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Static characteristics of the metal-insulator-semiconductor- insulator-metal (MISIM) structure—II. Low frequency capacitance

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1975
Authors
Đurić, Zoran G.
Smiljanić, Miloljub
Tjapkin, D.
Article (Published version)
,
Elsevier
Metadata
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Abstract
It is shown that the reciprocal value of low frequency capacitance of a MISIM structure can be represented by a sum of reciprocal values of insulator layer and surface space charge capacitances and an “interaction” term which is a consequence of the finiteness of the semiconductor layer. General formulae are derived for the low frequency capacitance of a MISIM structure with nondegenerate semiconductor. Analytical and numerical calculations are given for a MISIM structure with intrinsic semiconductor layer.
Source:
Solid-State Electronics, 1975, 18, 10, 827-831
Publisher:
  • Elsevier BV
Projects:
  • Republic Counsil of Scientific Research of S.R. Serbia, (Under Contracts No. 620/13).

DOI: 10.1016/0038-1101(75)90002-7

ISSN: 00381101

Scopus: 2-s2.0-0016564891
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URI
http://cer.ihtm.bg.ac.rs/handle/123456789/3075
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