Structural characterization of the nickel thin film deposited by glad technique
Apstrakt
In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 μm, which was achieved for the deposition time of 3 hours.
U ovom radu, stubičasta struktura tankog sloja nikla je dobijena korišćenjem napredne tehnike deponovanja pri malim uglovima. Tanki sloj nikla je deponovan na staklu, pri konstantnoj emisionoj struji koja je iznosila 100 mA. Podloga od stakla je postavljena, u odnosu na fluks pare nikla, pod uglom od 15 stepeni. Dobijeni tanki sloj nikla je karakterisan pomoću mikroskopa u polju atomskih sila i skanirajućeg elektronskog mikroskopa. Analiza ukazuje da se formiranje stubičaste strukture javlja pri debljini sloja nikla od 1 μm, a ta debljina je dobijena nakon 3 sata deponovanja.
Ključne reči:
glancing angle deposition / force modulation atomic force microscopy / nickel / cross section / deponovanje pri malim uglovima / mikroskop u polju atomskih sila / nikl / poprečni presekIzvor:
Science of Sintering, 2013, 45, 1, 61-67Izdavač:
- International Institute for the Science of Sintering, Beograd
Finansiranje / projekti:
- Funkcionalni, funkcionalizovani i usavršeni nano materijali (RS-MESTD-Integrated and Interdisciplinary Research (IIR or III)-45005)
DOI: 10.2298/SOS1301061P
ISSN: 0350-820X
WoS: 000318150200006
Scopus: 2-s2.0-84877705136
Institucija/grupa
IHTMTY - JOUR AU - Potočnik, Jelena AU - Nenadović, Miloš AU - Jokić, Bojan AU - Štrbac, Svetlana AU - Rakočević, Zlatko Lj. PY - 2013 UR - https://cer.ihtm.bg.ac.rs/handle/123456789/1361 AB - In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 μm, which was achieved for the deposition time of 3 hours. AB - U ovom radu, stubičasta struktura tankog sloja nikla je dobijena korišćenjem napredne tehnike deponovanja pri malim uglovima. Tanki sloj nikla je deponovan na staklu, pri konstantnoj emisionoj struji koja je iznosila 100 mA. Podloga od stakla je postavljena, u odnosu na fluks pare nikla, pod uglom od 15 stepeni. Dobijeni tanki sloj nikla je karakterisan pomoću mikroskopa u polju atomskih sila i skanirajućeg elektronskog mikroskopa. Analiza ukazuje da se formiranje stubičaste strukture javlja pri debljini sloja nikla od 1 μm, a ta debljina je dobijena nakon 3 sata deponovanja. PB - International Institute for the Science of Sintering, Beograd T2 - Science of Sintering T1 - Structural characterization of the nickel thin film deposited by glad technique VL - 45 IS - 1 SP - 61 EP - 67 DO - 10.2298/SOS1301061P ER -
@article{ author = "Potočnik, Jelena and Nenadović, Miloš and Jokić, Bojan and Štrbac, Svetlana and Rakočević, Zlatko Lj.", year = "2013", abstract = "In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 μm, which was achieved for the deposition time of 3 hours., U ovom radu, stubičasta struktura tankog sloja nikla je dobijena korišćenjem napredne tehnike deponovanja pri malim uglovima. Tanki sloj nikla je deponovan na staklu, pri konstantnoj emisionoj struji koja je iznosila 100 mA. Podloga od stakla je postavljena, u odnosu na fluks pare nikla, pod uglom od 15 stepeni. Dobijeni tanki sloj nikla je karakterisan pomoću mikroskopa u polju atomskih sila i skanirajućeg elektronskog mikroskopa. Analiza ukazuje da se formiranje stubičaste strukture javlja pri debljini sloja nikla od 1 μm, a ta debljina je dobijena nakon 3 sata deponovanja.", publisher = "International Institute for the Science of Sintering, Beograd", journal = "Science of Sintering", title = "Structural characterization of the nickel thin film deposited by glad technique", volume = "45", number = "1", pages = "61-67", doi = "10.2298/SOS1301061P" }
Potočnik, J., Nenadović, M., Jokić, B., Štrbac, S.,& Rakočević, Z. Lj.. (2013). Structural characterization of the nickel thin film deposited by glad technique. in Science of Sintering International Institute for the Science of Sintering, Beograd., 45(1), 61-67. https://doi.org/10.2298/SOS1301061P
Potočnik J, Nenadović M, Jokić B, Štrbac S, Rakočević ZL. Structural characterization of the nickel thin film deposited by glad technique. in Science of Sintering. 2013;45(1):61-67. doi:10.2298/SOS1301061P .
Potočnik, Jelena, Nenadović, Miloš, Jokić, Bojan, Štrbac, Svetlana, Rakočević, Zlatko Lj., "Structural characterization of the nickel thin film deposited by glad technique" in Science of Sintering, 45, no. 1 (2013):61-67, https://doi.org/10.2298/SOS1301061P . .