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Application of pulsating overpotential regime on the formation of copper deposits in the range of hydrogen co-deposition
(Springer, New York, 2010)
Electrodeposition of copper by pulsating overpotential (PO) regime in the range of hydrogen co-deposition was examined by scanning electron microscopy. It was found that the increase of the pause-to-pulse ratio produced a ...
Effect of parameters of square-wave pulsating current on copper electrodeposition in the hydrogen co-deposition range
(Elsevier Science Inc, New York, 2010)
Copper electrodeposition processes in the hydrogen co-deposition range by the pulsating current (PC) regime were examined by the determination of the average current efficiency of hydrogen evolution and by the scanning ...