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dc.creatorGaica, Sandra
dc.creatorOpsenica, Dejan
dc.creatorŠolaja, Bogdan
dc.creatorTešić, Živoslav
dc.creatorMilojković-Opsenica, Dušanka
dc.date.accessioned2019-05-02T12:55:00Z
dc.date.available2019-05-02T12:55:00Z
dc.date.issued2002
dc.identifier.issn0933-4173
dc.identifier.urihttps://cer.ihtm.bg.ac.rs/handle/123456789/2834
dc.description.abstractThe thin-layer chromatographic behavior of cholic acid and fourteen of its synthetic derivatives has been studied in six reversed-phase and three normal-phase systems. Four significantly different adsorbents were used - RP-18-silica, CN-silica, polyacrylonitrile adsorbent, and unmodified silica gel. Reversed-phase chromatography was performed with water-organic modifier (methanol, dioxane, or acetone) binary mobile phases of widely variable composition. An approximately linear relationship was obtained between R-M values and the amount of organic modifier in the mobile phases investigated. The effect of mobile-phase composition on retention has been considered and the selectivity of the chromatographic systems is also discussed. Separation mechanisms are proposed on the basis of the results obtained. A positive solvation effect was proposed as a predominant factor determining retention under normal-phase conditions whereas hydrophobic interactions of the substances with non-polar parts of the adsorbents were assumed to be predominant under reversed-phase conditions.en
dc.publisherResearch Inst Medicinal Plants, Budakalasz
dc.rightsrestrictedAccess
dc.sourceJournal of Planar Chromatography: Modern TLC / Thin Layer Chromatography
dc.subjectRP-18 silicaen
dc.subjectCN-silica polyacrylonitrile adsorbenten
dc.subjectunmodified silicaen
dc.subjectretention behavioren
dc.subjectcholic acid derivativesen
dc.titleThe retention behaviour of some cholic acid derivatives on different adsorbentsen
dc.typearticle
dc.rights.licenseARR
dcterms.abstractОпсеница, Дејан; Милојковић-Опсеница, Душанка; Гаица, СБ; Шолаја, Богдан A.; Тешић, Живослав Љ.;
dc.citation.volume15
dc.citation.issue4
dc.citation.spage299
dc.citation.epage305
dc.citation.other15(4): 299-305
dc.citation.rankM23
dc.identifier.doi10.1556/JPC.15.2002.4.11
dc.identifier.scopus2-s2.0-0036660390
dc.identifier.wos000178677900012
dc.type.versionpublishedVersion


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