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Electrocatalytic optimization of faradaic yields in the chlorate cell process
(Elsevier, 1984)
It has been shown that while the mixed RuO2TiO2 coated titanium anode deteriorates very quickly in the presence of ionic phosphate species, the electrode containing palladium and tin oxides in the coating mixture as well ...
Fundamental aspects of pulsating current metal electrodeposition VIII: The effect of pause-to-pulse ratio on microthrowing power of metal deposition
(Elsevier, 1984)
The effect of a pulsating current on the microthrowing power of metal deposits in the early stage of deposition was investigated by scanning electron microscopy. It is shown that at the same average current density the ...
Some aspects of current density distribution in electrolytic cells I: Dendritic growth of cadmium at the cathode edge in galvanostatic electrodeposition
(Elsevier, 1983)
The equivalent electrical resistance of a cell with plane parallel electrodes is described by a simple mathematical model. The limits of this model were determined experimentally. The relation between the overpotential at ...
Fundamental aspects of plating technology II: Morphological aspects of metal electrodeposition from complex salt solutions
(Elsevier, 1983)
It is shown that the improved quality of electrodeposits obtained from ammonium complex salt solutions compared with deposits obtained from simple salt solutions is due to the decrease in the exchange current density value ...
Synergetic electrocatalytic effect of d metals for the hydrogen evolution reaction on gold substrates
(Elsevier, 1984)
An electrocatalytic method developed previously for the depolarization of the hydrogen evolution reaction (HER) on graphite, iron, steel, nickel and titanium substrate surfaces was employed to improve the polarization ...
Fundamental aspects of plating technology I: The determination of the optimum deposition current density
(Elsevier, 1983)
It is shown that the optimum plating overpotential or the optimum current density is determined by the upper limit of validity of the Tafel relationship for the deposition process.
Fundamental aspects of pulsating current metal electrodeposition IX: The prevention of spongy deposit formation on inert substrates
(Elsevier, 1984)
It is shown that spongy deposits are obtained under d.c. conditions and that compact deposits are obtained in pulsating current (PC) deposition with high pause-to-pulse ratios at the same average current density and ...