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Effect of parameters of square-wave pulsating current on copper electrodeposition in the hydrogen co-deposition range
(Elsevier Science Inc, New York, 2010)
Copper electrodeposition processes in the hydrogen co-deposition range by the pulsating current (PC) regime were examined by the determination of the average current efficiency of hydrogen evolution and by the scanning ...
Effect of parameters of pulsating current (PC) regimes on morphology of electrodeposited copper in hydrogen co-deposition range
(Serbian Chemical Society, Belgrade, 2010)
The most often employed electrolytes for the electrodeposition of copper are those based on aqueous solutions of sulfuric acid (H2SO4) and cupric sulfate (CuSO4). There is an ionic equilibrium of a lot of species in the ...