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Metal layers with subwavelength texturing for broadband enhancement of photocatalytic processes in microreactors

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2018
Authors
Rašljić, Milena
Obradov, Marko
Lazić, Žarko
Vasiljević-Radović, Dana
Čupić, Željko
Stanisavljev, Dragomir
Article (Published version)
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Abstract
In this paper we joined plasmonics and microreactors for photocatalytic optofluidic devices. To this purpose we consider the use of subwavelength texturing of plasmonic films applied to microreactor channel bottom to ensure SPP localization and field enhancement. The small volume of the microchannel is ideal for the enhancement of photocatalytic processes using localized evanescent fields. A great advantage of our approach is that it is highly compatible with the standard chemical bulk micromachining techniques which are commonly used in fabrication of the microreactors i.e. standard photolithography can be used to define microchannels, and radiofrequent sputtering to deposit a gold film as a plasmonic material over the roughened surface. Subwavelength surface texturing can be obtained by varying etching techniques and parameters and the microreactor building materials. We show using ab initio FEM modeling that the stochastic surface profile ensures broadband coupling of visible light ...as well as enables us to merge plasmonic sensors and microreactors into a single device.

Keywords:
Plasmonic / Microreactors / Thin films / Photocatalysis
Source:
Optical and Quantum Electronics, 2018, 50, 6
Publisher:
  • Springer, Dordrecht
Projects:
  • Micro- Nanosystems and Sensors for Electric Power and Process Industry and Environmental Protection (RS-32008)

DOI: 10.1007/s11082-018-1507-z

ISSN: 0306-8919

WoS: 000433163200001

Scopus: 2-s2.0-85047537402
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URI
http://cer.ihtm.bg.ac.rs/handle/123456789/2481
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IHTM

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