observable shift allowed by our atomic force microscope.
Repetitions of hundreds of RðHÞ curves are presented for different materials with different coercive fields. The interpretation of the results is based on the formation of an interfacial transparent layer (non-stoichiometric oxide, sulfur, etc.) at the nanocontact where the theory can explain large magnetoresistance values.
Кључне речи:
Electrochemical deposition; Ferromagnetic nanocontacts; Magnetoresistance; Magnetostriction / Electrochemical deposition / Ferromagnetic nanocontacts / Magnetoresistance / MagnetostrictionИзвор:
Journal of Magnetism and Magnetic Materials, 2004, 272-276, 3, 1722-1729Издавач:
- Elsevier
Финансирање / пројекти:
- Spanish DGICyT
Институција/група
IHTMTY - JOUR AU - Garcia, N. AU - Cheng, Hao AU - Wang, Hai AU - Nikolić, Nebojša D. AU - Guerrero, C.A. AU - Papageorgopoulos, A.C. PY - 2004 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/4129 AB - In this paper, we review the recent advances and progress in ballistic magnetoresistance (BMR) in magnetic nanocontacts electrodeposited in thin films and micrometer gaps. We report the influence of magnetostriction in the measurements under different configurations and substrates, as well as the contribution of the magnetic material forming the contacts. To avoid the magnetostriction effect, we have fabricated magnetic nanocontacts in Cu wires and Cu films. Similar BMR results can be observed in these systems. Our results showthat the BMR effect should depend on the microproperties of the nanocontacts and should not be related with the macroproperties of the electrodes. The magnetostriction results, measured by an atomic force microscopy system with a built-in electromagnet, clearly show that there is no direct relationship between the displacement (caused by the magnetostriction effect) and the value of BMR. In fact, we present large magnetoresistance values for permalloy, coinciding with displacements in the latter’s structure less than 1 nm, which is the smallest clearly observable shift allowed by our atomic force microscope. Repetitions of hundreds of RðHÞ curves are presented for different materials with different coercive fields. The interpretation of the results is based on the formation of an interfacial transparent layer (non-stoichiometric oxide, sulfur, etc.) at the nanocontact where the theory can explain large magnetoresistance values. PB - Elsevier T2 - Journal of Magnetism and Magnetic Materials T1 - Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps VL - 272-276 IS - 3 SP - 1722 EP - 1729 DO - 10.1016/j.jmmm.2003.12.290 ER -
@article{ author = "Garcia, N. and Cheng, Hao and Wang, Hai and Nikolić, Nebojša D. and Guerrero, C.A. and Papageorgopoulos, A.C.", year = "2004", abstract = "In this paper, we review the recent advances and progress in ballistic magnetoresistance (BMR) in magnetic nanocontacts electrodeposited in thin films and micrometer gaps. We report the influence of magnetostriction in the measurements under different configurations and substrates, as well as the contribution of the magnetic material forming the contacts. To avoid the magnetostriction effect, we have fabricated magnetic nanocontacts in Cu wires and Cu films. Similar BMR results can be observed in these systems. Our results showthat the BMR effect should depend on the microproperties of the nanocontacts and should not be related with the macroproperties of the electrodes. The magnetostriction results, measured by an atomic force microscopy system with a built-in electromagnet, clearly show that there is no direct relationship between the displacement (caused by the magnetostriction effect) and the value of BMR. In fact, we present large magnetoresistance values for permalloy, coinciding with displacements in the latter’s structure less than 1 nm, which is the smallest clearly observable shift allowed by our atomic force microscope. Repetitions of hundreds of RðHÞ curves are presented for different materials with different coercive fields. The interpretation of the results is based on the formation of an interfacial transparent layer (non-stoichiometric oxide, sulfur, etc.) at the nanocontact where the theory can explain large magnetoresistance values.", publisher = "Elsevier", journal = "Journal of Magnetism and Magnetic Materials", title = "Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps", volume = "272-276", number = "3", pages = "1722-1729", doi = "10.1016/j.jmmm.2003.12.290" }
Garcia, N., Cheng, H., Wang, H., Nikolić, N. D., Guerrero, C.A.,& Papageorgopoulos, A.C.. (2004). Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps. in Journal of Magnetism and Magnetic Materials Elsevier., 272-276(3), 1722-1729. https://doi.org/10.1016/j.jmmm.2003.12.290
Garcia N, Cheng H, Wang H, Nikolić ND, Guerrero C, Papageorgopoulos A. Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps. in Journal of Magnetism and Magnetic Materials. 2004;272-276(3):1722-1729. doi:10.1016/j.jmmm.2003.12.290 .
Garcia, N., Cheng, Hao, Wang, Hai, Nikolić, Nebojša D., Guerrero, C.A., Papageorgopoulos, A.C., "Ballistic magnetoresistance of electrodeposited nanocontacts in thin film and micrometer wire gaps" in Journal of Magnetism and Magnetic Materials, 272-276, no. 3 (2004):1722-1729, https://doi.org/10.1016/j.jmmm.2003.12.290 . .